Modular Process Technology Corporation RTP-600S Rapid Thermal Processor User Manual

Below you will find brief information for Rapid Thermal Processor RTP-600S. The RTP-600S is a versatile tool, useful for many applications such as ion implant activation, polysilicon annealing, oxide reflow, silicide formation, contact alloying, oxidation and nitridation, and compound semiconductor processing..

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Rapid Thermal Processor RTP-600S User Manual | Manualzz

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Key features

  • Closed-loop temperature control
  • Precise time-temperature profiles
  • Fast heating and cooling rates
  • Consistent wafer-to-wafer process cycle repeatability
  • Elimination of external contamination
  • Small footprint and energy efficiency

Frequently asked questions

The RTP-600S offers two temperature monitoring options: an Extended Range Pyrometer PLUS and a thermocouple.

The maximum non-uniformity is 0.25% for radiant flux, and less than 2% for sheet resistivity, as measured on a 150 mm wafer annealed at 1000oC for 10 seconds.

The system uses Mass Flow Controllers (MFCs) to control the flow of gases, ensuring precise and consistent gas delivery during the process.

Only use gases specifically approved for the RTP-600S system, and double-check that they are connected to the appropriate inlets on the service panel.

System level pyrometer calibration is performed by capturing the correlation between the pyrometer and a properly installed thermocouple while the lamp intensity is increasing. This calibration should be done when the pyrometer or quartz tube is changed.

The RTP-600S employs factors 1 through 7 to optimize temperature control for each recipe. These factors can be accessed and adjusted in the recipe editor.
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