Products Guidance
GAS
LIQUID
VACUUM
ANALYSIS
Products Guidance
Combined catalog
sFlow
Control Technology
Control Technology
sLiquid Source Vaporization Technology
sVacuum Measurement Technology
sHigh-Precision FTIR Gas Analyzers Technology
sPressure
Products Guidance
Combined catalog
Vacuum Measurement
Technology
High-Precision FTIR Gas
Analyzers Technology
Flow Control Technology
Liquid Source Vaporization
Technology
Pressure Control Technology
http://www.horiba-stec.jp
11-5 Hokodate-Cho, Kamitoba, Minami-Ku,
Kyoto JAPAN 601-8116
TEL.(81)75-693-2314 FAX.(81)75-693-2311
Printed on 100% recycled paper.
Catalog No. PG-AE83A
Printed in Japan
GAS
LIQUID
VACUUM
ANALYSIS
With the spirit of inquiry for the future, HORIBA STEC,
the Worldwide leader in fluid controls, consistently offers
advanced products that are one step ahead.
HORIBA STEC has continued the pursuit of precision flow control
technology. In the MFC field, HORIBA STEC developed the first
digital mass flow controllers as well as compact mass flow controllers
that have become the de facto standard in high tech industries.
Wherever there is the requirement for reliable, precise control of
fluids you will find HORIBA STEC fluid control products. One of
the key areas where high performance is demanded is the IT industry.
Semiconductor devices and LCD panels are the foundation of our
society. HORIBA STEC continues to perform research and
development to support these critical devices with the goal of
improving functionality while developing new technology for
the future. HORIBA STEC’s technology has come to be recognized
as a critical technology in the semiconductor manufacturing process.
This process is at the forefront of semiconductor technology
development, and HORIBA STEC has grown into the world’s top
manufacturer of mass flow controllers.
Advanced semiconductor device technology is now designed at
the nano-technology level. This means that today’s semiconductor
manufacturing processes require both extremely precise fluid control
used in the production of thin films and the compact in-situ
monitoring that relays conditions in the processing chamber.
HORIBA STEC, which has always been a technology development
company, continues to evolve its unique technology while applying
the overall analysis expertise of HORIBA Group companies to
the semiconductor and other high tech manufacturing processes.
The combination of HORIBA Group companies’ technologies has led
to high performance, high reliability, and multifunctional products
which the world has never seen before.
We present the world’s most advanced flow control devices.
We hope to partner with you as we “Explore the future” together.
Products Guidance
Combined catalog
sWhat is a mass flow controller?
03
sDigital mass flow controllers
05
SEC-Z500 series, SEC-Z10D/Z10DW series, SEC-F700 series, SEC-V100D series
sPiezo actuator type mass flow controllers
11
SEC-7300 series, SEC-4400 series, SEC-4401/4501
sSolenoid actuator type MFCs
15
SEC-G100 series, SEC-E400J series, SEC-E40 series, SEC-6470/6480
sHigh temperature type/Thermal valve type MFCs
19
SEC-8000/2000 series, SEC-400 series
sPeripherals
23
SF-1U/2U, MFT-20
sPressure controllers
29
UR-7300 series, GR-100 series, PV-1000/2000 series, EC-5000 series
sLiquid Source Vaporization Technology
35
LF/LV, MI/MV, VC, LSC-A100, LU-A100, TL
sVacuum Measurement Technology
41
RGA: Micropole™ System, VG
sHigh-Precision FTIR Gas Analyzers Technology
45
FG, IR
sHORIBA Group total solutions
51
sWorld service network
53
GAS
What is a mass flow controller?
A mass flow controller is a device that measures and controls the mass flow
rate of fluids. Flow rate measurement of fluids generally uses either volumetric
or mass flow rate. With volumetric flow rate measurement, the ambient
temperature and pressure of the fluid being measured affect the volume, and
accurate measurement requires correcting for any changes in the environment
during the measurement process. With mass flow rate measurement, on the
other hand, the mass (weight) of the fluid is measured, so there is no need to
correct for changes in the measurement environment. Mass flow controllers
are widely used as flow rate controllers in processes that demand high
precision flow rate measurement and control, such as the semiconductor
manufacturing process. HORIBA STEC offers a varied lineup of mass flow
controllers, including digital models that feature CPUs and are compatible
with DeviceNet™, to suit every customer’s needs.
s Design and operating principles
s Flow rate sensor
The basic design of a mass flow controller, as illustrated below, includes a flow rate
sensor, bypass, valve, and electrical circuits. The gas, which enters from the inlet,
first splits to flow past the sensor or through the bypass. At the sensor, the mass
flow rate is detected as a proportional change in temperature and converted by
the bridge circuits to an electrical signal. This signal passes through the amplification
and correction circuits, and is output to the outer portion of the unit as a linear
voltage between 0 and 5 V. At the same time, it is also sent to the comparison
control circuit. The comparison control circuit compares the flow rate setting signal
from the outer portion of the unit (0 to 5 V) and the actual flow rate signal from
the sensor and sends a difference signal to the valve driving circuit. The flow rate
control valve moves as appropriate to make the difference signal approach zero.
In other words, the unit controls the flow so that it is always at the set flow rate.
The mass flow rate sensor in a mass flow controller is called a thermal
mass flow rate sensor. HORIBA STEC’s sensors consist of stainless steel
capillary tubes wrapped in double exothermic resistance wire and
a bridge circuit. Sending an electric flow through the exothermic
resistance wire makes it hotter. When fluid is passed through the heated
capillary tubes, a temperature difference is created between the bottom
and the top of the flow. This temperature difference is converted into
an electrical signal by the bridge circuit, enabling measurement of the flow
rate of the fluid.
Internal diagram
Temperature distribution in the flow rate sensor
Drive electric source
Flow rate output signal
Flow rate setting signal
Correction
circuit
Amplification
circuit
Flow rate sensor
Laminar flow
element bypass
Inlet
Bridge circuit
When gas is not flowing
Comparison
control circuit
Valve drive
circuit
Piezo actuator
Flow rate control valve
Metal diaphragm
Outlet
Temperature
03
When gas is flowing
Sensor temperature distribution
What is a mass flow controller? 04
s Laminar flow element bypass
s Flow rate control valve
The sensor perceives the flow of gas as a change in temperature, and since
capillary tubes are used, there is a limit to the flow rate that can be used.
To increase the flow rate range, a bypass that has extremely similar
differential pressure flow rate characteristics to the sensor (a laminar flow
element bypass) is attached in parallel. This increases the flow rate range to
the total combined flow rate of the sensor and the bypass. The figure below
illustrates that the divided flow ratio is not affected by external factors such
as ambient temperature and pressure, and that there is no change in
precision within the flow rate range owing to the use of the bypass, thanks to
its special characteristics. The linearity is superb, since the bypass has
the same differential pressure flow rate characteristics as the sensor, which
makes it the ideal element for this purpose.
There are three types of valves that can be used in a mass flow controller:
piezo actuator valves, thermal actuator valves, and solenoid actuator valves.
HORIBA STEC, which pioneered the development of the piezo actuator valve,
uses the distortion generated in piezo elements when voltage is applied to
a piezo stack to drive its piezo actuator valve. The use of a metal diaphragm
in the valve makes it possible to produce all metal, ultra clean mass flow
controllers. A thermal valve is a valve whose aperture changes continuously
in accordance with the amount of electric current passing through a heater
wrapped around an expansion axle. HORIBA STEC also manufactures
solenoid valves that use a solenoid. Whatever the use, there is sure to be
a valve in the HORIBA STEC lineup that is appropriate for it.
Flow rate (mL/min.)
Flow rate (mL/min.)
Sensor and bypass differential
pressure flow rate characteristics
Gas flow through the sensor
and bypass portions of
the mass flow controller
Sensor
20
Control valve types
15
10
5
QS
0
Bypass
2,000
5
10
15
20
25
Differential pressure (mm H2O)
30
Q
QB
Bypass
1,500
1,000
Q=QS+QB
QB =k
QS
500
0
5
10
15
20
25
Differential pressure (mm H2O)
30
Q: Total flow rate
QS: Sensor flow rate
QB: Bypass flow rate
k: Divided flow ratio
Piezo actuator type
Thermal actuator type
Solenoid actuator type
05
GAS
Digital Mass Flow Controllers
Gas supply systems require devices that are ultraclean, compact, and support greater circuit integration,
and lately there is increasing demand for devices that
offer highly intelligent functioning in more intelligent
gas supply systems as well. Mass flow controllers are
commonly considered the core of gas supply systems,
and the advance of digital mass flow controllers with
CPUs is the focus of a great deal of attention.
HORIBA STEC succeeded in developing the world’s
first mass-produced digital mass flow controller in
1990. Since then, digital mass flow controllers have
come to be regarded as high-end products. HORIBA
STEC has consistently pursued the advance of digital
mass flow controllers through the development of
new functions and the improvement of existing
functions, including the creation of higher
performance CPUs, the addition of DeviceNet™
communications compatibility, and the expansion of
software capabilities to push mass flow controller
performance to its limit.
Digital Mass Flow Controllers 06
SEC-Z500 series
Multi Range Multi Gas
digital mass flow controllers
Cutting edge models with DeviceNet™ or Digital communications
sAdvanced High reliability 32bit CPU installed.
s10SCCM-10SLM FS (standard gas) is covered by 6MFCs.
sGas and FS flow specification are available to change easily by user. (MRMG function)
sHigh precision. (Set point accuracy)
sFast Response across the whole flow range. (Variable PID function)
sAnalog/Digital (RS485) control mode or DeviceNet Interface available.
(Passed the ODVA (DeviceNet Association) SEMI SIG conformance test.)
sCompact
SEC-Z512: Compatible with 1.125 inch pitch gas panel.
SEC-Z512/522: 106mm between VCR surface (Compatible with 1.5 inch gas panel.)
