Instrument Brochure - Centre for Nano and Soft Matter Sciences

Instrument Brochure - Centre for Nano and Soft Matter Sciences
Research Facilities
Ready Reckoner
Contents
1. X-ray Diffractometer
1
2. X-ray Diffraction System with High Spatial Resolution Fast Detector
2
3. X-ray Diffractometer with 2D Image plate detector
3
4
X-ray Diffractometer
4
5
SQUID Magnetometer
5
6
Semiconductor Characterization System
6
7
8
Low Temperature Resistance and Magnetoresistance Measurements 7
MultiFerroic Tester
9
9
10
11
12
13
14
Gain/phase Analyzer
High Pressure Apparatus
Electrostatic Voltmeter
Rheometer
Interfacial Shear Rheometer
UV-Visible Spectrometer
Rigaku SmartLab
Panalytical X’Pert PRO
Xenocs GeniX3D, 2013
Xenocs, Genix Cu MAR345
Ever Cool MPMS XL, Quantum Design
Keithley 4200
Radiant Technologies Inc.
Perkin Elmer Lambda 20
10
11
12
13
14
15
15 UV-VIS-NIR Double Beam Spectrophotometer
16
16 UV-Visible-NIR Spectrophotometer with Diffuse Reflectance
17
17 FT – IR Spectrometer
18
18 Spectrofluorometer
19
Shimadzu UV-3101PC
Perkin–Elmer Lambda 750
Perkin Elmer Spectrum 1000
Horiba Jobin Yvon Fluorolog-3
19 Circular Dichroism Spectropolarimeter
20
20 Mass Spectrometer
21
21 Differential Scanning Calorimeter
22
22 CHNS/O Elemental Analyser
23
23 Single Wavelength Null Imaging Ellipsometry
24
24 Research Grade Polarizing microscope
25
25 Polarizing Microscope
26
26 Optical Fluorescence, Reflection Microscope
27
27 Research Grade Polarizing Microscope with confocal capability
and digital imaging system
28
28 Field Emission Scanning Electron Microscopy (FESEM)
30
Jasco J-810
JEOL JMS 600H
Perkin Elmer Diamond -Series
Perkin Elmer 2400
Accurion GmbH EP3
Leica DM4500 P
Olympus Bx51-75e21p
Olympus BX51
Carl Zeiss Axio imager M1m
TESCAN-MIRA 3 LMH, 2014 and
Energy Dispersive X-ray Spectrometer (EDS)
QUANTAX 200 with XFlash BRUKER
29 Atomic Force Microscope
33
30
31
32
33
34
34
36
37
38
38
39
Agilent Technologies 5500
Langmuir - BlodgettTrough
Alternate Layer Langmuir - Blodgett Trough
Thermal Vacuum Evaporator
RF/DC Sputtering System
Instrument
Access
& Contact Details
Confocal Raman
Microscope
Horiba Jobin Yvon XPlora Plus
35 Electrochemical Workstation
CHI 660E
1
X-ray Diffractometer
Rigaku SmartLab, 2012
TECHNICAL AND CHARACTERIZATION DETAILS
• Powder samples and thin films - Horizontal sample mounting
• Bragg-Brentano (theta-theta) and parallel beam (grazing incidence) geometry
• Cu KAlpha line
• 3 kW X-Ray generator
• Bent/flat switchable receiving graphite monochromator
• Rotating sample plate
• 4" wafer sample plate; maximum thickness-1 mm
• Scanning range: -3 Deg-160 Deg (2theta equivalent)
• Minimum step width-0.0001 Deg.
• Variable slit widths
• Goniometer radius : 300 mm
• Scintillation counter and semiconductor detector
• Rocking curve measurement
• Automatic identification of crystal structure with PDF database
• PDXL software based refinement to obtain lattice parameters, unit cell volume
• Crystallite size and lattice strain analysis
• Global Fit XRR Reflectivity Analysis Software
• Reflectivity analysis- FFT film thickness analysis function, surface & interface
roughness, and density analysis function by curve fitting
• Simulation function of reflectivity profile
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Contact: [email protected]
XRD from ZnO and BiFeO3 thin films on
Si substrate
Mat. Sci. Eng. B, 177, 908 (2012)
X-ray reflectivity data
1
2
X-ray Diffraction System with High Spatial Resolution
Fast Detector
Panalytical X’Pert PRO, 2008
TECHNICAL AND CHARACTERIZATION DETAILS
• Capillary samples (ambient and high temperature) and thin films at ambient temperature
Horizontal sample mounting
• Transmission and grazing incidence geometries
• 3 kW X-Ray generator
• CuKα line beam with beam preparation optics
• Hybrid monochromator/Focussing Elliptical mirror assembly
• Soller slits before and after the sample for minimization of out-of-plane reflection
• Scanning range: 1 Deg to 140 Deg
• Minimum step width: 0.001 Deg in accumulation mode
• Variable slit widths
• Fast high resolution PIXCEL solid state multichannel detector
• Temperature range: ambient to 250 deg C, 0.1 K resolution using Mettler hot stage
• Rietveld, Stress and line-profile analysis
Sample in Mettler hot stage
Contact: [email protected]
[email protected]
Elliptical
Mirror
Optics
2 arm
Detector
Source
REPRESENTATIVE ACQUIRED DATA & REFERENCE
XRD profiles from the rotator phase
of an alkane/liquid crystal composite
Langmuir 30, 4465 (2014)
2
3
X-ray Diffractometer with 2D Image plate detector
Xenocs GeniX3D, 2013
TECHNICAL AND CHARACTERIZATION DETAILS
• Operates at 50 kV and 0.6 mA in conjunction with a
single reflection aspheric multilayer optics
• Provides low divergence highly parallel beam with
high photon density Cu Kα (λ = 0. 15418 nm)
radiation
• Detector : 2D Image Plate λ of 345 mm diameter
and 0.1 mm pixel size (Mar345, Mar Research)
• Includes SAXS/ WAXS (~30 nm-0.3 nm)
• Marview, FIT2D software software helps in getting
2D image, 1D profile of the diffraction pattern
• Capillary samples (ambient and high temperature)
• Horizontal sample mounting & Transmission
geometries
200
40
o
Contact: [email protected]
[email protected]
Intensity
(20 (11)
)
18
2 (deg)
26
B1TPAF
(22
)
(40
)
o
Intensity
200
40
B1TPAF
40
B1OPAF2
40
91 C
90 (d)
26
200
B1OPAF2 10
40
(11
)
(20
)
(arb. units)
Intensity
1/2
XRD pattern of 2D tilted
columnar phase
(c)
90
10
85 C
2
3
2Θ (degree)
18
2 (deg)
(22
)
(40
)
o
110 C
18
2 (deg)
(40
)
10
B1OPAF1
40
(22
)
(20
)
Intensity
(b)
90
(11
)
REPRESENTATIVE ACQUIRED DATA & REFERENCE
26
Sm C*
4
XRD patterns of columnar & layered structures in bent core
systems; J. Mater. Chem. C, 1, 7488 (2013)
3
4
X-ray Diffractometer
Xenocs, Genix Cu MAR345, 2009
TECHNICAL AND CHARACTERIZATION DETAILS
• 8 keV Cu K alpha line
• X-ray beam of 1.5 x 1.5 mm sq. Size
• Shielded microfocus tube
• XYZ translation stage
• Mounting base for detector with rail system
• Bragg and tilt adjustments
• 50 W generator, 50 kV/1 mA
• X-ray CCD camera for optic alignment with an X-ray to visible light converter screen
• PIN Diode detector for optics and beam alignment with calibrated response for absolute
flux measurement
• Collimator with 2 transparent screen and 3 pinholes of 0.2 mm, 0.5 mm, 0.8 mm
• Image plate detector and software for data acquisition
REPRESENTATIVE ACQUIRED DATA & REFERENCE
B2
5000
25000
4000
20000
Intensity (a.u.)
