process gas monitor

process gas monitor
COMPACT
PROCESS GAS MONITOR
Quadrupole M ass Spectrometer
MICROPOLE System
Ultra-Compact
process gas monitor.
Monitors trace gases,
responds quickly
to process shift and is easy
to install / maintain.
Quadrupole M ass Spectrometer
MICROPOLE System
High performance, non-intrusive,
easy-to-use design satisfies new needs
for gas analysis in process equipment.
The MICROPOLE System was developed by HORIBA STEC for gas analysis and process control
in vacuum chambers and in thin-film processes.
The ultra-compact design has nine quadrupoles in an array that is both lightweight
and fast to respond to process changes.
● Process
monitoring up to 3.8mTorr (depending on configuration)
sensor design
● Easy and fast installation
● Ultra-compact
1
M ICROPOLE Sys t e m
Specification Selection / System Configuration
Clamp
Spectrum
Generator
Sensor
■ Specification Selection
Spectrum Generator
Sensor
Plasma Guard
Measurable Mass Range
SMPA7-7-2 / 65 K
QL-SG01-065-1A
○
̶
SMPA7-5-2/100 K
QL-SG01-100-1A
○
̶
SMPA7-1-4/300 K
QL-SG01-300-1A
○
2 -100AMU
Maximum operating pressure: 0.6Pa
●
Maximum output rising pressure: 0.2Pa
●
Minimum detectable partial pressure: 5.0x10-6Pa (70eV)
●
Resolution: 1.0±0.3AMU
ISO-KF16 (NW16)
4 - 300AMU
Maximum operating pressure: 0.4Pa
●
Maximum output rising pressure: 0.2Pa
●
Minimum detectable partial pressure: 5.0x10-6Pa (70eV)
●
Resolution: 1.8±0.3AMU
ISO-KF16 (NW16)
CF34 (ICF34)
CF34 (ICF34)
●
SMPA7-1-4/300 C
MPA7-1-4/300 C
ISO-KF16 (NW16)
●
SMPA7-5-2/100 C
MPA7-5-2/100 C
2 - 65AMU
Maximum operating pressure: 0.9Pa
Maximum output rising pressure: 0.5Pa
●
Minimum detectable partial pressure: 5.0x10-6Pa (70eV)
●
Resolution: 1.2±0.3AMU
●
●
SMPA7-7-2 / 65 C
MPA7-7-2 / 65 C
Clamp
̶
CF34 (ICF34)
■ System Configuration
Single Monitoring
Multiple Monitoring
Interconnect Cable
QL-CR01-1A
(AC100∼240V)
Interconnect Cable
QL-CR01-1A
QL-SG01-1A
AC Adapter
QL-PS01-1A
(AC100∼240V)
AC Adapter
QL-PS01-1A
Communication Cable SC-EBR
BB-4-2(4 Units)
BB-8-2(8 Units)
QL-SG01-1A
HUB
PC
Communication Cable
SC-EBR
SC-EBR
RS485
RS232C
RS485
RS232C
A Set of Single Monitoring
Necessary Item
Model
Sensor
MPA7/SMPA7 series
1
QL-SG01
QL-SG01 series
1
Clamp
QL-LS01 or QL-LC01
1
Regular Cable
QL-CR01 series
1
AC Adapter
QL-PS01
1
Communication Cable
*recommended item
1
Converter
*recommended item
1
PC
qty
1
PC
Setting up multiple MICROPOLE Systems (maximum 8
systems) is easily to use Communication Cables,
RS232/485 adapters and a Communications Hub.
2
Application
POI NT
1
In dry-coating applications,
MICROPOLE Systems are used to monitor the process environment
to ensure a consistent sputtering process.