SEC-Z10D/Z10DW series
DeviceNet™ compatible
digital mass flow controllers
Cutting edge models with DeviceNet™ communications
sCompatible with the DeviceNet™ interface: Passed the ODVA
(DeviceNet™ Association) SEMI SIG conformance test.
sFull scale 5 SCCM to 100 SLM flow rate lineup.
sFast response in the control flow rate range.
sUltra clean models featuring piezo valves.
sCompact
SEC-Z11D/Z12D: Compatible with 1.125 inch pitch gas panels
SEC-Z10DW/Z12DW: 106 mm between VCR type surfaces
(Compatible with 1.5 inch pitch gas panels)
SEC-F700 series
Digital mass flow controllers
The pioneer series of digital mass flow controllers
sHigh precision: By using a digital linearizer (polynomial calibration
curve). Up to five calibration can be stored curve internally.
sFast response: Have digital PID for fast response in a low flow
rate range.
sA variety of alarms alert the operator to changes in the gas
quickly, averting trouble.
sSensor alarm functions: The mass flow controller determines if
there are changes in the control conditions and outputs an alarm.
sUltra clean models featuring piezo valves.
sCompact: 106 mm between surfaces, suitable for integrated gas
panels.
SEC-V100D series
High precision models offering set point precision
sHigh precision: Set point ± 1.0% (30 to 100% F.S.)
sFast response: Quick start function and response times of
under a second.
sA lineup of models that are not affected by orientation: A MF
(mount-free) sensor that prevents thermal siphoning through its
construction (MF models option).
sCompletely interchangeable with analog mass flow controllers.
sCompact: 106 mm between surfaces, suitable for integrated
gas panels.
Digital mass flow controllers
07
GAS
SEC-Z500 series
Model
SEC-
Z512MG (DeviceNet™ model: Z514MG)
Z522MG (DeviceNet™ model: Z524MG)
M: type, SUS316L, internal surface polishing standard
Materials used in gas contact area
Open at power-off: O
Valve Type
Close at power-off: C
#07: 30/#08: 50 SLM
#01: 30/#1.5: 55/#02: 100/#2.5: 175/#03: 300/#3.5: 550 SCCM
#04: 1/#4.5: 1.75/#05: 3/#5.5: 5.5/#06: 10 SLM
Standard Flow Range
(N2 Equivalent F.S.)
*Available for N2,H2,Ar,O2 Please contact us if you need another gases others
2 to 100% F.S.
Flow Rate Control Range
Response speed
Less than 1 sec across the entire flow rate control range (T98)
Accuracy
± 1.0%S.P.(30 to 100%F.S.) ± 0.25%F.S.(2 to 25%F.S.)
(Description in accordance with SEMI STANDARD E56-1296)
Linearity
± 0.5% F.S.
Repeatability
± 0.2% F.S.
50 to 300kPa (d) [0.5 to 3.0kgf/cm2 (d)]
(#5.5 and #06 100 to 300kPa(d)
Operating differential pressure
#07: 200 to 300kPa(d)
#08: 200(valve C)/250(valve O) to 300kPa(d)
450 kPa (G)
Maximum operating pressure
1MPa(G)
Pressure Resistance
less than 5 x 10-12 Pa·m3/s (He)
Leak Integrity
Operating Temperature
5 to 50°C
Flow rate setting signal
Digital: RS-485 (F-Net protocol)
DeviceNet™: (SEC-Z514MG/Z524MG)
Analog: 0.1 to 5VDC (Input impedance : more then 1MΩ)
Flow rate output signal
Digital: RS-485 (F-Net protocol)
DeviceNet™: (SEC-Z514MG/Z524MG)
Analog: 0 to 5VDC (Minimun load resistance 2kΩ)
+15V ± 5% 150mA -15V ± 5% 150mA DeviceNet : Conforms to ODVA standard (rated value 24VDC (11 to25VDC) 3.5VA
Drive Power Source
1/4"VCR Type or IGS
Standard Fitting
*SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0°C, 101.3 kPa).
SEC-Z10D/Z10DW series
Model
SEC-
Z10D
Z12D
Z13D
Materials used in gas contact area
Open at power-off: O
Closed at power-off: C
Valve type
Standard flow rate range
(N2 equivalent F.S.)
Z11DW
Z12DW
Z13DW
M: type, SUS316L, internal surface polishing standard
5/10/20/30/50/100
200/300/500 SCCM
1/2/3/5 SLM
Flow rate control range
Closed at power-off: C
10 SLM
20/30 SLM
Open at power-off: O Close at power-off: C
5/10/20/30/50/100
200/300/500 SCCM
1/2/3/5 SLM
100 SLM (H2, H2)
10 SLM
20/30 SLM
5 to 100% F.S.
2 to 100% F.S.
100 SLM
(H2 200 SLM: Option)
50 SLM
2 to 100% F.S.
Less than 1.5 sec (T98)
Less than 1 sec (T98)
Response speed
± 1% F.S.
Accuracy
Linearity
± 0.5% F.S.
Repeatability
± 0.2% F.S.
Operating differential pressure 50 to 300 kPa (d) 100 to 300 kPa (d)
Maximum operating pressure
20 SLM: 150 to 300 kPa (d)
30 SLM: 200 to 300 kPa (d)
N2: 350 to 400 kPa (d)
H2: 250 to 300 kPa (d)
150 to 300 kPa (d) 200 to 300 kPa (d) 150 to 300 kPa (d) 200 to 300 kPa (d)
N2: 400 kPa (G)
H2: 300 kPa (G)
300 kPa (G)
100 SLM: 150 to 300 kPa (d)
H2 200 SLM: 200 to 300 kPa (d)
300 kPa (G)
Pressure Resistance
1 MPa (G)
less than 5 x 10-12 Pa·m3/s (He)
Leak Integrity
5 to 50°C (accuracy guaranteed between 15 and 45°C)
Operating temperature
Conforms to ODVA standard (rated value 24 VDC (11 to 25 VDC)) 3.5 VA
Drive power source
Connector position
Standard Fitting
Top or sides
Top
Top or sides
Top
1/4 VCR type or IGS
3/8 VCR type or IGS
1/4 VCR type or IGS
3/8 VCR type
*SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0°C, 101.3 kPa).
SEC-F700 series
Model
SEC-
F730
F740
Materials used in gas contact area
Valve type
Standard flow rate range
(N2 equivalent F.S.)
Open at power-off: O Close at power-off: C
5/10/20/30/50/100
200/300/500 SCCM
1/2 SLM
3/5/10 SLM
20/30 SLM
2 to 100% F.S.
Flow rate control range
Less than 1 sec (T98)
Response speed
Accuracy
20 to 100% ± 0.8% F.S./2 to 20% ± 0.3% F.S.
Linearity
± 0.5% F.S.
± 0.2% F.S.
Repeatability
Operating differential pressure
F750
M: type, SUS316L
20 SLM: 100 to 300 kPa (d)
30 SLM: 100 to 300 kPa (d)
5 SCCM to 5 SLM: 50 to 300 kPa (d)
10 SLM: 100 to 300 kPa (d)
Maximum operating pressure
Pressure Resistance
Leak Integrity
300 kPa (G)
1 MPa (G)
5 x 10-12 Pa·m3/s (He)
Operating temperature
5 to 50°C (accuracy guaranteed between 15 and 35°C)
Flow rate setting signal
Digital: RS-422A (F-Net protocol)
Analog: 0.1 to 5VDC (Input impedance : more then 1MΩ)
Flow rate output signal
Digital: RS-422A (F-Net protocol)
Analog: 0 to 5VDC (Minimun load resistance 2kΩ)
Drive power source
Standard Fitting
*SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0°C, 101.3 kPa).
+15 VDC ± 5%, 140 mA
-15 VDC ± 5%, 120 mA, 3.9 VA
1/4 VCR type or IGS
Digital Mass Flow Controllers 08
SEC-V100D series
flow
SEC- ( mass
controller )
flow
)
SEF- ( mass
meter
Model
V110D
V110D
V120D
V120D
Materials used in gas contact area
M: type, SUS316L, PTFE, magnetic stainless steel
Valve type
Close at power-off: C
Open at power-off: O Close at power-off: C
Standard flow rate range
(N2 equivalent F.S.)
10/20/30/50/100/200/300/500 SCCM
1/2/3/5/10 SLM
20/30/50 SLM
2 to 100% F.S.
Flow rate control range (for SEC series)
0 to 100% F.S.
Flow rate control range (for SEF series)
Less than 1 sec (T98)
Response speed
Accuracy
± 1.0% within S.P [30 to 100% F.S.]/ ± 0.3% within F.S. [2 to 30% F.S.] (Description in accordance with SEMI STANDARD E56-1296)
Linearity
Within ± 0.5% F.S.
Within ± 0.2% F.S.
Repeatability
150 to 300 kPa (d)
50 SLM: 250 to 300 kPa (d)
50 to 300 kPa (d)
10 SLM: 100 to 300 kPa (d)
Operating differential pressure*1
(for SEC series)
Operating differential pressure*1
300 kPa (G) or under
Pressure Resistance
1 MPa (G)
Leak Integrity
5 x 10-12Pa·m3/s (He)
Seal method
Metal seal
5 to 50°C
Operating temperature
0.08% F.S./°C
Temperature influence span
Flow rate setting signal
Digital: RS-422A (F-Net protocol)
Analog: 0.1 to 5VDC (Input impedance : more then 1MΩ)
Flow rate output signal
Digital: RS-422A (F-Net protocol)
Analog: 0 to 5VDC (Minimun load resistance 2kΩ)
+15 VDC ± 5% 150 mA/-15 VDC ± 5% 250 mA
+15 VDC ± 5% 150 mA/-15 VDC ± 5% 200 mA
Drive power source
1/4 VCR type or IGS
Standard Fitting
Quick start function*2, auto-close function*2, valve voltage function*2,
auto-zero function (SEC-V110DM) *2, zero adjustment switch
Standard expanded functions
*1 Maximum inlet pressure is 300 kPa (G).