Intensity (a.u.)
B1
3000
2000
2
1000
4
6
8
10 12
15000
10000
5000
0
5
10
0
0
5
10
15
20
25
30
0
2θ (degree)
5
10
15
20
25
30
2θ (degree)
(b)
(a)
Intensity versus 2Θ graph and the XRD patterns (inset: small angle region) obtained for the liquid crystal
molecules (a) at 125°C (b) at 145°C.
Liq. Cryst., 40, 1405 (2013).
Contact: [email protected]
[email protected]
4
5
SQUID Magnetometer
Ever Cool MPMS XL, Quantum Design, 2002
TECHNICAL AND CHARACTERIZATION DETAILS
• M-H, M-T, M-Time and AC susceptibility measurements
• Samples: Nanoparticles, powder, thin films, bulk & liquids
• Sample Size : 4 X 9 mm (W(D) x L)
• Samples are typically 10 to 40 mg, but strongly magnetic materials can be measured
with less material
• Magnetic field: +/- 5 T
• Field resolution: 1 Oe
• Field uniformity : 0.01% over 4 cm
• Temperature Range : 10 – 380 K
• Temperature Stability:+/-0.1 K (below 100 K)
• Temperature Stability:+/-0.005 K (above 100 K)
• Sample Space Oven - increases temperature range to 800 K
• Reciprocating Sample Option (RSO) – DC Magnetization absolute sensitivity: < 1 x 10-8
emu
• External device control + transport probe
• MPMS MultiVu: Windows based Software Interface - Automated measurements
• M-H can be measured in the field range +/- 5 T at various temperatures from 10 K to 380
K
• M-T can be measured from 10 K to 380 K at different applied fields and under zero field
• AC susceptibility measurement – 0.1 Hz to 1 kHz, sensitivity: 2 x 10-8 emu at 0 T
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Temperature dependence of magnetization
of La0.67-xBixSr0.33MnO3 (x=0, 0.1, 0.2, 0.3, 0.4
and 0.5), i.e., Bi0, Bi1, Bi2, Bi3, Bi4 and Bi5
with applied field of 1 T in field cooling
mode.
Contact: [email protected]
[email protected]
Enhanced magnetization of BiFeO3 due to ZnO buffer layer ;
Mat. Sci. Eng. B, 2012, 177, 908.
5
6
Semiconductor Characterization System
Keithley Model 4200SCS/F Semiconductor Characterization System with
2 MPSMU
•
Model 4210- SMU (1 no.) - High Power Source-Measure Unit for 4200-SCS. 1A to 100fA,
200V to 1µV, 20Watt
•
Model 4200-PA (3 nos.) - Remote PreAmp Option for 4200-SMU, extends SMU to 0.1fA
resolution
•
Model 4210- CVU (1 no.) - Integrated C-V Option for Model 4200-SCS.(1kHz to 10MHz)
•
Model 4225- PMU (1 no.) - Dual Channel Ultra-Fast IV Unit for 4200-SCS
•
Model 4225- RPM (2 nos.) - Single Channel Remote Amplifier and Switch Module Option
for 4225-PMU
•
Model 8101-PIV (1 no.) - Demo Test Fixture
TECHNICAL AND CHARACTERIZATION DETAILS
• Three I-V source-measure channels
¤ Current Range: 1 pA to 1 A
¤ Current Measure Resolution: 100 aA to 1 µA
¤ Current Source Resolution: 1.5 fA to 50 µA
¤ Voltage Range: 200 mV to 200 V;
¤ Voltage Measure Resolution: 1 µV to 200 µV Voltage Source Resolution: 5 µV to 5 mV;
• One multi-frequency CV measurement
¤ Measuring parameters: Cp-G, Cp-D, Cs-Rs, Cs-D, R-jX, Z-θ
¤ Frequency range: 1 kHz to 10 MHz
¤ AC drive level: 10 mV to 100 mV
¤ DC drive level: -30 V to +30 V
¤ Programmable DC output modes: Bias, Sweep, List Sweep
• Pulsed IV measurement channel
¤ Current Measure Range: 100 nA to 200 mA
¤ Pulse Width: 160 ns to 70 ns
¤ Voltage Source (10V) Range: -10 V to +10 V, 50Ω into 1MΩ
¤ Voltage Source (40V) Range: -40 V to +40 V, 50Ω into 50Ω
¤ Resolution: < 250 µV to <750 µV
¤ Frequency Range 1 Hz to 50 MHz
¤ Period Range Accuracy 20 ns to 1s
¤ Maximum current: +/- 0.8 A
¤ Pulse width with current measure: 60 ns to 999 ms
• Switching capability between DC IV, CV and Pulse IV measurements as detailed below
• Project libraries to extract parameters from two terminal, three terminal & four terminal
devices
6
REPRESENTATIVE ACQUIRED DATA & REFERENCE
0.002
I (A)
0.001
0.000
-0.001
-0.002
-0.4
-0.2
0.0
V (V)
0.2
0.4
Resistive switching behaviour of ZnO/Pt/TiO2/SiO2/Si.
1600
R (Ohm)
1200
V= -0.02 V
800
LRS
HRS
400
0
0
20
40
60
No of cycles
80
100
Retention characteristics of ZnO/Pt/TiO2/SiO2/Si.
Contact: [email protected]
[email protected]
7
7
Low Temperature Resistance and
Magnetoresistance Measurements
Janis cryostat with Shimotomo He compressor, 2010
Keithley Current Source Model 6221 and Nano Voltmeter Model
2182A/E; 7 ½ Digit, Digital Multimeter Model 2010/E; Electromagnet
supplied by Polytronic corporation, 2015
TECHNICAL AND CHARACTERIZATION DETAILS
• Resistance and magnetoresistance measurements
• Temperature range : 15 to 380 K
• Temperature Stability:+/-0.1 K
• Resistivity range: micro to mega ohms
• Automated temperature control and resistance measurement
• Analog control of magnetic field
• Magnetic field sweep: +/- 0.5 T
• Magnetic field resolution: ~ +/-135 Oe
• Manual magnetic field control
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Resistance versus temperature at different applied currents for La0.67Ca0.33MnO3 thin film.
Appl. Phys. Lett. 103, 102408 (2013)
Contact: [email protected]
[email protected]
8
8
MultiFerroic Tester
Radiant Technologies Inc., 2012
TECHNICAL AND CHARACTERIZATION DETAILS
Capable of executing a single pass hysteresis loop in 100μs with no interlacing of the
data acquisition.