Example
Production process of functional thin films
Plasma Controller
Detects the intensity of
plasma emission
PMT unit
Signal cable
Vacuum Chamber
MICROPOLE
System
Plasma
Target material
MFC
Supplies gas
MFC
Film
MFC
Mass Flow Controller
Supplies H2O
Liquid Source Vaporization
Control System
■ Process gas monitoring date
1.0E+01
Ar
1.0E+00
H2O
1.0E−1
P re ssu re [Pa]
In dry coating applications, moisture levels in the
process environment are critical. Using the
MICROPOLE System to monitor the partial pressure of
H 2 O in conjunction with other available HORIBA
components for closed loop process control, ensures
a stable moisture level and resulting repeatable and
high quality coatings.
1.0E−2
O2
N2
1.0E−3
1.0E−4
1.0E−5
0
2
Elapsed process
3
4
Tim e[ h]
▶Related Products
3
Initial partial pressure
1
Plasma Controller
Mass Flow Controller
Compact Baking System
RU-1000
SEC-N100 series
LSC series
Plasma Emissions Monitor
identifies process shifts and
can be used to make
automatic modifications to the
delivery of gases, thereby
ensuring a stable process
Digital Mass Flow Controller
for repeatable and accurate
delivery of Process Gases
Vapor Delivery System
ensures consistent generation
and delivery of critical process
chemistries for coatings
5
M I CROPOLE Sys t e m
POI NT
2
For thin film applications like PVD and CVD, MICROPOLE Systems are
used to monitor the process environment before
and during deposition. By monitoring the process environment,
users can increase throughput by optimizing process run times
and ensure process repeatability.
Example
■
■
■
Residual gas analysis of sputtering device
Leak monitoring of sputtering device
Residual gas analysis of CVD device after cleaning
Vacuum Chamber
Plasma
MICROPOLE
System
Detects the intensity of
plasma emission
PMT unit
Target material
Supplies gas
MFC
MFC
MFC
POI NT
Mass Flow Controller
3
In vacuum drying applications, MICROPOLE Systems are
used to monitor process moisture and any elution gases.
This data allows users to ensure process efficiency.
Example
Detecting the end points of electric double layer capacitors
and lithium-ion capacitors in vacuum drying
■ Process gas monitoring date
485
232
Elevated Temperature
99
PC
44
NMP
1.0E-03
55
Drying Furnace
MICROPOLE
System
P re ssur e [Pa]
18
1.0E-04
H2O
End point of
NMP Drying Process
1.0E-05
1
* We also offer suggestions about differential pumping system.
2
3
4
Drying time[ h ]
4
M I CROPOLE Sys t e m
Product Specifications
Sensor
[RoHS compliant]
[MPA7 / SMPA7]
Sensor type
Analyzer
【Sensor Type:7-2/65】
[SMPA7]
Analyzer
Analyzer
Analyzer
【Sensor Type:5-2/100】 【Sensor Type:1-4/300】 【Sensor Type:1-2/100】
Maximum output rising pressure (N2)
0.1Pa
Maximum operating pressure (N2)
0.1Pa
Minimum detectable partial pressure (N2)
5 10 -6Pa (70eV)
Resolution (FWHM: N2)
1.5 0.3 AMU
Maximum bake out temperature (SG removed)
350 ℃
Maximum bake out temperature (SG installed)
150 ℃
[C]CF 34 (ICF 34),
[K]ISO-KF16 (NW 16)
Mounting flange
Flange 50 g
Flange 50 g
Mass
Flange 70 g
3% Re/W 2pcs
Filament
RoHS
ISO-KF16 Flange 50 g,
CF34 Flange 70 g
Complied
Complied
* Micropole Analyzer has 2 types (MPA/SMPA). SMPA is protected by a mesh on the vacuum fitting, designed to extend the lifetime of sensor in harsh environment such as plasma processes.