*2 Compatible with SEC series.
*Mount-free sensor (MF sensor) can also be used.
* SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0 °C, 101.3 kPa).
SEC-Z500 series
s High Accuracy
Linearity is compensated by polynomial approximated carve
MFC's linearity is compensated by polynomial approximated
curve. This achieves high accuracy for all flow control ranges.
For the purpose of advancement of actual gas accuracy,
the calibration data of various process gases are measured by
HORIBA STEC standard gas measurement system.
±1.0% S.P. : 25 –100% F.S.
±0.25% F.S. : < 25% F.S.
15
4
Accuracy (% S.P.)
Sensor output (V)
Accuracy
5
3
2
1
60% 80%100%
5
4
3
10
S.P. Accuracy
5
0
25%
40%
60%
80%
-5
-10
F.S. Accuracy
±1%FS
-15
2
y=ax +bx +cx +dx +ex+f
SEC-Z500 is installed with a newly developed "Variable PID
system", which can achieve 1 second response to all setting
points. Variable PID is continuously changing depending on
setting flow points. This allows the PID factor to be optimized
when you changed full scale flow and gases.
SEC-Z500 series Gases and Full Scale Range can be changed
by the customer using our exclusive software. It is possible to
configure the MFC without dismounting it from the gas panel or
piping, giving an advantage for cost and time reduction on your
maintenance operation.
MFC OUT
1sec
1sec
NF3
C2H4
MFC
C2F6
H2
PH3
SEC-Z500
MFC
MFC
O2
MFC
SF6
MFC OUT
CF4
SiH4
MFC
MFC
SiF4
MFC SET
Ar
MFC
MFC SET
CO
MFC
MFC
After changed full scale to 25%
MFC
Before changed full scale
MFC
sMulti Gas/Multi Range Solution
MFC
s High Speed Response
SEC-Z500 0-2% response
100%
Flow%
N2
Easy spec change
at customer
GAS
Digital Mass Flow Controller Logging System
The importance of preventative maintenance for production
equipment in semiconductor device manufacturing plants is widely
acknowledged. In fact, preventative maintenance is considered
a critical factor for increasing productivity. HORIBA STEC offers
a preventative maintenance system for its mass flow controllers,
which are considered key devices in the semiconductor
manufacturing process. The mass flow controller’s preventative
maintenance system monitors the flow rate control conditions and
the position of the valve, and determines the status of overall flow
rate control in the mass flow controller. The system informs the user
of what sort of maintenance is required before the mass flow
controller becomes unable to control the flow rate. It is considered
difficult to predict the maintenance required for a mass flow
controller’s functioning by monitoring its flow control status alone.
HORIBA STEC’s mass flow controller monitoring system collects
information on the control status of the digital mass flow controllers
(analog control) in semiconductor manufacturing equipment using
digital communications, and monitors whether or not there is a need
for any preventative maintenance. This system is compatible with
LAN (TCP/IP) networks, and a single superior Surveillance Server
can be used to monitor the mass flow controllers in each
semiconductor manufacturing system. It’s also relatively easy to
create a wide area network (WAN) for this monitoring system.
s Sample system setup
The logging unit can be used to log the flow rate control status of
digital mass flow controller in each semiconductor manufacturing
system. The Surveillance Server is connected to the logging unit
through a LAN. The logging unit monitors the flow rate control
conditions and the position of the flow control valve, and determines
whether any preventative maintenance is necessary. This data can be
used to investigate the reasons for problems or to review changes in
the gas pressure, in addition to determining whether or not
preventative maintenance is required.
s Main screen
Each type of alarm
is displayed in
a different color.
Surveillance System
LAN
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
DMFC
Controller
DMFC
Controller
DMFC
Controller
DMFC
Logging unit
DMFC
Logging unit
DMFC
Logging unit
DMFC
Equipment
DMFC
Equipment
DMFC
Equipment
s Alarm information screen
Setup
Valve center
Valve
HUB
LAN
DMFC
09
s Logging data screen
PC communications
Data initialization
MFC communications
D-Net Data Logger DeviceNet™ mass flow controller monitoring tool
Since DeviceNet™ mass flow controllers do not use an analog signal for
flow rate output, they cannot be checked using analog recorders or
analog checkers. As a result, there is no simple tool for checking and
recording their operating conditions. Checking generally requires
additional equipment and extra work by the equipment operator.
HORIBA STEC has used the technology it developed through the
mass production of DeviceNet™ mass flow controllers to create a new
software product called D-Net Data
Logger, which makes it easy to check the
operating status of mass flow controllers.
D-Net Data Logger consists of a PC,
DeviceNet™ communications card, and
communications cable. A DeviceNet™
communications connector, which does
not include any proprietary HORIBA STEC
equipment, makes it easy to check and
record the flow rate control status of mass
flow controllers.
s Settings screen
s Sample system setup
PLC
Master
Power
PLS bus line
D-Net Data Logger
DeviceNet™
communications
card
PC
Distribution box
Communications
cable
SEC
SEC
SEC
Digital Mass Flow Controllers 10
Connecting digital mass flow controllers (examples)
s DeviceNet™ communications: SEC-Z10D series
PLC
DeviceNet™ communications
Master
+24
PLC bus line
Power
Distribution
box
DeviceNet™ is an open and global field network that was developed by
the ODVA (Open DeviceNet™ Vendor Association, Inc.) as a unique means
for supporting standardization worldwide. The ODVA offers EDS
(Electronic Data Sheet) specifications, which are designed to allow shared
operability and programming in a multi-vendor environment. The ODVA
also carries out conformance testing. Devices that have passed
the ODVA’s conformance testing can display the
logo.
Advantages
· Reduces costs, since AD/DA converters and I/O boards are not required.
· The user simply connects the devices through network cables and
makes address settings. This reduces both the number of processes
required and the time involved.
· No special accessories are necessary for the devices. Users can simply
choose DeviceNet™ conforming products, which reduces costs.
SEC-Z10D
SEC-Z10D
SEC-Z10D
DeviceNet™ cable
s Digital communications: SEC-Z500 series
PC
s Digital communications: SEC-V100D series
PC
Converter
HUB
Power Supply
Converter
Power Supply
SC-DH2-MM
SEC-V100D
SEC-V100D
SEC-V100D
SEC-Z500
SEC-Z500
SEC-Z500
SEC-Z500
SEC-Z500
SC-DH2-MM
Signal connectors
s SEC-Z10D series: DeviceNet™ communications
2
3
5
1
4
Pin no.
1
2
3
4
5
Signal name
Drain
V+
VCAN_H
CAN_L
s SEC-F700 series
Pin no.
1
2
3
4
5
6
7
8
9
10
11
12
13
14
15
Signal name
Signal ground [D. COM] *1
Serial input (–) [R x D (B)]
Serial output (–) [T x D (B)]
CPU hang-up signal and A alarm pin [ALM. A]
Analog flow rate output signal [OUT] (0 to 5 VDC)
Analog flow rate setting signal [SET] (0.1 to 5 VDC)
Analog COMMON and power source COMMON [A. COM] *1
Power source input [–15 V]
Power source output [+5 V] *2
Analog/digital switching pin [ANALOG/DIGITAL] *3
Valve forced open/close signal [OPEN/CLOSE] *4
Serial input (+) [R x D (A)]
Serial output (+) [T x D (A)]
B alarm pin [ALM. B]
Power source input [+15 V]
Connector used: D-subminiature 15 contact pin connector (with M3 fitting screws)
*1 [A. COM] and [D. COM] are connected internally.
*2 Not for use by the user, since it is already required for the system.
*3 Can be altered using digital commands.
*4 Highest priority, both in digital and analog modes.
*5 +15V is the capacity when the 5V power source output is at no load.
Please do not connect anything to the [RESERVED] pin. Connecting to this pin can cause malfunctions and errors.
s SEC-Z500 series: Digital connector connections
Pin no.
1
2
3
4
5
6
7
8
Signal name
Signal ground [D. COM]
Signal ground [D. COM]
N.C. *1
Serial output/input (–)
Serial output/input (+)
N.C. *1
N.C. *1
N.C. *1
*1: N.C. means No Connection.
*2: Be sure to use shield cable to minimize the effect of
electrical noise.
s SEC-V100D series: Digital connector connections
Pin no.
1
2
3
4
Signal name
Serial output (+) [T x D [A]]
Serial output (-) [T x D [B]]
Serial input (+) [R x D [A]]
Serial input (-) [R x D [B]]
5
Analog/digital switching pin [ANALOG/DIGITAL]
When open, analog mode (electric current at point of contact: 0 mA)
Digital mode when connected to [D.COM] (electric current at point of contact: 0.45 mA)
6
7
8
Signal ground [D. COM]
NC
NC
s Analog connector connections
Pin no.
1
2
3
4
5
6
7
8
9
Signal name
Valve override open/close signal *1
Analog flow rate output signal (0-5VDC)
Minimum resistance: 2kΩ
Power supply input (+15VDC, capacity: 150mA)
Power COMMON *2
Power supply input (–15VDC, capacity: 150mA)
Analog flow rate setting signal (0-5VDC) *1
Input impedance: 1MΩ and over
S. COMMON *2
S. COMMON *2
N.C. *3
*1: No connection for SEF series.
*2: Power COMMON (Pin No.4) and
S. COMMON (Pin No.7) are not
connected inside the DMFC.
Pin No.7 (S. COMMON) and
Pin No.8 (S. COMMON) are
connected inside the DMFC.
*3: N.C. means No Connection.
11
GAS
Piezo Actuator Type Mass Flow Controllers
Purifying the process gas is an extremely important part of forming the thin films
that are required in today’s semiconductor manufacturing. Improving the purity
of the gas involves increasing the effectiveness of purifiers and filters, as well as
using ultra-clean gas flow systems. Conventional wisdom indicates that to make
a gas supply system ultra clean, the areas that come in contact with the gas must
be extremely well polished, and the entire system should be metal.
