Revolution

Revolution
Revolution
MEI
Semi-Auto Multi-Step
Wet Processing
Wet Processing
Built on Commitment
Small Footprint, Multi-Step Processing
MEI’s Revolution multi-step wet processing systems combine ease of process control with a rotary
robot design and precision engineering to create powerful, flexible tools with minimal fab footprints.
Rotary Robot for Minimal
Fab Footprint
Versatile
• Multiple etch, strip and
clean applications
• Easy recipe configuration
• Chemical spiking, dosing
and fill options
• Acid and solvent models
• 2–5 process tanks
• Integrated Marangoni dryer
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•
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2–5 position, 2-axis design
Multiple process tanks
150–300mm wafers
Optional tank lids
Pressure or optical tank
level monitoring
• Quick dump rinse options
Designed for: Productivity
Performance and Yield
with IDX Flexware
n
Safety
n
Reliability
n
Configurability
•Flexible
•Configurable
•Precise
• SECS/GEM compliant
• Touch-screen interface
• Simultaneous multiple lots
and recipes
n
Low Cost
n
Maintenance Friendly
Applications
FEOL Resist Strip
n RCA Clean
n BEOL Resist Strip
n InGaP-GaAs Etch
n
™
Metal Lift-Off
S O L U T I O N by MEI
Silicon Etch
S O L U T I O N by MEI
Metal Etch
S O L U T I O N by MEI
www.meillc.com
n
Post CMP Clean
n Prediffusion Clean
n Oxide Etch
n SWP Clean
n
1-541-917-3626
Developer
n Nitride Etch
n
REVOLUTION: Semi-Auto Multi-Step
MEI
Wet Processing
Built on Commitment
Process Tanks and QDR
System Options
Features for Optimum Performance
• 2–5 tanks
• Megasonic or ultrasonic bath
• Heater (including solid state),
chiller and dryer options
• Chemical spiking, in-tank
blending, filtration concentration
monitoring, bulk fill, agitation,
DI flush and drain options
• PVDF, stainless, quartz, halar or
natural poly
• Optional tank lids
• Pressure or optical tank level
monitoring
• QDR tank with sparger bar
spraying method, shared facilities,
robust dump cylinder
Custom Designed for Your Process
• 100–300mm wafer Sizes
• Input/output queues or
manual loading
• Acid/base or solvent:
Choice of FM4910 (Halar,
CPVC, PVDF), polypropylene
or stainless steel
• Chemical spiking,
recirculation, and filtration
• Manual pour chemistry via
deck mounted cup or chemical
spiking reservoir
• End effector materials PVDF/
PTFE, halar, quartz or
stainless
• Fire suppression
(available upon request)
Integrated Dryer Option
• Technology node 200nm
• Best particle performance
on hydrophilic surfaces
• Compatible with processing
Teflon cassettes
• Slow drain Marangoni process
• Static wafer lifter to minimize
water contact marks
• Dry cycle time 15–20 min
• 10–20 ml IPA per cycle
Genesis Marangoni Dryer
Additional Options
•Heater/chiller/in-line/
blanket/external
• Queue info
• Custom end effector dual sizes
• Integrated Marangoni dryer
MARANGONI DRYER
by MEI
Two to Five Tank Capacity
IDX
Flexware
PROCESS CONTROL SOFTWARE
by MEI
Superior Process Control
•
•
•
•
•
•
•
•
•
SECS/GEM compliant
Recipe editor
Advanced process controls
Unlimited user/permission levels
Easy-to-use, touch-screen interface
Error logging and data graphing
Barcode reader compatibility
Remote access compatible
I/O monitor displays status
Analog Control
Analog sensing enables software to control:
• In-tank blending
• Blending ratio creation
• Control DI water inject
• Control temperature
• Recirculation flow
• Spiking volume
REVOLUTION:
REVOLUTION:Semi-Auto
Semi-AutoMulti-Step
Multi-Step
MEI
Computer Modeled Exhaust
Wet Processing
Headcase Electronics
Built on Commitment
Visual/Audible Signal Tower
IDX
Rotary Robot/Custom End Effector
Flexware
PROCESS CONTROL SOFTWARE
by MEI
Deck-top/Custom Tank Configurations