Spectrum generator type
Mass range
Mass filter type
Quadrupole
Detector
Faraday cup
Measurement scan speed (data update at baseline scan)
43 eV or 70 eV selectable
Ionization voltage
Operating temperature
(not condensing)
Operating humidity
Mass (with special clamp for SMPA type sensor)
149
Dimension
Communication and baud rate
Power input
Connector type (power supply)
Round Type Connector: PRC03-23A10-4M
CE marking
EMC directive: EN61326-2-3
RoHS
Complied
* 1Btype: With interlock function
Input
【QL-CR01-*M-1A】Between SG and Power supply
Length*: 3, 5, 10 m
Output
【SC-EBR】Between SG and PC (RJ45 connector)
Length: 3, 10 m
Operating temperature
【QL-TA01】For external input
Length: 3, 5 m
Operating humidity
(not condensing)
Dimension
* Do not use the attached cable set (power supply cable) with other products.
* Please use a power supply cable set conforming to the local standards.
Mass
【QL-LC】CF34 (ICF34) flange for MPA sensor
Mass: 140 g
【QL-LS】For SMPA sensor
Mass: 190 g
* Please let us know if you'd like to install into your device.
Data can be transferred to PCs for the visual display of analysis results.
Software (for PC)
OS
Simultaneously controllable systems (by PC)
Maximum 8 units from a single PC
Display
Measurement mode
Display unit
Display scale
Linear, Logarithmic
Date save
It can be converted to CSV file format.
Recommendation of PC
Pentium 1.6GHz or higher, RAM: 1GB or more, HDD: 2GB or more
• Windows is a registered trademark of Microsoft Corporation in the United States and other countries.
5
M I CROPOLE Sys t e m
External Dimensions / Measurement Principle
■ External Dimensions
Sensor
21.0∼
31.0
49.5
14
MPA
47
φ19.1
φ33.8
φ19.1
12.7
φ33.8
42.0
SMPA
149
62
Over φ16mm inside diameter
to adopt sensor unit
(Unit : mm)
■ Measurement principle
Configuration
Atoms and molecules
are ionized in a signal
ion source following by
electron impact (EI).
Ions with a specific
mass-to-charge ratio
are filtered by applying
a combination of DC
and RF voltages to each
quadrupole.
Mass filtered ions are
collected by Faraday
cup detectors.
Quadrupole
Ionization
Area
Filament (A)
Focus Lens
H2
H 2O
N2
Quadrupole
Faraday Cup
Effective Area
Filament (B)
6
The contents of this catalog are subject to change without prior notice, and without any subsequent liability to this company.
It is strictly forbidden to copy the content of this catalog in part or in full.
● All brand names, product names and service names in this catalog are trademarks or registered trademarks of their respective companies.
●
●
http://www.horiba-stec.jp/e.
Please read the operation manual before using this product
to ensure safe and proper handling of the product.
HEAD OFFICE
11-5, Hokodate-cho, Kamitoba, Minami-ku, Kyoto, 601-8116 Japan
PHONE: (81)75-693-2312 FAX: (81)75-693-2331
TAIWAN
HORIBA Taiwan, Inc.
PHONE: (886)3-656-1160 FAX: (886)3-656-8231
Tainan Office
PHONE: (886)6-583-4592 FAX: (886)6-583-2409
KOREA
HORIBA STEC KOREA, Ltd.
PHONE: (82)31-777-2277 FAX: (82)31-777-2288
RG-EE
SINGAPORE
HORIBA Instruments (Singapore) Pte Ltd.
PHONE: (65)6-745-8300 FAX: (65)6-745-8155
CHINA
HORIBA (China) Trading Co., Ltd.
PHONE: (86)21-6289-6060 FAX: (86)21-6289-5553
Beijing Office
PHONE: (86)10-8567-9966 FAX: (86)10-8567-9066
Shenzhen Office
PHONE: (86)755-2967-1203 FAX: (86)755-2967-1192
Shanghai Service Center
U.S.A.
HORIBA Instruments Incorporated
Santa Clara Office (Technology Center)
PHONE: (1)408-730-4772
FAX: (1)408-730-8975
Austin Office
PHONE: (1)512-836-9560 FAX: (1)512-836-8054
U.K.
HORIBA UK Ltd. Northampton Office
PHONE: (44)1604-542-500 FAX: (44)1604-542-699
Recycled paper
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