In the mass flow controller field, where the structure of gas supply systems is
necessarily extremely complex, the above were considered difficult conditions
to meet. Yet HORIBA STEC succeeded in developing a method for massproducing metal diaphragm valves, and in 1984, the company released its SEC4000 series of all-metal mass flow controllers, which came to be known as
the ultra clean mass flow controllers. Research and development have
continued, and now HORIBA STEC offers a variety of mass flow controllers that
surpass the needs of the market—including the SEC-7300 series, which has
become the de facto standard in compact mass flow controllers.
Piezo Actuator Type Mass Flow Controllers 12
SEC-7300 series
Compact mass flow controllers
The series that became the de facto standard in compact mass flow controllers
sCompact: With just 106 mm between surfaces, can perform flow rate control
at up to 30 SLM (N2) (up to 50 SLM (N2) is available with this series).
sFlow rate control at extremely low flow rates: The SEC-7320 F.S. 1 SCCM
model offers flow rate control for flow rates as low as 0.02 SCCM.
sCompatible with SDS (Safe Delivery Source Model): The SEC-734 OLD model
offers differential pressure control from 1.33 kPa.
Conforming gases: SDS cylinders packed with
ASH3, BF3, SiF4, GeF4, etc.
(SDS is a registered trademark of Matheson Tri-Gas,
Semi-Gas, Semi-Gas Division, and ATMI, Inc.)
sUltra clean: All metal construction
(SEC-7300M type)
sAuto-close function is standard.
SEC-4400 series
Mass flow controllers
The best-selling series that showed the world what ultra-clean means
sUltra clean: All metal construction (SEC-4000M type)
sCompatible with a wide variety of flow rate control needs: Flow rate control between 0.1 SCCM and 100 SLM (N2) available in a single series.
sModels that prevent thermal siphoning: Mass flow controllers that are not affected by the installation orientation (SEC-4400MF/4500MF types).
Feature a new sensor (patent pending) that prevents thermal siphoning through the very principles of its construction.
sConforming gases: C2F6, C3F8, C4F8, SF6, SiF4, etc,
sUltra clean: All metal construction (SEC-4000M type)
sAuto-close function is standard.
sModel with purge mode: SEC-4400SP type
sWide range model: SEC-4400SR type
SEC-4401/4501
The ultimate in analog mass flow controllers
sHigh reliability: New sensor design, stable zero point: achieve ±20
mV/y (typical)
sHigh precision: ±0.8 F.S. (SEC-4401 type)
sFast response: Feature an ultra-quick start function and offer
response times under a second over the entire flow rate range.
sModels that prevent thermal siphoning: Mass flow controllers that
are not affected by the installation orientation (SEC-4000MF type).
Feature a new sensor (patent pending) that prevents thermal
siphoning through the very principles of its construction.
Conforming gases: C3F6, C3F8, C4F8, SF6, SiF4, etc,
sUltra clean: All metal construction (SEC-4001M type)
sAuto-close function is standard.
Mass flow controllers
13
GAS
SEC-7300 series
Model
flow
SEC- ( mass
controller )
flow
)
SEF- ( mass
meter
7320
——
7330
7330
7340
——
7350
7350
7355
7355
7340LD
——
2/3/5/10 SCCM
20 SCCM 2kPa
30 SCCM 2.7kPa
——
——
5/10/20/50/100
200/500 SCCM
1/2/3/5/10 SLM
——
7140
®
M: type, SUS316L, R: type, SUS316L, Viton
Materials used in gas contact area
Valve type
Open at power-off: O Close at power-off: C
Standard flow rate range
(N2 equivalent F.S.)
1/2/3 SCCM
3/5/10 SLM
20/30 SLM
50 SLM
(H2:100 SLM)
——
5/10/20/50/100
200/500 SCCM
1/2/3/5/10 SLM
——
20/30 SLM
50/100 SLM
(for SEC series)
Standard flow rate range
(N2 equivalent F.S.)
——
5/10/20/50/100
200/500 SCCM
1/2 SLM
(for SEF series)
Flow rate control range
0 to 100% F.S.
2 to 100% F.S.
Response speed
Less than 1 sec (T98)
± 1% F.S.
Accuracy
± 1% F.S.
Linearity
± 0.5% F.S.
± 0.2% F.S.
Repeatability
1 SCCM to 5 SLM: 50 to 300 kPa (d)
10 SLM: 100 to 300 kPa (d)
Operating differential pressure
(for SEC series)
20 SLM: 100 to 300 kPa (d)
30 SLM: 150 to 300 kPa (d)
Maximum operating pressure
150 to 300 kPa (d)
——
1.33 to 101.3 kPa (d)
300 kPa (G)
Pressure Resistance
1 MPa (G)
M: 5 x 10-12 Pa·m3/s (He) R: 1 x 10-8 Pa·m /s (He)
Leak Integrity
Operating temperature
5 to 50°C (accuracy guaranteed between 15 and 35°C)
Flow rate setting signal
0.1 to 5VDC (Input impedance : more then 1MΩ)
Flow rate output signal
0 to 5VDC (Minimun load resistance 2kΩ)
+15 VDC ± 5%, 60 mA
-15 VDC ± 5%, 60 mA, 1.8 VA
+15VDC ± 5%, 60 mA; -15 VDC ± 5%, 60 mA, 2.7 VA
Drive power source
1/4 VCR type or IGS
Standard Fitting*1
1/4 VCR type or IGS
3/8 VCR type
*1 Can be made compatible with an integrated unit flange. * A model that has a signal cable connector on the side is available for use with integrated gas panels (for SEC-7340/7350/7355 series).
* The standard flow rate range and operating differential pressure are different in the mass flow controllers (SEC series) versus the mass flow meters (SEF series).
* SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0°C, 101.3 kPa).
* Viton® is registered trademark of E. I. DuPont de Nemours.
SEC-4400 series
Model
flow
SEC- ( mass
controller )
flow
)
SEF- ( mass
meter
4500(MK3)
4500
4400(MK3)
4400
4550
4550
4600
4600
M: type, SUS316L, R: type, SUS316L, Viton
Materials used in gas contact area
Standard flow rate range
(N2 equivalent F.S.)
5/10/20/30/50/100
200/300/500 SCCM
1/2/3/5 SLM
10 SLM
20 SLM
50 SLM
30 SLM
50 SLM
4400SR
——
Open at power-off: O
Open at power-off: O
5/10/20/50
100/200 SCCM
500 SCCM
1/2/3/5 SLM
100 SLM
2 to 100% F.S.
Flow rate control range
4400MF
——
4500MF
——
SUS316L
Open at power-off: O Close at power-off: C
Valve type
4400SP
——
®
Open at power-off: O Close at power-off: C
5/10/20/30/50/100
200/300/500 SCCM
1/2/3/5 SLM
10 SLM
0.5 to 100% F.S.
2 to 100% F.S.
± 1% F.S. (10 to 100%)
± 0.2% F.S. (0.5 to 10%)
± 1% F.S.
Less than 1 sec (T98)
Response speed
± 1% F.S. (MK3: ± 2% F.S.)
Accuracy
± 1% F.S.
± 0.5% F.S. (MK3: ± 1% F.S.)
Linearity
± 0.2% F.S.
Repeatability
Operating differential pressure
(for SEC series)
*1
50 to 300kPa (d)
100 to 300kPa (d)
*1
*1
150 to 300kPa (d) 100 to 300kPa (d) 150 to 300kPa (d)
1 MPa (G)
Pressure Resistance
M: 1 x 10-11Pa·m3/s (He) R: 1 x 10-8Pa·m3/s (He)
Leak Integrity
Operating temperature
5 to 50°C (accuracy guaranteed between 15 and 35°C)
Flow rate setting signal
0.1 to 5VDC (Input impedance : more then 1MΩ)
0 to 5VDC (Minimun load resistance 2kΩ)
Flow rate output signal
+15VDC ± 5% 80mA -15VDC ± 5% 80mA 2.4VA
+15VDC ± 5% 60mA -15VDC ± 5% 60mA 1.8VA
Drive power source
Standard Fitting
100 to 300kPa (d)
50 to 300kPa (d)
300 kPa (G)
Maximum operating pressure
1/4 VCR type
3/8 VCR type
1/4 VCR type
*1 Operating pressure under atmospheric pressure conditions on the secondary side. * SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0°C, 101.3 kPa).
* Gases used by the SEC-400MK3: N2, H2, O2, He, Ar. Gases used by the SEC-4500MK3: N2, H2, O2.
* Viton® is registered trademark of E. I. DuPont de Nemours.
SEC-4001series
Model
20 SLM
flow
SEC- ( mass
controller )
flow
)
SEF- ( mass
meter
4401
4401
4501
4501
M: type, SUS316L, R: type, SUS316L, Viton®
Materials used in gas contact area
Valve type
Standard flow rate range
(N2 equivalent F.S.)*1
Open at power-off: O Close at power-off: C
5/10/20/30/50/100/200/300/500 SCCM
1/2/3/5 SLM
10 SLM
Flow rate control range
2 to 100% F.S.
Response speed*2
Accuracy
Less than 1 sec across the entire flow rate control range (T98)
± 0.8% F.S.
± 1% F.S.
± 0.5% F.S.
Linearity
± 0.2% F.S.