• Voltage Range (no external amp) ±200V
Minimum Charge Resolution - 0.8fC
Minimum Area Resolution - 0.08μm2
Maximum Charge Resolution - 5.26mC
Maximum Area Resolution - 52.6cm2
Max Hysteresis Frequency - 250kHz
Min Hysteresis Frequency - 0.03Hz
Minimum Pulse Width - 0.05μs
Minimum Pulse Rise Time (5V) - 400ns
Max Pulse Width - 1s
Max Delay between Pulses - 40ks
Internal Clock - 25ns
Minimum Leakage Current - 1pA
Maximum Small Signal Cap Freq. - 1MHz
Minimum Small Signal Cap Freq - 1Hz
Output Rise Time Control - 105 scaling
Input Capacitance ~60fF
• Hysteresis, pulse response, CV, and IV characteristics
• Fatigue, C(V), PUND, Imprint and Leakage Current measurements
• Link multiple tasks to create a custom program.
• Only room temperature measurement possible.
• We are fabricating a sample holder for low temperature measurement down to 10 K
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Bi0.9Sm0.1FeO3/Pt(111)TiO2/SiO2/Si
0.015
P(μC/cm2)
0.010
Contact: [email protected]
[email protected]
0.005
|
-15
|
-10
|
-5
-0.005
|
5
|
10
V(V)
|
15
-0.010
-0.015
9
9
Gain/phase Analyzer
HP 4194A, 1995
TECHNICAL AND CHARACTERIZATION DETAILS
• High accuracy and wide range-Impedance measurement:
• Series and parallel circuit modes possible
• Frequency range: 100 Hz to 40 MHz,
• Capacitance range: 10fF-0.1F with an accuracy of 0.1 fF
• D range: 0.001-10 with accuracy of 0.0001
• G range: 10nS to 100nS with accuracy of 1nS
REPRESENTATIVE ACQUIRED DATA & REFERENCE
T = 39oC
Permittivity
80
Vp
39.5
50
40
40.5
20
41
41.5
-40
-20
0
20
Bias voltage (V)
40
J. Phys.: Condens. Matter.,23, 105902, (2011).
Contact: [email protected]
[email protected]
10
10
High Pressure Apparatus
1995
TECHNICAL AND CHARACTERIZATION DETAILS
Apparatus fabricated in the laboratory
• Pressure range: 1 bar to 4000 bar, with an accuracy of 4 bar; Radial pressure;
• Temperature range: 300C to 2000C with measuring accuracy of 0.10C
• Different measurements are possible: Laser transmission, Dielectric measurement,
Polarisation, viscosity measurements
REPRESENTATIVE ACQUIRED DATA & REFERENCE
3
r
kb
a
1.1
C" (pF)
0.9
kba
r
T=1630C
9
0.6
2
Contact: [email protected]
[email protected]
ar
kb
8
0.4
r
kba
r
0.28 kba
1
(b)
r
0.07 kba
102
(a)
103
4
0.3 .70 .04
0
1 38 3
1. 1.7
0.0
4
Sample response (V)
Frequency ( kHz )
6
2.0
Applied v
oltage
(V)
P ( kbar )
Phys. Rev. E, 87, 042504 (2013); J. Phys. Chem. B, 115,
10425 (2011).
11
11
Electrostatic Voltmeter
Trek Model 320 C with probe 3250, 2014.
TECHNICAL AND CHARACTERIZATION DETAILS
• Measurement Range 0 to ±100 V DC or peak AC.
• Sensitivity 1 mV.
• Accuracy: Voltage Monitor Output Better than ±0.05% of full scale.
• Voltage Display Better than or equal to ±2 counts, referred to the voltage monitor
• Speed of Response (10% to 90%)
• Less than 300 ms for a 100 V step.
• Stability: Drift with Time Less than 50 ppm/hour, noncumulative.
• Drift with Temperature Less than 50 ppm/°C.
• (1:1 monitor output)
• Drift with Temperature Less than 100 ppm/°C
• Null Voltage Source: A calibrated 10 turn dial representing a 10 volt supply, with switch
selectable polarity, used to produce zero volts output when the probe is coupled to a
known zero volt surface.
• Also used to null contact potentials on dissimilar surfaces.
• Range: ±10 volts
• Accuracy: 1%
• Resolution: 20 mV
• Response Speed Control
• A front panel potentiometer that adjusts the speed/noise tradeoff of the Model 320C AC
response.
• Drift/Spacing Null Adjustment: This back panel adjustment minimizes the
variation in monitored voltage values as the probe to test surface spacing changes.
• Voltage Display, 31/2 digit LED display.
• Range Switch selectable for ±10 V or ±100 V full scale.
• Resolution: 10 V Range 0.01 V.
• 100 V Range: 0.1 V. Zero Offset ±1 count, referred to the voltage monitor.
• Sampling Rate 3 readings per second.
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Contact: [email protected]
[email protected]
Surface potential measurement of octyl cyanobiphenyl
monolayer at the air-water interface
12
12
Rheometer
TA Instruments ARG2, 2005
TECHNICAL AND CHARACTERIZATION DETAILS
• Advanced controlled stress, direct strain and controlled rate rheometer with a
magnetic thrust bearing and a drag cup motor to allow nanotorque control.
• Torque range: 3 nNm to 200 mNm (oscillation) with 0.1 nNm resolution
• Angular Velocity Range: 0 to 300 rad/s
• Frequency Range: 7.5E-7 to 628 rad/s
• Normal Force: 0.005 to 50 N with 0.1 nNm resolution
• Cone-plate and plate-plate geometries
• Samples (melts to fluids) with viscosity range ~ 10mPaS to 10kPaS
• Temperature range -20 to 2000C with +/- 0.10C resolution
• Typical sample thickness for a 20 mm plate-plate geometry is 2 mm.
• Shear viscosity measurements
• Linear and non-linear dynamic characterization
• Determination of yield stresses
• Dynamic testing after different pre-shear histories
• Step-strain measurements
• Monitoring the kinetics of curing
• The device is controlled by Rheology Advantage software.
REPRESENTATIVE ACQUIRED DATA & REFERENCE
2
G',G" (Pa)
10
1
10
10
10
G' (Pa)
Soft glassy behaviour seen in a liquid crystal (LC) gel
0
10
10
10
10
-3
4
3
2
-2
10
10
γ
-1
10
0
Sample: weak gel
No pre shear
Pres shear : 500 /s
1
103
G',G" (Pa)
Contact: [email protected]
[email protected]
Sample: Organogel
γc
10
0
ω (rad/s)
High γ
10
Angular frequency dependence of a LC gel showing
characteristics of a weak gel
1
10
High γ
2
High γ
102
101
100
10-1
0
Low γ
Low γ
G'
G"
Sample: weak gel
500
1000
Time (s)
1500
Step-strain measurements of a LC gel indicating the
robustness of the structure
J. Phys. Chem. B 114, 697 (2010).
13
13
Interfacial Shear Rheometer
KSV NIMA, 2010
TECHNICAL AND CHARACTERIZATION DETAILS
• Dynamic moduli resolution: 0.001 mN/m,
• With KSV NIMA Langmuir Trough: 908 mm x 370 mm x 700 mm
• Surface Pressure sensor: sensitivity of 0.05 mN/m
• Frequency range: 0.06 to 25 rad/s (0.01 to 4 Hz)
• Strain range: 3x10–4 to 1.
• Probe: Magnetized sewing needle suspended in a channel.