Manual Bulk Fill (Optional)
Tool Control (Semi-S2 Compliant)
Process Level Sensors
Lower Plenum Access
Easy Access to Robot Connections
Custom Designed
• MEI partnership design process
• MEI application solutions
• Custom tank, material
and configuration
• Solid works modeling
Flow Modeling
• Fume capture
• Minimal exhaust
ULPA Filtered Flow Model
Chemical Spiking, Dosing
and Bulk Fill Options
• Bulk fill via system request
• In-tank mixing
• Concentration monitors
and controls
• Metering pump reservoir
dispense
• Spiking flow rate monitoring
Integrated Manual Pour Reservoirs
Rotary Robot
•
•
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•
Robust, versatile, serviceable
2–5 position
2-axis design
4 sec transfer speed
Product size driven custom
end effector
• Variable speed agitation
• “Off the shelf components”
• Field proven
Rotary Robot with Bellows Seal
MEI Wet Processing Systems & Services, LLC
3838 Western Way NE
Albany, OR 97321
MEI
Wet Processing
Phone 1-541-917-3626
Built on Commitment
www.meillc.com
REVOLUTION: Semi-Auto Multi-Step
Designed for Reliability
Typical Configurations (Other configurations available)
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•
•
•
Classic-3Radial-5
Revolution
Classic-3
Revolution
Radial-5
Layout/Footprint
Chem
Chem
Rinse
70” D
Chem
70” D
Chem
Chem
Chem
Rinse
48” W
48” W
Dual 200mm
Single 200mm/
MaxStatic Tank Size
Dual 150mm
Single 200mm/
Single 150mm
Max Recirculated
Tank Size
Dual 150mm
11
Concurrent
Lots Processed
Top or Bottom
Bottom
Exhaust
YesNo
Available
Tank Lids
YesYes
Available Mega/Ultra
Sonics
BackBack
Maintenance
Access
Manual, Fill-cup, Bulk
Manual, Fill-cup, Bulk
Available Chemical
Fill Type
YesYes
Available
Spiking
General Specifications
Shell style:
Single shell fully integrated design.
Shell material:
Choice of FM4910 (Halar, CPVC, PVDF), polypropylene or stainless steel.
Agitation:Standard
Filter Recirculation: Standard
Facilities:
Bottom-back mounted plenum drains, top or back exhaust connections available, low exhaust
requirements; shared facilities and electronics. UL compliant electrical components.
Typical Facility Table (Will change to specifications)
Description
Connection
N2 Supply
CDA Supply
Cold DI Water Input
Front Plenum Rinse Drain
Back Plenum Drain
Process Tank Drain
Cold DI Return
Process Exhaust
Plumbing Compartment Exhaust
Hot DI Input (Module 1 only)
Chem Bulkfill
Electrical Input
Ozone Injection
CO2 Connection
3/8” Swagelok
1/2” Swagelok
1” Flaretek
2” Male Pipe
3/4” Flaretek/2” Male Pipe
3/4” Flaretek
1/2” Flaretek
10” Duct
4” Duct
1” Flaretek
3/4” Flaretek
5-Wire
1/4” Swagelok
TBD
Requirement
40–60 PSI @ 5–7 SCFM
60–80 PSI @ 15–30 SCFM
45–60 PSI 10–20 GPM
N/A
N/A
N/A
N/A
250–650 CFM @ 1” Static *Minimum*
100–200 CFM @ 1” Static *Minimum*
Connect to Water Heater
N/A
208V 45A–100A FLA
N/A
CO2 Bottles Per Fire System Spec
Limited PM requirements
Field proven reliability
Semi-S2 compliance
Durable “off the shelf ”
components
• Nitogen purged electrical
compartments
• Designed to provide
MTBF >1,500 hours – E1092
Low Cost of Ownership
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•
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Extended tank life
Improved process control
Reduced DI water useage
Reduced chemistry usage
Easy installation
Designed for Safety
• Semi-S2 third party
inspection optional
• FM4910 material standard
• S8 compliant
•UL/NFPA79/NEC
• CE optional
MEI’s Award Winning
Service and Support
MEI Global Field Service Team
• Final test and verification
• Standard one year parts
and labor warranty
• Two year optional warranty
• Full field service support,
on-site warranty coverage
• On-site training provided
REV-05/15
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