Repeatability
Operating differential pressure (for SEC series)
Maximum operating pressure
Pressure Resistance
Leak Integrity
100 to 300kPa (d)
50 to 300kPa (d)
300 kPa (G)
1MPa (G)
M: 5 x 10-12 Pa·m3/s (He), R: 1 x 10-8 Pa·m3/s (He)
Operating temperature
5 to 50°C (accuracy guaranteed between 15 and 45°C)
Flow rate setting signal
0.1 to 5VDC (Input impedance : more then 1MΩ)
Flow rate output signal
Drive power source
Standard Fitting
Long-term zero point stability*3
Standard functions
Options
20 SLM
0 to 5VDC (Minimun load resistance 2kΩ)
+15 VDC ± 5%, 60 mA; -15 VDC ± 5%, 60 mA, 1.8 VA
1/4 VCR type
20 mV/y typical
Auto-close (AC), ultra-quick start function standard
Mount-free sensor (precision ± 1% F.S.) *4
*1 SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0°C, 101.3 kPa). *2 Responsiveness from 0% setting (fully closed setting) until entire flow range is reached.
*3 Value under set conditions (ambient temperature change within ± 2°C). *4 Models with mount-free sensor: Mass flow controllers: SEC-4401MF, SEC-4501MF; Mass flow meters: SEF-4401MF, SEF-4501MF
* Viton® is registered trademark of E. I. DuPont de Nemours.
Piezo Actuator Type Mass Flow Controllers 14
High-speed response with ultra quick start (within one second for the entire flow control range)
s Ultra quick start function’s responsiveness
s Remarkable improvement in responsiveness during startup
during startup of each line
Mass flow controller valve control has traditionally been carried out through
PID control, in which the sensor output signal is compared with the flow
rate settings signal from the exterior of the unit. With this method, control is
applied starting when the valve is still closed and continuing until an
extremely low flow rate (2% F.S.) is achieved, so it takes time until the valve
is able to begin controlling the gas flow rate effectively, and responsiveness
within one second of start up is extremely difficult to achieve while meeting
all the specified conditions. The ultra quick start function opens the valve
for a brief moment, until the sensor output reaches a fixed value, after
which the unit is transferred to PID control. This results in a dramatic
improvement in the start-up response speed from the time when the valve
is still closed until a low flow rate is achieved, and enables responsiveness
across the entire flow rate control range within one second. The processes
developed in recent years require low flow rate control and almost full scale
flow rate control within a very short time, and since the mass flow range
that a single unit can cover is quite large, a mass flow controller with ultra
quick start can significantly increase both quality and throughput.
Gas A
5V
4V
Gas B
3V
2V
Gas C
Gas D
Gas E
1V
0
1
2
3
4
5
6
seconds
Time required to achieve set flow rate, starting at 0
Characteristics of the mount-free sensor (MF sensor)
s What is thermal siphoning?
Thermal siphoning is a kind of convection that can occur within the flow
rate sensor as the sensor is heated up. This convection can result in
the output of a flow rate signal that resembles zero point drift, even when
the flow rate is not being controlled. Thermal siphoning is more likely to
be affected if the mass flow controller is installed vertically. The effect
created varies in proportion with the molecular weight and pressure.
s The design of the mount-free sensor (MF sensor)
1000
The mount-free sensor is
a newly designed sensor
(patent pending) that prevents
the orientation of the unit from
being a factor through the very
principles of its construction.
The equivalent heater is
constructed to prevent
convection. It is suitable for
use with C3F8, C4F8, SF6, SiF4,
and other similar gases.
Gas: C4F8
Primary pressure: 200 kPa
800
Heater
600
400
200
Zero output 0
voltage (mV)
-200
Bypass
Sensor
1
2
3
4
5
2
3
4
5
6
-400
-600
-800
-1000
Gas Inlet
1
6
Connecting the SEC-4400SP/SR
s SEC-4400SP
s SEC-4400SR
This model offers improved purge efficiency.
Signal cable: When the valve open signal is input to the valve
open/close signal input pin through an SC-EH2 type cable, it is
possible to achieve a purge flow rate several times higher than
that of ordinary models.
This model offers improved purge efficiency.
Signal cable: When the valve open signal is input to the valve open/close
signal input pin through an SC-EH2 type cable, it is possible to achieve
a purge flow rate several times higher than that of ordinary models.
SC-EH2 type/DH2 type
SC-EH2 type cable
Purge input
Conversion
adapter
F.G. ground
Zero adjustment
SP
SU
SR
Communications
PAC
DU
SC-E4/D4: CA-4W
SC-EH2/DH2: CA-HW
15
GAS
Solenoid Actuator Type Mass Flow Controllers
Smaller, less expensive equipment offering more functions is now considered
a primary factor in increasing productivity. The demand for smaller, more
cost-efficient and functional equipment applies with equal force to gas
supply systems—and therefore to the key production devices known as mass
flow controllers.
HORIBA STEC, which has always offered products that provide
the performance required for the latest processes, has created the world’s
smallest class of mass flow controllers, the SEC-G100 series, and solenoid
actuator type mass flow controllers that offer terrific cost performance.
Solenoid Actuator Type Mass Flow Controllers 16
SEC-G100A series
Ultra-compact mass flow controllers
World’s smallest class: Models that can fit into a 39 mm x 39 mm design
sWorld’s smallest class: The same 39 mm x 39 mm size as other devices in
integrated gas panels.
sHigh speed replacement: Polishing of the gas contact area is standard,
and since the gas flow passage volume has been reduced by 80%
(compared with previous models), the series offers greatly improved
gas replacement.
sFast response: Quick start function included.
sAuto-close function is standard.
sContributs to the creation of more compact, lighter weight, and more
highly functional integrated gas panels.
SEC-E400J series
Mass flow controllers
Metal seals at a low cost
sFeature a metal O-ring: Can be used with corrosive gases.
sError alarm function: A red light that illuminates in the main
unit’s LED when an error occurs and an alarm output function
(at point of contact) are standard.
sLow cost: The components have been redesigned for improved
cost efficiency.
SEC-E40 series
Mass flow controllers
Low cost models that can be used to control from extremely small to large flow rates
sCompatible with a wide variety of flow rate control needs:
Flow rate control between 0.2 SCCM and 500 SLM (N2)
available in a single series.
sSuitable for a wide range of uses: Already in
use in general production at many factories.
sLow cost: A line up of models that offer terrific
cost performance: SEC-E40MK3/E50MK3
17
GAS
SEC-G100 series
Model
flow
SEC- ( mass
controller )
flow
)
SEF- ( mass
meter
G111AMC
G111AM
M: type, SUS316L, PTFE, magnetic stainless steel
Materials at gas contact area
Close at power-off: C
Valve type
10/20/30/50/
100/200/300/500 SCCM
1 SLM
Standard flow rate range
(N2 equivalent F.S.)
3/5 SLM
2 SLM
2 to 100% F.S. (fully closed at settings of 2% or lower)
Flow rate control range (for SEC series)
0 to 100%
Flow rate control range (for SEF series)
Less than 1 sec (T98)
Response speed
Accuracy
± 1% F.S.
Linearity
± 0.5% F.S.
± 0.2% F.S.
Repeatability
50 to 300kPa (d)
Operating differential pressure (for SEC series)
200 to 300kPa (d)
100 to 300kPa (d)
Operating differential pressure (for SEC series)
300kPa (d)
Maximum operating pressure
300 kPa (G)
1 MPa (G)
Pressure Resistance
5 x 10-12 Pa·m3/s (He)
Leak Integrity
Metal seal
Seal method
Operating temperature
5 to 50°C (accuracy guaranteed between 15 and 45°C)
Flow rate setting signal
0.1 to 5VDC (Input impedance : more then 1MΩ)
0 to 5VDC (Minimun load resistance 2kΩ)
Flow rate output signal
+15 VDC ± 5%, 60 mA; -15 VDC ± 5%, 200 mA, 3.9 VA
Drive power source
CS seal/W seal/B seal/C seal
Standard Fitting
Quick start function*1, auto-close function*1, auto-zero function*1, interior surfaces polished
Standard functions
SEC-G111: 390 g; SEF-G111: 290g*4
Unit weight
*1 For SEC series.
* SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0°C, 101.3 kPa).
SEC-E400J series
Model
SEC-
E-440J
E-450J
M: type, SUS316L, PTFE
Materials at gas contact area
Close at power-off: C
Valve type
10/20/30/50/
100/200/300/500 SCCM
1/2/3/5/10 SLM
Standard flow rate range
(N2 equivalent F.S.)
20/30 SLM
2 to 100% F.S.
Flow rate control range
Less than 1 sec (T98)
Response speed
Accuracy
± 1% F.S.
Linearity
± 0.5% F.S.
± 0.2% F.S.
Repeatability
50 to 300kPa (d)
Operating differential pressure
100 to 300kPa (d)
300kPa (G)
Maximum operating pressure
1MPa (G)
Pressure Resistance
1 x 10-11Pa·m3/s (He)
Leak Integrity
Metal seal
Seal method
Operating temperature
5 to 50°C (accuracy guaranteed between 15 and 35°C)
Flow rate setting signal
0.1 to 5VDC (Input impedance : more then 1MΩ)
0 to 5VDC (Minimun load resistance 2kΩ)
Flow rate output signal
+15 VDC ± 5%, 60 mA
-15 VDC ± 5%, 150 mA
3.2 VA
Drive power source
+15 VDC ± 5%, 60 mA
-15 VDC ± 5%, 200 mA
3.9 VA
1/4VCR type
Standard Fitting
* SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0°C, 101.3 kPa).
SEC-E40 series
Model
flow
SEC- ( mass
controller )
mass flow
)
SEF- ( meter
Types of gas*1
Materials at gas contact area
E40/E40MK3
E40
E50/E50MK3
E50
E60
E60
Non-corrosive gases (the MK3 model can handle N2, O2, air, H2, Ar, and He)
E80
E80
N2, O2, Air, H2, Ar, C3H8, CH4, C4H10
SUS316L, Viton®, PTFE, magnetic stainless steel
N2, O2, Air, H2
SUS316L, Viton®, magnetic stainless steel
Close at power-off: C
Valve type
Standard flow rate range
(N2 equivalent F.S.)*1
E70
E70
10/20/30/50/100/
200/300/500 SCCM
1/2/3/5/10 SLM
20/30 SLM
2 to 100% F.S.
