8” Spinner 2 Project Staff System Owner: Neha (nehar@ee

8” Spinner 2 Project Staff System Owner: Neha (nehar@ee
8” Spinner
System Owner: Ritu Rashmi (rishmi@ee.iitb.ac.in, 9969437093)
2nd System Owner: Ramu (ramu@ee.iitb.ac.in, 9221382593)
Project Staff System Owner: Neha (nehar@ee.iitb.ac.in, 9869547742)
Authorized Users:
Akash
Rajul (rajul@ee.iitb.ac.in, 9869510235)
Mrinmoy (mrinmoy@ee.iitb.ac.in, 9967413270)
Senthil (sensrivs@ee.iitb.ac.in, 09757097678)
Shanky (shanky@ee.iitb.ac.in, 9029085484,)
Rajashree (rajsre@ee.iitb.ac.in, 9967968756)
Siva (sivaramakrishnanster@gmail.com, 9757418767)
Mrunal (mrunalak@ee.iitb.ac.in, 9619902441)
Suresh G (gsuresh@ee.iitb.ac.in, 9619115579)
Amit G (gour@ee.iitb.ac.in, 9022096919)
Nidhi (nidhi.m@iitb.ac.in, 9833783060)
Sheetal (sheetal@ee.iitb.ac.in, 9892959365)
Manu (manubala@ee.iitb.ac.in,8976899170)
Hemant (hemant16@ee.iitb.ac.in,9029713434)
Amey (ameywalke@ee.iitb.ac.in,9757052298)
Sreetama (sreetama@ee.iitb.ac.in, 9769907810)
Shouvik (shouvik_649@ee.iitb.ac.in,9930126337)
Sundar (laxmisundar@ee.iitb.ac.in,8097347476)
Allowed Substrates:2”, 4”, 6”, 8” wafers as well as their small pieces
Authorization Procedure: Hands on training followed by practical
cum written test. No authorization till both the tests is cleared.
Expiry of authorization: If user fails to operate the system for more
than three months. Clearing both practical and written test mandatory
for re-authorization
Violation Policy:
1. Proper shut down of the system including the Nitrogen supply
and the mains power.
2. Entering the log book each time the system is used.
3. Proper cleaning of the process bowl and the lid after each use.
USE OF ALUMINUM FOIL MANDATORY
OPERATING PROCEDURE
 Turn ON GN2 to 4 bars and switch ON the vacuum pump of the spinner.
 Switch ON Mains of spinner and the step up/ step down voltage
regulator.
 Press the switch on the rear bottom of spinner.
 For existing recipe of spinning, select the program by pressing Program
select button.
 For writing new recipe, press F1 and write the program by using add step,
delete step button and enter the values using the up and down arrow
buttons. Press enter once the program is written.
 Each program step includes: time of step, wafer rotation speed in RPM,
and acceleration/deceleration set point (acceleration/deceleration rate is
shown in program mode only).Each program can have 51 steps.
 Place the wafer on the spinner chuck using the wafer alignment tool. Use
4” chuck for 4” and 8” wafers and 2” chuck for pieces and 2” wafers.
 Press vacuum on the keypad and gently remove the wafer alignment tool.
The system will not work for vacuum 15” Hg. If the vacuum falls below
the required level the process will halt and an E04 error message will
appear on LCD display. To restart the program after the vacuum has been
re-established, RUN/STOP key needs to be pressed.
 As the vacuum valve is pneumatic sufficient pressure of Nitrogen is
required which is 60 psi and above In this case there is required vacuum
but lack of N2 will flash CDA and cause an E10 error. Once purge
pressure has been re-established, press the RUN/STOP key on the keypad
to re-start the program.
 Close the lid. A safety lid interlock disallows motor rotation if an open
lid condition is detected. In case lid is opened while running a program,
the program will be interrupted and chuck rotation will stop slowly. LID
indicator will be flashed on the LCD display. The program can be
continued from the point at which it has stopped by closing the lid and
pressing the RUN/STOP key.
 Select the program and perform a test run without the resist.
 Pour resist on the wafer with the help of a dropper. Close the lid Press
RUN to start the process. If process needs to be aborted in between, press
STOP.
 Shutdown the system by pressing the button at the rear end of the spinner
body followed by switching OFF Mains and the transformer. Turn Off the
vacuum pump as well as the Nitrogen supply.
Optimized Recipes
Resist
Name
PMMA
Steps Time(sec) Acceleration(rpm) Thickness
of film
1
5
500
300nm
2
45
3500
3
10
0
HSQ
1
5
500
150nm
2
45
2000
3
10
0
PPR1
10
500
1.8 
S1813
2
30
1500
PPR1
15
300
1.5 
S1813
2
30
3000
PPR1
30
300
1.4 
S1813
2
45
6000
3
5
500
SPR-700- 1
15
300
2.1
1.8
2
30
3000
AZ4330 1
10
500
4.4 
2
30
4000
AZ5241E 1
10
500
2
2
30
4000
AZP4620 1
15
300
9.88
2
30
3000
Process
Type
Spread
Spin
Spread
Spin
Lift Off
Spread
Spin
Small
features
Spread
Spin
Spread
Spin
Lift Off
Lift Off
ERROR MESSAGES
The error messages expected during the operation of the spinner and the action
required thereby is given as follows:
CODE
DESCRIPTION
ACTION
E03
E04
E05
E07
E08
E10
Motor did not reach Shut down spinner
specified RPM
Vacuum
below Shut down spinner,
required minimum
check oil in the
vacuum pump.
Illegal command sent Ignore
to spinner
Motor
exceeded Shut down spinner
maximum RPM
No RPM feedback, Shut down spinner,
zero RPM
remove
any
restriction to spinner.
Insufficient Nitrogen Check N2 pressure
pressure
and increase it to 4
bars
First Level Tool Maintenance
 Clean process bowl and lid with IPA after each use, taking care to prevent
any chemicals from entering the vacuum path. Ensure that N2 is on
during cleaning so that seal purge is constantly present and leave the lid
open to allow drying of residual moisture.
 Cover the chuck using a wafer held in place with vacuum or use a cover
like a petri dish during bowl cleaning.
 Clean the keypad surface with a wet wipe. Never spray solvent like
acetone directly onto the keypad surface as it may cause keypad failure.
 Clean the chuck O-ring. To do this, insert a thin blunt instrument into the
O-ring groove and pull upward. Be careful not to damage the O-ring or
the chuck. Wipe it with acetone and insert it back into the O-ring groove.
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