• Detector: CCD camera.
• Software for instrument control and data collection.
• Dynamic shear moduli of the monolayer at interface as a factor of surface pressure,
temperature, concentration, frequency and strain dependence can be studied.
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Contact: [email protected]
[email protected]
Dynamic shear moduli of eicosanol monolayer with
surface pressure at the air-water interface.
14
14
UV-Visible Spectrometer
Perkin Elmer Lambda 20, 1996
TECHNICAL AND CHARACTERIZATION DETAILS
• Measures light absorption of samples (solutions & thin films) at different wavelengths
in the range 190 - 1100 nm.
• It is a double beam spectrometer with microcomputer electronics, keyboard entry and
fluorescence display.
• Monochromator: Holographic concave grating with 1053 lines/mm.
• Wavelength accuracy: + 0.3 ran at deuterium peak 656.1 nm.
• Spectral slit width: 2nm.
• Photochromic accuracy: ± 0.005 A at 1 A (measured with NBS 930 filters).
• Reproducibility: + 0.1 nm.
• Noise: < 0.0003 A (at 0 A, 500 nm, 2 sec response time).
• Stability: < 0.0003 A/h (at 500 nm, 1 sec response time, after warm up).
• Ordinate mode: Choice of %T, ABS or conc.
• Response time 0.1; 0 .2; 0 .5; 1 ; 2; 5; 10 sec
• Digital port: RS-232-C/V24 interface for connecting an Epson printer or an Epson PC;
optional second RS-232-C/V24.
• Analog port for connecting an analog chart recorder
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Contact: [email protected]
Absorbance (a.u)
1.5
R
O
N
O
R'
R' = (R)-Octyloxy
1.0
SB(R)-8 : R = OC 8H 17
SB(R)-9 : R = OC 9H 19
SB(R)-10: R = OC 10H 21
SB(R)-11: R = OC 11H 23
SB(R)-12 : R = OC 12H 25
0.5
0.0
250
300
350
400
450
Wavelength (nm)
UV-Vis spectrum obtained for the dilute solutions of the Schiff bases in CH2Cl2
New J. Chem., 39, 2011 (2015).
15
15
UV-VIS-NIR Double Beam Spectrophotometer
Shimadzu UV-3101PC, 2001
TECHNICAL AND CHARACTERIZATION DETAILS
• Films and liquids contained in cuvettes, as samples
• Wavelength: 190nm to 3200nm
• Spectral band width (slit width)
9 steps in ultraviolet/visible region; 0.1, 0.2, 0.5, 0.8, 1, 2, 3, 5, 7.5nm
12 steps in near-infrared region; 0.4, 0.6, 0.8, 1.2, 2, 3, 4, 6, 8, 12, 20, 30nm
• Resolution length range: 0.1nm
• Wavelength scanning speed:
FAST 1600nm/min (with 2nm sampling interval)
FAST 700nm/min
MIDDLE 200nm/min These are the speeds when scanning with 0.5nm sampling
interval.
SLOW 100nm/min
SUPER SLOW 50nm/min
• Switching of the light sources
The light sources are switched automatically in conjunction with wavelength scanning.
The wavelength at which the light sources are switched is selectable in the range of
282nm to 393nm in 0.1nm increments.
• Photometric range
Absorbance: -4~5 Abs (up to 0.001 Abs.)
Transmittance: 0~999.9%T (up to 0.01%)
Reflectance: 0~999.9%R (up to 0.01%)
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Selective reflection from a cholesteric film
100
Transmission (%)
90
79 o C
80
70
Contact: [email protected]
60
77 o C
50
75
oC
70 o C
60 o C
50 o C 35 o C
40
26 o C
30
400
450
500
550
600
650
Wavelength (nm)
Figure 2.24. Selective reflection spectra obtained at different temperatures
for the N* phase of the dimer DTTI-5,8
650
m)
600
550
16
16
UV-Visible-NIR Spectrophotometer with Diffuse
Reflectance
Perkin–Elmer Lambda 750, 2015
TECHNICAL AND CHARACTERIZATION DETAILS
• High performance UV/Vis/NIR double beam, double monochromator, ratio recording
spectrometer.
• Wavelength range 190-3300 nm
• Absorbance, transmission of fluids, thin films and diffuse reflectance of thin films,
powders
• Integrating 100 mm Spectralon coated sphere, which can be used without any
adjustment- reflectance wavelength range 200-2500 nm
• Thin film solid sample holder for thin film transmission measurement
• Tungsten-halogen and deuterium lamp with automatic source change
• Photomultiplier R955 detector for UV/Visible range and peltier cooled PbS detector for
NIR wavelength range
• Spectral bandwidth from 0.17 -5 nm UV/Vis and 0.2 – 20 nm NIR
• Beam splitting system- chopper (46+ Hz, cycle: dark/sample/dark/reference, chopper
segment signal correction CSSC)
• Photometric range- 6 A
• UV/Vis resolution ≤ 0.17 nm ,NIR resolution ≤ 0.20 nm
• System control via the UV-WinLab operating software for compatible Personal
Computers
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Contact: [email protected]
17
17
FT – IR Spectrometer
Perkin Elmer Spectrum 1000, 1996
TECHNICAL AND CHARACTERIZATION DETAILS
• It gives a spectrum (fingerprint profile) of a sample with absorption peaks
corresponding to the frequencies of vibrations between the atomic-bonds
• The spectra of solid samples either in KBr or Nujol mull and liquids (neat) can be
recorded
• Signal-to-noise performance makes it the highest performing, research grade FT-IR
system and provides the highest levels of sensitivity.
• Number of background and sample scan can be set.
• Source: MIR
• Beam split : KBr
• Detector: DTGS (Deuterated triglycine sulphate detector)
• Interferogram: Bi-directional
• J stop size: Size in nm
• Resolution:1.00 cm-1
• IR laser wavenumber: Wavenumber in cm-1.
• Electronically stabilized source and detector for repeatable measurements.
• Scan parameter such as resolution and range can be set.
• Can be used with Mettler Hot stage
• Instrument LCD’s display with go button increase productivity and deliver ease-of-use
H2O/CO2 removal, enhances accuracy and reproducibility of data.
• Spectrum software provides intuitive user operation and helps ensure consistent
results, day-to-day, user-to-user.
REPRESENTATIVE ACQUIRED DATA & REFERENCE
OC12H25
Absorbance (a.u.)
3.0
νC-H(s)
2.4
1.8
1.2
νC-H(as)
νC=O
νN-H
0.6
0.0
1550
1600
2500
3000
1800C
1700C
1600C
1500C
1400C
1300C
1200C
1100C
1000C
90 C
800C
700C
600C
500C
400C
300C
260C
0
OC12H25
C12H25O
H
N
C12H25O
O
OC12H25
O
N
OC12H25
H
Hexacatenar bisamides
3500
Wavenumber (cm -1)
The regions of the FTIR spectra recorded at different temperature intervals during cooling the hexacatenar
bisamides from the isotropic phase.
Tetrahedron, 68, 6528 (2012).