Flow rate control range (for SEC series)
300/500 SLM
200 SLM
50/100 SLM
5 to 100% F.S.
0 to 100% F.S.
Flow rate control range (for SEF series)
Less than 1 sec (T98)
Less than 2 seconds (T98)
Accuracy
± 1% F.S.
± 2% F.S.
Linearity
± 0.5% F.S.
Response speed
Operating differential pressure (for SEC series)
10 SCCM to 5 SLM: 50 to 300 kPa (d); 10 to 30 SLM: 100 to 300 kPa (d)
350 kPa (G)
1 MPa (G)
Pressure Resistance
1 x 10-8 Pa·m3/s (He)
Leak Integrity
5 to 50°C (accuracy guaranteed between 15 and 35°C)
1 x 10-7 Pa·m3/s (He)
450 kPa (G) added pressure with loss of pressure less than 1% over 10 minutes
5 to 45°C (accuracy guaranteed between 15 and 35°C)
SEC-E40(MK3).E50(MK3) :0.1 to 5VDC (Input impedance : more then 1MΩ)
SEC-E60.E70.E80 :0.25 to 5VDC (Input impedance : more then 1MΩ)
Flow rate setting signal
Analog:0 to 5VDC (Minimun load resistance 2kΩ)
Flow rate output signal
Drive power source
± 1% F.S.
200 to 350kPa (d)
100 to 300kPa (d)
300 kPa (G)
Usage pressure (for SEF series)
Operating temperature
± 1% F.S.
± 0.5% F.S.
± 0.2% F.S.
Repeatability
+15 VDC ± 5%, 50 mA
-15 VDC ± 5%, 150 mA, 3 VA
Standard Fitting*2
1/4 Swagelok type
+15 VDC ± 5%, 50 mA
-15 VDC ± 5%, 200 mA, 3.9 VA
3/8 Swagelok type
*1 Please contact HORIBA STEC for information on types of gas other than those listed. *2 Non-standard joints can also be used. Please contact HORIBA STEC for more information.
* The SEC-E40, SEC-E50, SEC-E40MK3 and SEC-E50MK3 feature an auto-zero function as well.
* Inlet pressure for the SEC-E40/50/60/E40MK3/E50MK3: maximum 300 kPa (G) or under. For the SEC-70/80: maximum 350 kPa (G) or under.
* SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0°C, 101.3 kPa).
* Viton® is registered trademark of E. I. DuPont de Nemours.
1/2 Swagelok type
Solenoid Actuator Type Mass Flow Controllers 18
Reduced footprints
SEC-G100 series
Currently, 39 mm x 39 mm (1.5 inch pitch) is the standard for components
in the accumulation systems of integrated gas panels. In the new SECG100 series of mass flow controllers, each part of the mass flow
controller has been made more compact, so that a unit can fit into
the same 39 mm x 39 mm as the other components making up the gas
panel. In addition to reducing the footprint of the accumulated gas panel,
this new series of mass flow controllers makes it possible to use
the same base block size for all the components, which reduces design
and production costs, as well as overall accumulated gas panel costs.
s The SEC-G111 in a sample integrated gas panel
SEC-G111
Regulator
Pneumatic
Pressure valve
sensor
Hand valve
Filter
39
39
39
39
Pneumatic
valve
39
39
39
SEC-G111
SEC-4400
Other company (A)
Internal flow
passage volume
1/5
1/2
1
Unit volume
1/3
1
1
Weight
2/5
4/5
1
Electrical signal/drive power source connections
SEC-G100, SEC-E400J, SEC-E40 series
s Signal connector
Transmission cable
Flow rate setting signal
Analog (0 to 5 VDC)
Flow rate output signal
Analog (0 to 5 VDC)
Valve open/close signal
Alarm output connection point
SEC
Power source voltage: ±15 VDC
Valve voltage monitor signal
Pin no.
1
2
3
4
5
6
7
8
9
s Peripherals
Signal name
Valve open/close signal
Flow rate output signal (0 to 5 VDC)
Power source (+15 VDC)
Power source (COMMON)
Power source (-15 VDC)
Flow rate setting signal (0 to 5 VDC)
Signal (COMMON)
Valve voltage output signal (please check this)
NC
In order to avoid changes in the COMMON
power source, caused by the valve drive
current, it is necessary to connect both
the power source COMMON pin and
the single COMMON pin to the same
shared power source. Since they are not
connected in the interior of the mass flow
controller, please be sure to wire them
separately, but so that they share the same
power source.
Connector used: D-subminiature 9 contact pin connector
(with M3 fitting screws)
Dimensions
SEC-G100, SEC-E40 series
s SEF-E80
148
218.1
37.5
175
37.5
101
175
sSEC-E80
107
s SEC-G111 AMC
104.2
174.3
84
ø84
1.5 inch IGS flange
26
39
20
20
39
30
4–ø5.2
4-M6 depth10
8.7
110.6
4-M6 depth10
8.7
66.8
19
GAS
Mass Flow Controllers
Since 1980, when HORIBA STEC created the SEC-L, the first mass flow
controller manufactured entirely in Japan, the company has continued to
develop and produce mass flow controllers to meet a wide variety of customer
needs. The SEC-400 series, which uses thermal valves, has the same reliable
control capabilities as the SEC-L, and is already used all over the world.
The SEC-8000/2000 series, which can operate in high temperature
environments, is an ultra clean gas supply system that is used for the analysis of
extremely small gas flows at the ppt level, as well as for a variety of tasks
including semiconductor and compound semiconductor processing. HORIBA
STEC is proud to offer a wide variety of products to suit our customers’ needs.
SEC-8000/2000
series
SEC-400
series
Mass flow controllers
Mass flow controllers
A best-seller mass flow controller
for high temperature environments
A basic mass flow controller
SEC-8000 series (featuring piezo actuator valves)
sCompatible with a wide variety of flow rate control needs: Flow
sUltra clean: All metal construction
sCompatible with 150ºC baking: Feature sensors and valves that can
withstand high temperatures.
sCompatible with a wide variety of processes: Ultra pure gas supply,
organic metal materials for MOCVD, low vapor pressure materials,
ideal for flow rate control of corrosive gases.
SEC-2000 series (featuring thermal valves)
sA proven record: Boasting a terrific record as a TEOS vaporization
supply system, this series is the standard for use with the LSC series.
sHigh precision: ±0.5% F.S.: SEC-405 (limited gas compatibility)
rate control between 0.1 SCCM and 200 SLM (N2) available in
a single series.
sCompact: 106 mm between surfaces: SEC-300 type
sLow cost: A lineup of cost effective models: SEC-
400MK3/500MK3
Mass Flow Controllers 20
SEC-8000/2000 series
Model
flow
SEC- ( mass
controller )
flow
)
SEF- ( mass
meter
8340S
8340S
8440S
8440S
8450S
8450S
8455S
8455S
8460S
8460S
Materials used in gas contact area
8440LS
8440LS
8450LS
8450LS
8455LS
8455LS
8460LS
8460LS
2410
2410
2510
2510
2551
2551
SUS316L, Viton
SUS316L
Valve type
®
Open at power-off: O
Standard flow rate range
(N2 equivalent F.S.)
5/10/20/50/
100200/500 SCCM
1/2 SLM
5/10/20/30
50/100/200
300/500 SCCM
1/2/3/5 SLM
20/30/
50 SLM
10/20 SLM
3/5/10 SLM
Flow rate control range
10/20 SLM
10/20/30/50/
100/200/300/
500 SCCM
1/2/3/5 SLM
50/100 SLM
30/50/
100 SLM
10/20 SLM
5 to 100% F.S.
2 to 100% F.S.
Response speed
Less than 6 sec (T98)
Less than 1 sec (T98)
Less than 2 sec (T98)
Accuracy
± 1% F.S.
Linearity
± 0.5% F.S.
± 0.2% F.S.
Repeatability
Operating differential pressure*1
30/50 SLM
50 to 300 kPa (d)
20/30 SLM
100 to 300 kPa (d)
50 SLM
150 to 300 kPa (d)
100 to 300 kPa (d)
Maximum operating pressure
30 SLM
50 SLM
100 to 300 kPa (d) 100 to 300 kPa (d)
50 SLM
100 SLM
150 to 300 kPa (d) 150 to 300 kPa (d)
100 to 300
kPa (d)
50 to 300
kPa (d)
100 to 300
kPa (d)
50 to 300 kPa (d)
300 kPa (G)
Pressure Resistance
1 MPa (G)
5 x 10-12 Pa·m3/s (He)
Leak Integrity
Operating temperature
Flow rate setting signal
1 x 10-8 Pa·m3/s (He)
L type: 15 to 35°C; M type: 35 to 60°C; H type: 60 to 80°C
L type: 80 to 100°C; M type: 100 to 120°C
Specify between 35 and 80°C.
0.1 to 5VDC (Input impedance : more then 1MΩ)
Flow rate output signal
0.25 to 5VDC (Input impedance : more then 1MΩ)
0 to 5VDC (Minimun load resistance 2kΩ)
+15 VDC ± 5%, 60 mA; -15 VDC ± 5%, 60 mA, 1.8 VA
SEC-8340S: For heater, AC 100 V, 56 VA
Drive power source
Standard Fitting
+15 VDC ± 5%, 60 mA; -15 VDC ± 5%, 150 mA, 3.2 VA
3/8 VCR type
1/4 VCR type
1/4 VCR type
*1 The operating pressure may vary depending on the conditions of use. Please contact HORIBA STEC about this.
* SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0°C, 101.3 kPa).
1/4 VCR type
3/8 VCR type
3/8 VCR type
The SEC-8340 type features a heater within the main unit.
* Viton® is registered trademark of E. I. DuPont de Nemours.
SEC-400 series
Model
flow
SEC- ( mass
controller )
mass flow
)
SEF- ( meter
310
310
320
320
405
405
410
410
Open at power-off: O
Close at power-off: C
Standard flow rate range
(N2 equivalent F.S.)*1
Open at power-off: O
520A
520A
Open at power-off: O Close at power-off: C
10/20/30/50/100/
200/300/500 SCCM
1/2/3/5 SLM
5/10/20/30/50/
100200/500 SCCM
Flow rate control range
10/20 SLM
2 to 100% F.S.
30/50 SLM
5 to 100% F.S.
Response speed
Less than 6 sec (T98)
Accuracy
± 1% F.S.
± 2% F.S.
± 0.5% F.S.
Linearity
± 0.5% F.S.
± 1% F.S.
± 0.5% F.S.
Repeatability
± 0.2% F.S.
± 0.4% F.S.
± 0.2% F.S.
Operating differential pressure
± 2% F.S.
± 1% F.S.
± 0.5% F.S.
± 0.2% F.S.
± 0.4% F.S.
50 to 300kPa (d)
(for SEC series)
100 to 300kPa (d)
Maximum operating pressure
300 kPa (G)
Pressure Resistance
1 MPa (G)
1 x 10-8 Pa·m3/s (He)
Leak Integrity
Operating temperature
Flow rate setting signal
510A
510A
SUS316, Viton®
Materials used in gas contact area
Valve type
510
510
5 to 50°C (accuracy guaranteed between 15 and 35°C)
0.1 to 5VDC (Input impedance : more then 1MΩ)
0.25 to 5VDC (Input impedance : more then 1MΩ)
Flow rate output signal
0 to 5VDC (Minimun load resistance 2kΩ)
+15 VDC ± 5%, 60 mA; -15 VDC ± 5%, 150 mA, 3.15 VA
Drive power source
Standard Fitting
1/4 Swagelok type
*1 Compatible with the following gases: N2, Ar, H2, O2, CO2, CH4, C3H8
* SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0°C, 101.3 kPa).
* Viton® is registered trademark of E. I. DuPont de Nemours.
Model
flow
SEC- ( mass
controller )
flow
)
SEF- ( mass
meter
551
551
552
552
610
610
620
620
623
623
SUS316, Viton
Materials at gas contact area
Valve type
Open at power-off: O
Close at power-off: C
30/50/100 SLM
Flow rate control range
5 to 100% F.S.
150/200 SLM
(H2:300 SLM)
50/100/150 SLM
10/20/30/50/100
200/300/500 SCCM
1/2/3/5 SLM
10/20 SLM
200/300/500 SCCM
500MK3
——
10/20/30/50/100
1/2/3/5 SLM
5 to 100% F.S.
Less than 6 sec (T98)
Accuracy
± 1% F.S.
± 2% F.S.
± 1% F.S.
± 2% F.S.
Linearity
± 0.5% F.S.
± 1% F.S.
± 0.5% F.S.
± 1% F.S.
Repeatability
± 0.2% F.S.
± 0.4% F.S.
± 0.2% F.S.
± 0.4% F.S.
± 2% F.S.
± 1% F.S.
± 0.5% F.S.
50 to 300 kPa (d) (Pressure may be limited with some gas types and flow rates.)
± 0.2% F.S.
50 to 300kPa (d)
300 kPa (G)
Maximum operating pressure
1 MPa (G)
Pressure Resistance
1 x 10-8 Pa·m3/s (He)
Leak Integrity
5 to 50°C (accuracy guaranteed between 15 and 35°C)
Operating temperature
Flow rate setting signal
400MK3
——
10 to 100% F.S.
Response speed
(for SEC series)
500MK2
——
Open at power-off: O
Standard flow rate range
(N2 equivalent F.S.)
Operating differential pressure
400MK2
——
®
0.25 to 5VDC (Input impedance : more then 1MΩ)
0.5 to 5VDC (Input impedance : more then 1MΩ)
Drive power source
Standard Fitting
+15 VDC ± 5%, 60 mA; -15 VDC ± 5%, 150 mA, 3.2 VA
+15 VDC ± 5%, 60 mA; -15 VDC ± 5%, 150 mA, 3.15 VA
3/8 Swagelok type
1/4 Swagelok type
* The SEC-400MK3 and SEC-500MK3 are compatible with the following gases: Air, N2, O2, Ar, H2, He
* SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0°C, 101.3 kPa).
* Viton® is registered trademark of E. I. DuPont de Nemours.
0.25 to 5VDC (Input impedance : more then 1MΩ)
0 to 5VDC (Minimun load resistance 2kΩ)
Flow rate output signal
10/20 SLM
GAS
Mass flow controllers for integrated gas panels
Integrated gas panels are made up of separate modules, including
mass flow controllers, valves, regulators, filters, and so on, that perform
the functions that were traditionally performed by parts in gas supply
systems. Integrated gas panels can be manufactured without welding
joints and piping since individual modules are used, and they are smaller
and easier to maintain than traditional gas supply systems.
Air valve
Filter
· Compatible with a wide variety of fittings
Compatible with every type of fitting, including C seals, CS seals,
and W seals.
· Easier to maintain
Unidirectional desorption makes it easier to desorb the mass flow
controller.
· Less dead volume
The amount of useless volume at the joint area is greatly reduced.
Compatible model series
SEC-Z512 series
SEC-Z10D series
(DeviceNet™ compatible mass flow controllers)
SEC-7300 series
SEC-Z512/522 series
SEC-Z10DW series
(DeviceNet™ compatible mass flow controllers)
SEC-F700 series
SEC-F400 series
SEC-V100D series
SEC-7300 series
Pitch size
1.125 inch
s Sample integrated gas panel design
Hand valve Regulator
s Advantages
Air valve
1.5 inch
Flow
SUC processing
CRP processing
After machining, the surface of the stainless steel (SUS316L) that makes
up the unit is polished until its roughness is at the sub-micron level.
After machining, the surface of the stainless steel (SUS316L) that
makes up the unit is subjected to composite electrolytic polishing, and
then a 100% Cr2O3 oxidation film is formed on the surface.
s Advantages
s Advantages
· Improves gas emission characteristics.
· Controls particle generation.
· Reduces outgassing of moisture and hydrocarbon gases.
· Increases resistance to corrosion by chlorine gases
(highly corrosive gases).
· Has a non-catalytic effect on the spontaneous decomposition of
SiH4/B2He and other similar chemicals.
· Suppresses contamination by particles from certain corrosive gases.
Valve
Sensor
OUT
s Outgas data
1/4 x 2 Ar, 1.2 L/min, RT 10 hours
IN
H2O concentration (ppb)
100
Surface roughness measurement
s Results of surface roughness measurement
0.2 µm
0.1 µm
EP
CRPS
30
10
3
1
0.3
0.1
0
100
200
300
400
500
600
Time (minutes)
s Non-catalytic data
1/4 x 1 m
120
Ra
RMS
Rt
Ro
Rv
Rz
Sm
SC
Slope
0.035
0.035
0.120
0.06
0.06
0.090
0.113
13
0.003
µm
µm
µm
µm
µm
µm
µm
TL
Rmax
0.31
µm
Measurement conditions
Measurement
scaling factor
Results
5000
Drive speed
Cutoff
Measurement length
0.3 mm/s
0.8 mm
2.5 mm
SiH4 concentration (ppm)
21
100
SUS316L
-CRPS
80
60
Pure Ni
Hastelloy-EP
SUS316L
-EP
40
20
0
50
100
150
200
250
300
Temperature (°C)
350
400
450
500
Mass Flow Controllers 22
Connecting analog mass flow controllers (examples)
s Connecting to a digital power source, display unit, and settings unit
Basic connections
Signal cable
Display unit
SC-Eseries
DU-102
Settings unit
SU-502
PAC
SEC
series
s Connecting to a dedicated controller
Control using PAC-S6
Control using PAC-D2
Signal cable
Signal cable
SC-Dseries
SC-Dseries
Flow rate output
PAC
-S6
SEC
Flow rate alarm (high/low)
Flow rate output
SEC
PAC
-D2
Flow rate alarm (high/low)
External control mode
· Flow rate setting
· Valve fully open/fully closed signal
Etc.
Program control
External control mode
· Flow rate setting
· Valve fully open/fully closed signal
Etc.
Control using an FI-1100 integrator/control unit
Signal cable
SC-Dseries
Flow rate output
FI1100
SEC
Flow rate alarm (high/low)
Integrated flow rate control
External control mode
· Flow rate setting
· Valve fully open/fully closed signal
Etc.
sConnecting to an external controller
Basic connections
Connector connections
Signal cable
SC-Aseries
Flow rate setting signal: 0 to 5 VDC
Flow rate output signal: 0 to 5 VDC
Alarm output (for some models)
SEC
Valve control signal:
Fully open/fully closed
Drive power source: ±15 VDC
Pin no.
1
2
3
4
5
6
7
8
9
Signal name
Valve forced open/close signal
Analog flow rate output signal (0 to 5 VDC)
Power source input (+15 VDC)
COMMON power source
Power source input (-15 VDC)
Analog flow rate setting signal (0 to 5 VDC)
COMMON signal
Alarm (option)
Valve voltage monitor (option)
Connector used: D-subminiature 9 contact pin connector
(with M3 fitting screws)
GAS
SF-1U/2U
High-precision flow rate meter for precision films
The SF-1U/2U combines precision volumetric
tubing with a soap film detector (patented) that
allows it to measure the flow of any type of gas
accurately. It measures the amount of time required
for the movement of a soap film through a portion
of the volumetric tubing (of a standard volume), and
determines the gas flow rate using that time value
along with measured values for atmospheric
pressure and temperature during the relevant time
period. There are four different volumetric tubing
units (VP series), suitable for different gas flow
levels. The SF-2U features an internal atmospheric
pressure sensor.
s Operating principles
The SF series of precision film flow rate meters use a combination of precision
volumetric tubing and a soap film detector (patented) to measure the flow rate of
any type of gas.