Contact: [email protected]
18
18
Spectrofluorometer
Horiba Jobin Yvon Fluorolog-3, 2008
TECHNICAL AND CHARACTERIZATION DETAILS
• It provides fluorescence, typically occurring within about ~ 10-9 s, (as either an
excitation or emission spectrum) as well as reflectance measurement spectra
• Measures the intensity and the wavelength distribution of the light emitted as
fluorescence from a molecule excited at a specific wavelength or wavelengths within
the absorption band of a particular fluorophore
• Fluorescence of solid samples, solutions, thin film, liquid crystal thin films (as a
function of temperature ) can be obtained.
• Possesses a double –grating monochromator at the excitation position and a single
–grating emission monochromator in an L configuration.
• It features 450 W ozone free Xe source and power supply double Czerny Turner
emission spectrometer with 1200g/mm grating blazed at 500 nm, continuously
adjustable entrance, exit , and intermediate slits operated under computer
• Samples can be analyzed at very low concentrations (sub-picomolar); photon-counting
detection strips noise away from weak signals.
• It monitors the excitation beam with a wavelength-independent reference detector to
correct variations in the intensity of the excitation source.
REPRESENTATIVE ACQUIRED DATA & REFERENCE
OC8H17
OC8H17
C8H17O
O
O
H
H
N
O
O
N
O
C8H17O
H
N
H
H
O
H
O
OC8H17
O
O
OC8H17
OC8H17
C8H17O
OC8H17
Absorption and emission spectra in THF solution (top panels) and in the thin films of the Col phase (lower panels)
obtained for star-shaped LC (left); Inset shows the pictures of solutions as seen without (LHS) and with the
illumination (RHS) of 365 nm light. Note that for thin films of Col phase, the spectra were recorded as a function
of temperature (see RHS traces of lower panels).
J. Org. Chem, 78, 527 (2013)
Contact: [email protected]
19
19
Circular Dichroism Spectropolarimeter
Jasco J-810, 2001
TECHNICAL AND CHARACTERIZATION DETAILS
• Determines the optical purity of chiral molecules
• Measures the left-and right-handed circularly polarized light of optically active
molecules.
• Measures the chiroptical properties of solutions (chiral solutes, viz., peptides and
proteins, dissolved in solvent)
• Determines the chiroptical behaviour of chiral liquid crystal samples (as a function of
temperature)
• Determines the binding constants
• Useful in determining kinetics of folding and unfolding of macromolecules
• Provides thermodynamic parameters from temperature dependencies of CD signals
• Equipped with Mettler FP90 hot stage
• Comprises a variable wavelength polarimeter and absorption spectrophotometer
(163-900 nm)
• Up to four channels can be acquired simultaneously; the internal signals are selected
from CD, FDCD, ORD, LD UV and Fluorescence
• The acquired data are controlled by Jasco’s spectra manager
• Light source: 150 W air cooled Xe lamp or 450 W water cooled Xe lamp (option)
• Detector: Head-on photomultiplier tube
• Modulator: Piezoelastic modulator
• Spectral bandwidth: 0.01 to 15 nm; slit width: 1 to 3000 µm
• Response: 0.5 msec to 32 sec
• Scanning system: Continuous scan& step scan
• Scanning speeds: 1 to 10000 nm/min (continuous scan)
• Data interval: 0.025 to 10 nm (continuous scan); 0.1 to 100 nm (step scan); 0.5 msec to
60 min (time change)
Contact: [email protected]
• CD full scale: ±10, 200, 2000 mdeg
[email protected]
REPRESENTATIVE ACQUIRED DATA & REFERENCE
17
λ = 239 cm-1
CD = 10.6 mdeg
12
CD (mdeg)
7
2
280
-18
λ = 242 cm-1
CD = -12.1 mdeg
N
H
OC10H21
OC10H21
O
N
H
O
OC10H21
OC10H21
L-Leu-L-Leu: (S,S)-Enantiomer
330
OC10H21
OC10H21
380
H
N
O
R,R-Isomer
-8
-13
C10H21O
C10H21O
S,S-Isomer
-3230
H
N
O
λ = 273 cm-1
CD = 11.4 mdeg
C10H21O
λ =275 cm-1
CD = -13.4 mdeg
C10H21O
N
H
O
O
N
H
OC10H21
OC10H21
D-Leu-D-Leu: (R,R)-Enantiomer
wavelength (nm)
25 4a
0
150 oC
130 oC
70 oC
50 oC
-25
-50
-75
20
CD (mdeg)
CD (mdeg)
CD spectra of the dipeptides S,S- & R,R-isomers in CH2Cl2
10
0
4b
o
40 C
60 oC
100 oC
o
120 C
160 oC
-10
290 300 310 320
300 310 320
λ (nm)
λ (nm)
CD spectra of Col phase as a function of temperature of S, S-(a) & R, R-isomer (b). Chem. Eur. J., 14, 10462 (2008).
290
20
20
Mass Spectrometer
JEOL JMS 600H, 1998
TECHNICAL AND CHARACTERIZATION DETAILS
• It is a compact double-focusing, high-resolution, magnetic sector mass equipment
• Measures the accurate mass of a variety of organic samples viz., liquid, solid samples
in solution and neat form (volatile sample) etc.
• It can be used for both qualitative and quantitative analysis by which the structure of
unknown compounds can be tentatively determined.
• Samples with molecular weight up to 700 amu, may be introduced into the ion source
using a direct insertion probe and ionized by electron ionization (EI) and/or chemical
ionization (CI).
EI- works at a impact of 70 eV electrons, designed to produce gaseous ions for analysis
CI - involves proton transfer of H+ from CH5+ and is a form of gas-phase chemistry and
thus, it is softer, less energetic, than EI mode.
• Polar and nonvolatile samples with molecular weight up to 1700 amu, are usually
introduced into the ion source by the FAB probe and ionized by fast atom bombardment
(FAB). FAB mode - works on beam of Argon atoms
• MS route ver.1.8.00 software is used to tune and calibrate, data acquisition and data
reduction
• Magnetic analyzer is used to trap the ions under vacuum (10-5 to 10-8 Torr) atmosphere.
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Cl
%
OC9H19
OC9H19
C9H19O
C9H19O
NO2
NO2
OC9H19
OC9H19
m/e
MS data of structural Isomer. Liq. Cryst., 40, 1477 (2013).
Contact: [email protected]
[email protected]
21
21
Differential Scanning Calorimeter
Perkin Elmer Diamond -Series, 2008
TECHNICAL AND CHARACTERIZATION DETAILS
• Measures melting temperature, heat of fusion, latent heat of melting, glass transition
temperature, crystalline phase transition temperature and energy, precipitation energy
and temperature
• Determines the amount of energy absorbed or released by a sample when it is heated or
cooled, providing quantitative and qualitative data on endothermic and exothermic
processes.
• Measurements are highly quantitative.
• Works on power compensation temperature null principle.
• Comprise independent dual furnaces constructed of Platinum-Iridium alloys with
independent platinum resistance.
• Comprises distributed, platinum resistance thermometers.
• Auto sampler: up to 44 samples can be measured, in series unattended.
• It has ability to be customized through pyris player to meet analysis needs.
• Range: -170°C to 730°C
• Accuracy / Precision ± 0.1°C/ ±0 .01°C.
• Temperature overshoot: 100°C / min.
• Scanning rates: Heating /cooling 0.01°C to 500°C / min.
• High pressure cell: Extends the capability of the power compensation designed to
elevated pressure measurements.
• Straight forward, pure linear heating ramps and isothermal scans.
• Provides clearer information about glass transition event.
• Atmosphere: Static, dynamic including nitrogen, argon, helium carbon dioxide, air,
oxygen over full temperature range.
HeatFlow (mW)
Endo Up
REPRESENTATIVE ACQUIRED DATA & REFERENCE
5
R
Cr
SmC*
I
N*
0
5-
1- 0
SmC*
Cr
40
60
80
100
N* BP
120
140
I
SA (S)-12
SA (R )-12
SA (S)-11
SA (R )-11
SA (S)-10
SA (R )-10
SA (S)-9
SA (S)-9
SA (S)-8
SA (R )-8
SA (R )-8
SA (S)-8
SA (S)-9
SA (S)-9
SA (R )-10
SA (S)-10
SA (R )-11
SA (S)-11
SA (R )-12
SA (S)-12
O
O
R’ = (S)-Octyloxy
SA (S)-8: R=OC8H17 (96%)
SA (S)-9: R=OC9H19 (91%)
SA (S)-10: R=OC10H21 (93%)
SA (S)-11: R=OC11H23 (91%)
SA (S)-12: R=OC12H25 (90%)
O H
N
R'
R’ = (R)-Octyloxy
SA (R)-8: R=OC8H17 (93%)
SA (R)-9: R=OC9H19 (92%)
SA (R)-10: R=OC10H21 (94%)
SA (R)-11: R=OC11H23 (90%)
SA (R)-12: R=OC12H25 (91%)
Contact: [email protected]
160
Temperature (0C)
DSC thermograms recorded during the first heating-cooling cycles at a rate of 5oC for the ten mesogens.
(five pairs of enantiomers)
J. Phys. Chem. B 119, 4539 (2015)
22
22
CHNS/O Elemental Analyser
Perkin Elmer 2400, 2015
TECHNICAL AND CHARACTERIZATION DETAILS
• Determines weight percent carbon, hydrogen, nitrogen, sulfur or oxygen of a variety of
samples
• Built with EA Data Manager software
• Adopts frontal chromatography for simple reliable and accurate measurements
• Multiple modes of operation: CHN or CHNS Mode or Oxygen Mode.
• Readily/conveniently switches between Oxygen and CHN/CHNS modes
• Analysis Times: CHN - 6 mins ; CHNS - 8 mins; Oxygen- 4 mins
• Analytical range: C 0.001-3.6 mg; H 0.001-1.0 mg; N 0.001-6.0 mg; S 0.001-2.0 mg;
O 0.001-2.0 mg
• Sample required for analysis : 1-3 mg
• Detector TCD (thermal conductivity detector).
• Carrier Gas: Helium or Argon.
• Combustion gas: Oxygen.
• Adopts a mixture of two combustion techniques to ensure complete sample
combustion.
• Pneumatic Gas Air, Nitrogen or Argon.
• Up to 60 samples can be position at a time (60 samples can analyzed in series,
unattended)
• The weight of the samples is automatically fed to the system.
• Provides permanent record of instrument timing, leak testing and condition monitoring.
• Laboratory environment: Temperature range 12 to 32 ºC; Humidity 20 - 80%
non-condensing
• Allows for customizable combustion conditions to ensure complete combustion while
minimizing oxygen use.
• Accuracy: ≤ 0.3% - In Helium carrier gas and certified reference materials
• Precision: ≤ 0.2% - In Helium carrier gas using certified reference materials
REPRESENTATIVE ACQUIRED DATA & REFERENCE
R1
R2
R3
H
N N
Contact: [email protected]
H O
O
O
n
O
O
1: n = 4; R 1 = R 3 = H ; R 2 = O C 10H 21; 2: n = 4; R 1 = H ; R 2 = R 3 = O C10H 21
3: n =3; R 1 = R 2 = R 3 = O C 10H 21
Samples
1
2
3
C
Theoretical
Found
Difference
76.32
76.70
-0.38
76.40
76.61
-0.21
76.35
46.00
+0.35
H
N
Theoretical Theoretical
Found
Found
Difference Difference
9.61
3.18
9.51
3.44
+0.1
-0.26
10.10
2.70
10.06
3.01
+0.04
-0.31
10.42
2.37
10.40
2.63
+0.02
-0.26
Remark
Acceptable
Acceptable
Acceptable
23
23
Single Wavelength Null Imaging Ellipsometry
Accurion GmbH EP3, 2010
TECHNICAL AND CHARACTERIZATION DETAILS
• Null imaging ellipsometer equipped with polarizer, analyzer, compensator, objective and
CCD detector.
• Single Wavelength: 532 nm, 15 mW laser source
• Motorized Goniometer:
• Angleofincidence range: 40 – 90 degree
• Angle resolution: 0.001 degree
• Absolute angle accuracy: 0.01 degree
• Speed of motion: variable, approx. 10 degree/second
• XY sample stage: Manual
• Spatial resolution (down to 2 μm).
• 10X Objective (Nikon)
• Ellipsometric precision: Delta/Psi 0.002 deg
• Absolute accuracy 0.1 deg
• Simultaneous measurement on multiple ROI.
• EP3 View software for instrument control and data collection under Windows operating
system.
• Adaptation for a mini Langmuir Trough: 370mm x 75mm x 10mm
• Active vibration isolation.
• Can also serve as Brewster angle microscope (BAM) for visualizing textures and
phases.
REPRESENTATIVE ACQUIRED DATA & REFERENCE
50 µm
Imaging Ellipsometric study of the smectic domains.
Phys. Chem. Chem. Phys. 16, 1276 (2014)
Contact: [email protected]
[email protected]
BAM images for nCB at different
monolayer phases at air/water interface.
J. Appl. Phys. 117, 245311 (2015)
24
24
Research Grade Polarizing microscope
Leica DM4500 P, 2008
TECHNICAL AND CHARACTERIZATION DETAILS
• Polarizing examinations of wide variety of materials such as liquid crystals, minerals,
polymers, gels etc.
• Objectives: 5X, 10X, 20X, 50X
• Automatic diaphragm setting and light intensity
• Constant color intensity control for constant color temperature
• Condenser cap swings in and out automatically
• Transmitted light mode: Polarization contrast, Orthoscopy, Conoscopy , Brightfield,
Phase contrast and Darkfield
• Incident light mode: Polarization contrast and Brightfield
• Fully integrated conoscopy beam path
• Sample thickness ~ a few to tens of microns
• CCD (Leica make) camera with Leica Application Suite software to capture and analyse
the microscopic images.
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Finger-print pattern in N-sol
50 µm
50
µm
Gel fibers in isotropic gel
50 µm
Polarizing microscopic images acquired using DM4500 P in the transmitted light mode
Soft Matter 7, 10151-10161 (2011); ChemPhysChem 14, 331-337 (2013).
Contact: [email protected]
[email protected]
25
25
Polarizing Microscope
Olympus Bx51-75e21p, 2007
TECHNICAL AND CHARACTERIZATION DETAILS
• Source: halogen lamps (30 W and 100 W)
• M Plan Semi apochromat objective, 5X/0.15 W D 20.0mm
• Long working distance M Plan semi apochromat objective 10X/0.25 W D 21.0
• Long working distance M Plan semi apochromat objective 20X/0.40 W D 12.0
• Long working distance M Plan semi apochromat objective 50X/0.80 W D 10.6
• Quadruple, revolving nosepiece,
• Circular rotatable stage, graduated, including stage insert plate
• Interference green contrast filter
• Polarising condenser, N A 0.9-0.18
• 1/4 wavelength retardation plate 1 No
• Polarising intermediate attachment for Conoscopic and Orthoscopic observation
including orientation plate
• Reflected light bright field illumination tube
• With Mettler Hot stage.
REPRESENTATIVE ACQUIRED DATA & REFERENCE
POM textures of bent-core liquid crystal molecules obtained on cooling from the isotropic liquid:
(a) B1 mesophase at 116°C (b) B1 mesophase at 110°C (c) B2 mesophase at 108°C (d) B1
mesophase at 140°C (e) B2 mesophase at 130°C and (f) B1 mesophase at 155°C
Liq. Cryst., 40, 1238 (2013)
Contact: [email protected]
[email protected]
26
26
Optical Fluorescence, Reflection Microscope
Olympus BX51, 2013
TECHNICAL AND CHARACTERIZATION DETAILS
• Optical microscope
• Reflection: Bright field, dark field, DIC
• Reflected fluorescence observation
• Transmission and polarization
• Filters: Built-in ND6, ND25, LBD and few optional filters
• Objectives: LMPLFLN series: 5X, 10X, 20X and 50X
UPLFLN series: 20X and 40X
UPLSAP series: 04X
• Source:
1. 100 W mercury lamp
2. 75 W Xenon lamp
3. 100 W Halogen lamp
• Detector: CCD Camera (Model DP73 interfaced with microscope)
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Dye doped smectic domain transferred onto a
ITO coated glass substrate.
Liquid Crystals, 2014, 41, No. 320 (2014)
Contact: [email protected]
[email protected]
Normalized area of the dye doped smectic domain with time, deduced from images.
Soft Matter 8, 11180 (2012)
27
27
Research Grade Polarizing Microscope with
Confocal Capability and Digital Imaging System
Carl Zeiss Axio imager M1m 2008
TECHNICAL AND CHARACTERIZATION DETAILS
• Motorized polarizing microscope for incident and transmitted light studies
• Z-drive: stepsize 25 nm.
• Objectives (working distance in parentheses):
Plan-Apochromat 63X/1.40 Oil (0.19 mm);
LD Epiplan-Neofluar 50X/0.55 (9 mm);
Epiplan-Neofluar 50X/0.8 (0.58 mm);
Epiplan-Neofluar 20X/0.5 (2.1 mm);
LD Epiplan-Neofluar 20X/0.22 (12.1 mm);
LD Epiplan 20X/0.4 (7.2 mm);
Epiplan 10X/0.2 (18.4 mm);
Epiplan-Neofluar 10X/0.25 (9.3 mm);
Epiplan-Neofluar 5X/0.13 (15.8 mm).
• Compensators: Tilting K 0-30λ; tilting 0-5λ; Wedge 0-4λ; λ and λ/4 plates
• High-resolution digital imaging: AxioCam MRc5 Camera; software for time-lapse
imaging.
• Sources: Halogen lamp 12 V/100 W Adjustment of light source continuous, approx. 3 to
12 V
• Mercury vapor lamp HBO 100 W; HBO 50 W with fibre-optic coupling
• LSM 5 Laser Scanning Microscope Exciter with:
Sources: Multiline Ar laser 458/488/514 (25 mW), He-Ne laser (1 mW)
Detector: single channel PMT detector in reflection; Transmitted light photodetector.
• Microscope Hot-Stage: INSTEC HCS402 (Ambient–4000C) with STC 200 Temperature
Controller http://www.instec.com/pdf/brochures/C31-1-HCS402.pdf
• Accessories for electric-field effects:
Function Generator: Stanford Research Systems SRS Model DS 345 30MHz
Voltage Amplifier: FLC Electronics A800 (x100)
Multimeter: Model Keithleyl 2002
Photosensor Amplifier: Model Hamamatsu Type C9329 with Si detectors.
http://www.hamamatsu.com/jp/en/C9329.html
PC Oscilloscope PICO 4262
Contact: [email protected]
[email protected]
28
REPRESENTATIVE ACQUIRED DATA & REFERENCE
(Left) Electric-field-induced cylindrical loop-wall in a suspended nematic film captured
in birefringence contrast. (Right) Continued division of the loop-wall under high
electrical stress; J. Phys. Chem. B, 112,13509 (2008).
Z-stacked LSM images of grain boundary between oppositely twisted regions of a smectic C
liquid crystal, showing focal conic domains.
Picoscope recording of optical response of a nematic sample to an applied saw-tooth wave.
29
28
Field Emission Scanning Electron Microscopy
(FESEM)
TESCAN-MIRA 3 LMH, 2014 and
Energy Dispersive X-ray Spectrometer (EDS)
QUANTAX 200 with XFlash BRUKER, 2014
TECHNICAL AND CHARACTERIZATION DETAILS
• 2X to10,00,000X Magnification
• High vacuum and low vacuum ( up to 500 Pa) imaging
• IR camera for chamber view
• Everhart-Thornley type detectors with YAG scintillators
• Chamber SE detector, Resolution-1.2 nm at 30 kV (SE: Secondary electrons)
• In-Beam SE detector,Resolution-1.0 nm at 30 kV
• In-Beam backscattered SE detector , Resolution-2.0 nm at 15 kV
• Low vacuum SE detector with differentially pumped detection chamber and a
dedicated turbo molecular pump , Resolution-3.0 nm at 30 kV
• Beam deceleration mode (BDM) with in-Beam annular SE detector for thin films,
semiconductors and also for specimens prone to radiation damages, Resolution 1.8nm at 1kV
• Air cooled column
• Pneumatic anti-vibration suspension system
• Accelerating voltage- 50 V to 30 kV in steps of 10 V
• Probe current 2 pA to 200 nA
• Probe current detector
• Field of view- 6.4 mm at WD 10 mm and 20 mm at WD 30 mm
• 20 ns to 10 ms per pixel scanning speed (Adjustable continuously)
• Selectable image frame size up to 8192 X 8192 pixels
• Point & line scan, image rotation & shift and tilt compensation
• Sample stage movements : Motorized X,Y,Z = 80 mm, 60 mm, 47 mm respectively
Rotation = 360 deg - motorized
Tilt = -800 to +800 - motorized
• Compucentric stage
• Multiple specimen holder
• Fixed Scanning transmission electron microscope (STEM) Detector
• Sample prepared using standard TEM grids for sample insertion
• Resolution in high vacuum- 0.8 nm at 30 kV
• Bright field and dark field imaging
• Energy Dispersive X-ray Spectrometer (EDXS) having
• Peltier cooled Silicon drift detector (SDD)
• Detection from Boron (5) to Americium (95)
• Maximum input count Rate > 1000 kcps
• 30 mm2 Active Area
• Resolution <129 eV (MnKalpha)
• QUANTAX-Signal processing unit SVE 6, for high output count rates
• ESPRIT Quant-automatic software tools for standardless quantitative spectra analysis
• Image acquisition from SE, BSE sources (selectable)
• Multi point, line scan and mapping (ultra fast digital elemental mapping with unlimited
number of elements), histograms, binary and ternary charts
30
400
20
30
40
50
60
70
80
Temperature (oC)
Figure 2.25. Temperature dependence of λmin in the N* phase of the
dimer DTTI-5,8
REPRESENTATIVE ACQUIRED DATA & REFERENCE
ZnO Nanorods
(In-Beam SE)
Zeolite (Low vacuum mode)
Au on carbon (In-Beam SE & BSE image)
Au on Si- SE-BDM image at 1 kV
STEM Image of Carbon
Nanotubes (CNTs) (TE Bright
field)
31
REPRESENTATIVE ACQUIRED DATA & REFERENCE
EDS elemental mapping & spectra of Cr-Ni steel as a
standard sample
Contact: [email protected]
Quantification of EDAX spectra of Cr-Ni steel
Element
Series
[wt.%]
Iron
K-series
Chromium K-series
Carbon
K-series
Nickel
K-series
Silicon
K-series
Total:
unn. C
[wt.%]
67.70
16.71
8.28
7.57
0.33
100.59
norm. C
[at.%]
67.30
16.61
8.23
7.52
0.33
100.00
Atom. C
[wt.%]
51.29
13.60
29.16
5.46
0.50
100.00
Error (3 Sigma)
5.50
1.45
4.42
0.75
0.13
32
29
Atomic Force Microscope
Agilent Technologies 5500, 2010
TECHNICAL AND CHARACTERIZATION DETAILS
Imaging Modes:
• Contact Mode AFM & F-Z spectroscopy for topography imaging and force
measurements
• Intermittent Contact Mode AFM & F-Z spectroscopy
• Scanning Tunneling Microscopy & Spectroscopy
• Kelvin Probe Microscopy for mapping surface potential
• Magnetic Force Microscopy for mapping magnetic domains
• Electric Force Microscopy for mapping electric field gradient
• Current Sensing Atomic Force Microscopy & I-V spectroscopy for current images
• Piezoresponse force microscopy and spectroscopy
• Nanolithography for patterning nanometer-scale structures
Sample types: Thin films, polished solids, dispersed powders on substrates like silicon,
HOPG, Au/mica, quartz
• Sample dimensions: X,Y (max) 20mm, 35mm for ambient AFM imaging, XY (max)
20mm for liquid cell AFM imaging
Top down multipurpose closed loop large scanner (XY 90μm, Z 8μm), resolution for small
area scans <500nm x 500nm, with interchangeable nose-cones for STM, AFM, CSAFM,
AC-AFM
• Top down multipurpose open small scanner (XY 9μm, Z 2μm), provides atomic
resolution, with interchangeable nose-cones for STM, AFM, CSAFM, AC-AFM.
• Scanners compatible with environmental and temperature control options
• STM scanner (XY 10 μm, Z 1.6 μm)
• AFM head with easy laser alignment and high resolution CCD camera
• Vibration and acoustic isolation chamber
• Heating sample stage (up to 250°C)
• Liquid cell imaging
• Environmental control chamber
• PicoView software capable of real-time 3D data rendering
• PicoImage software for analysis and post-processing images
• PicoLith software for nanolithography
Contact: [email protected]
33
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Contact mode AFM:
Pt Grating on a silicon
grid (Topography &
Deflection channels).
Intermittent contact mode AFM: Cellulose acetate (Topography, Amplitude and Phase channels)
Scanning Tunneling
Microscopy: HOPG
substrate (Topography & Current
channels)
Kelvin Probe
Microscopy:
Perfluoroalkyl-alkane
Topography and
Surface Potential
channels
34
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Magnetic Force
Microscopy: Video
tape (Topography and
Phase channels)
Electric Force
Microscopy:
Perfluoroalkyl-alkane
(Topography and
Phase channels)
Current Sensing AFM:
HOPG substrate
(Topography and
Current channels)
Piezoresponse Force
Microscopy: Electric
field patterned
Lithium Niobate
(Topography and
piezoresponse)
Nanolithography:
scratching on
compact disc
35
30
Langmuir - Blodgett Trough
KSV - NIMA 2000, 2009
TECHNICAL AND CHARACTERIZATION DETAILS
• Compression/relaxation isotherms
• Dilational rheology
• Analysis of monolayer kinetics
• Dipping: Langmuir-Blodgett film deposition
• Dimension: 580 mm x 150 mm x 10mm
• Surface pressure sensor: sensitivity 0.05mN/m
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Surface pressure-area per molecule isotherms recorded
for n-alkyl cyan biphenyl materials .
J. App. Phy.,117, 245311 (2015).
Contact: [email protected]
[email protected]
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Alternate Layer Langmuir - Blodgett Trough
KSV - NIMA 5000, 2011
TECHNICAL AND CHARACTERIZATION DETAILS
• Compression/relaxation isotherms
• Dilational rheology
• Analysis of monolayer kinetics
• Dipping: Langmuir-Blodgett film deposition
• Surface Pressure Sensor: Sensitivity - 0.05 mN/m
• Alternate Langmuir-Blodgett film deposition
• Has two compartments with a movable arm : Combination of two troughs so as to
facilitate deposition of two monolayers simultaneously.
• Dimension of each compartment: 775 mm x 120 mm
• Total subphase volume : 6L
REPRESENTATIVE ACQUIRED DATA & REFERENCE
Surface pressure – area per molecule isotherms for
graphene oxide and cholesterol at air-water interface.
Contact: [email protected]
[email protected]
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Thermal Vacuum Evaporator
Vacuum Techniques, 2014
TECHNICAL AND CHARACTERIZATION DETAILS
• Vacuum coating unit for thin film depositions
• Belljar – chamber diameter = 30 cm & height = 50 cm, compatible to 10-6 mbar
• Adjustable source - substrate height
• Resistive heating of the source material
• Radiant heater for substrate heating (up to 300°C)
• Substrate rotation
• Rotary pump speed 250 L/min
• Diffusion pump speed 280 L/sec (facility with LN2 trap)
• HT Power supply for ion cleaning (3.5KV, 5mA)
• LT power supply (10V, 200A and 20V, 100A)
• Thickness monitor based on quartz crystal
• Mo and W boats, W filaments
• Four exchangeable feedthroughs
Contact: [email protected]
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RF/DC Sputtering System
VR Technologies, 2013
TECHNICAL AND CHARACTERIZATION DETAILS
• Two magnetron sputtering electrodes (Sputtering down configuration)
• Diffusion vacuum pumping system
• RF Power supply (Model: R601, SEREN IPS Inc, USA) - 600 W, 13.56 MHz
• DC supply: 50-1000 V
• Substrate heater upto 900°C
• Substrate rotation for uniform deposition
• Mass flow controllers (AALBORG, USA); - Two nos. (Ar&O2)
• Source shutter
• Deposition of oxide films, such as, ZnO, Manganites, Multiferroics,
• Deposition of metal films, such as, Au, Cu, Al, Fe, Ni, Mn, Co,
• Shadow masking possible
• In situ deposition of bilayers/multilayers possible
Contact: [email protected]
[email protected]
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For instrument access, please write to
[email protected]
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Prof. U.R. Rao Road, Jalahalli, Bangalore 560013.
Phone: +91-80-2308 4200 Fax: +91-80-2838 2044
Email: [email protected] Website: www.cnsms.res.in
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Contact:[email protected]
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Contact: [email protected]
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