When the start switch is turned on, the film link begins to work, and a soap film is
generated at the opening of the volumetric tubing. The soap film is moved up into
the volumetric tubing by the flow of the gas, and the time it takes the film to pass
two detectors installed a set distance apart from each other is measured. The value
for the volume between the two detectors can be determined precisely, and that
volume, the time it took the film to pass between the detectors, the temperature,
and the atmospheric pressure are read into a microcomputer. Calculations to
correct for vapor pressure (see formula) are performed automatically, and the flow
rate, converted to a standard 25°C and 1013 hPa, is displayed.
120 ±2
s Dimensions (mm)
(20) 80 ±1
(20)
120 ±2
T+25
Pa– Pw
V
Q (mL/min)=
x 60 x
x
T+Tm
1013
Tc
ø10
ø10
230 ±2
(287.6)
Pa: Atmospheric pressure (hPa)
Pw: Saturated vapor pressure (hPa)
at tm °C
Tc: Time it took the soap film to
pass between the detectors (s)
(457.6)
400 ±2
(20)
ø10
Q: Converted flow rate value (Ml/Min)
at 25°C and 760 mm Hg
V: Standard volume (mL) between
the start and stop detectors
T: 273°K
Tm: Ambient temperature (°C)
(20) 80 ±1
ø6
6
Volumetric tubing unit
54 ±2
23
Volumetric tubing
140 ±2
Stop detector
Display
Outlet
90 ±1
Volume value (V)
Soap film
Start detector
Display switching
switch
Start
switch
Microcomputer
Gas inlet
Soapy water
tank
Atmospheric pressure input
switching switch (Pa)
(Atmospheric pressure sensor)
Temperature
sensor (tm)
Vapor pressure (Pa)
200 ±2
SF-1U/2U
Model
Volumetric tubing model
VP-1U
VP-2U
VP-3U
VP-4U
Flow rate measurement range
0.2 to 10 mL/min
2 to 100 mL/min
20 to 1000 mL/min
0.2 to 10 L/min
Flow rate measurement time
Precision
120 to 2.4 seconds
60 to 1.2 seconds
60 to 1.2 seconds
60 to 1.2 seconds
±0.5%
0.2 to 2 mL/min
2 to 20 mL/min
20 to 200 mL/min
0.2 to 1 L/min
±1.0%
2 to 10 mL/min
20 to 100 mL/min
200 to 1000 mL/min
1 to 10 L/min
Compatible gases
Display
Operating temperature*1
Automatic measurement functions
N2, air, O2, H2, Ar, CH4, C3H8, etc. (note: Water soluble gases cannot be measured.)
LCD six-digit digital display (switches between measured flow rate, measured time, temperature, and atmospheric pressure setting)
930 to 1040 hPa; Measurement precision ±2.7 hPa (measured data can be used for corrections; if used for corrections, the total precision becomes 0.7 t0 1.2%)
Average value calculated after between two and five automatic measurements, in auto-mode (previously recorded data can be recalled; recorded data is deleted when unit power is turned off).
Power source
AC adapter (DC 6V); Drive (AC adapter sold separately; select Japanese or overseas specifications.)
Speed range
5 to 40°C (accuracy guaranteed between 15 and 35°C)
External input/output
Weight
*1 Compatible with the SF-2U.
Conforms to RS-232C
Main unit, as a set: 2.0 kg
3.1 kg
Mass Flow Controllers 24
MFT-20
Mass flow checker
When there is a suspected problem with a mass flow controller, it is
necessary to check the power source, display unit, settings unit,
cables, and SEC itself for malfunctions, in order to determine
the cause of the problem. The MFT-20 can drive the SEC and monitor
its input and output voltage, while carrying out the necessary control
functions to determine if the SEC is operating properly. This allows
the user to determine if the source of a problem is the SEC itself or
the power source, before detaching the SEC from the equipment
piping. An internal potentiometer enables control of the SEC as well.
sEnables easy checking of the mass flow controller without detaching
the piping connections.
sNo power source required.
sCan open and close the valve.
sAuto-zero function is available (only for the SEC, which features
an auto-zero function).
Display
Internal standard voltage
Power source voltage
Power drain
Weight
Operating temperature
4
3
DC 20 V full scale/LCD display
+5 VDC
+7 to +30 VDC (normally used with +15 V mass flow controllers)
6 mA or lower, in the voltage range shown above
400 g
0 to 50°C
1
2
s Using the MFT-20
Attachment cable, 2 m
Existing signal cable
Cable adapter
10
9
80 +2
-1
11
125 +2
-1
30
5
6
7
1
2
3
4
5
6
7
8
9
10
11
External output pin
Alarm display LED
Relay cable connector
Voltage display LCD
Check point switching switch
Flow rate settings unit
Input switching switch
Valve control switching switch
SEC selection switch
Auto-zero switch
Attachment magnet
SEC
Cable adapters
Model no.
Used with
SEC-4400/7300
8000/E series
CA-4
SEC-400 series
*Cable adapter is optional.
CA-H
8
sAccessories
PAC-S6
PAC-D1/D2
Multifunctional control unit
Control units
The PAC-S6 is a multifunctional control unit that includes everything
needed for mass flow controller control, including a power source,
display unit, and settings unit.
The PAC-D1 and PAC-D2 are control units that feature functions used
frequently with mass flow controllers, as well as a power source,
display unit, and settings unit.
PAC-D1: For SEF/LF series of mass flow meters
PAC-D2: For SEC/LV series of mass flow controllers
sMulti-range function sFlow rate settings function: Five presets sProgram control
function sFlow rate alarm output function sSoftware slow start function sFlow rate
control valve: Fully open/fully closed sFlow rate display: SET/OUT switching function
sComplies with DIN standards.
sFlow rate settings function sFlow rate alarm: Contact point output available
sCompact sFlow rate control valve sFlow rate control valve: Fully open/fully closed
sFlow rate display: SET/OUT switching function
25
GAS
FI-1100
Control unit with integration function
PAC
series
Dedicated power sources
In addition to a drive power source, flow rate display and setting functions,
and flow rate signal and alarm output functions for mass flow controllers
(SEC, LV series), the FI-1100 control unit features a flow rate control
integration function. It is ideal for monitoring the amount of gas being
consumed. It also features a flow rate output (digital/analog) function, and
an integrated flow rate alarm (contact point output) function.
The PAC series of dedicated power sources can be used as drive
power sources for mass flow controllers and meters as well as for
dedicated display units, and supply the standard flow rate setting
voltage. The series includes a lineup of models to suit different needs,
including models that are capable of driving up to six units, and
models offering 0 to 5 VDC signals and 4 to 20 mA.
DU-102E/K
SU-502EA/ED
Display unit
Settings units
The DU-102E and DU-102K display the flow rate output signal from
mass flow controllers and meters. Matching these units to the full-scale
flow rate values of mass flow controllers and meters enables direct
monitoring of control and measured flow rates.
Dedicated power source: These settings units convert the standard flow
rate setting voltage input (+5 VDC) from the PAC series to the desired
type of flow rate setting signal and input that to the mass flow controller.
SU-502ED: Digital SE-502EA: Analog
DS-3
Multifunctional digital controller
The DS-3 is a compact display and settings unit for mass flow
controllers (DIN 48 x 48 mm). It displays both the actual flow rate
value and the flow rate setting value simultaneously, and is equipped
with a conversion factor value setting and valve control function
(control condition settings: fully open/fully closed). It can also
communicate digitally with digital mass flow controllers.
SC/CA series
Signal cables and conversion adapters
The SC series consists of signal cables that connect mass flow controllers and
meters to control units. The SC-A, SC-DH2, and SC-EH2 are compatible with
the SEC-7300/4001/8000/E400J, UR-730, and PC-1000 series. The SC-A4,
SC-D4, and SC-E4 are compatible with the SEC-400 and SEC-2000 series.
The SC-D6 and SC-E6 are compatible with the SEC-6470 and SEC-6480.
The CA series are conversion adapters that can be utilized when other
manufacturers mass flow control systems are used with mass flow controllers
and meters. Simply select the appropriate adapter for your needs.
Mass Flow Controllers 26
Choosing the appropriate mass flow controller model and specifications
s SEC series
SEC-7330
Model
M
*1
O
*2
Seal material
SUC
*3
Valve
Gas contact area
structure surface processing
Ar
*4
100SCCM
*5
1/4VCR
*6
Gas types
Full-scale flow
rate and unit
Fitting
*1
Select the seal material.
M: Metal seal
R: Rubber seal
If you are using poisonous or corrosive gases, we recommend using M (metal) as the seal material.
(Examples: AsH3, B2H6, PH3, GeH4, H2Se, BCl3, BF3, Cl2, F2, HBr, HF, SiCl4, TiCl4, CiF3, HCI, WF6, etc.)
*2
Select the desired valve state for when there is no electricity. (Select the desired normal valve state.)
O: Open
C: Closed
(This option is not available for flow meters.)
*3
Gas contact area surface processing
The gas contact area can be processed to ultra clean levels (option).
SUC: Surfaces are polished until the roughness is at the sub-micron level.
CRP: A CRP film (passivation film) is formed on the gas contact surfaces
(stainless steel).
*4
Select the types of gas you wish to use.
*5
Select the full scale flow rate and flow rate unit. The flow rate unit is usually
noted at 0°C or 25°C (101.3 kPa). See Chart 1 for more information.
Individual
specifications
*7
Chart 1
*6
Fitting
A variety of contact joints other than 1/4 VCR type fitting can be used. Units can
also be made compatible with integrated gas panels. Please contact HORIBA
STEC for more information.
*7
Units can be adjusted to meet non-standard specifications. Please contact
HORIBA STEC for more information.
Flow rate unit
L/min
mL/min
0°C display
SLM
SCCM
25°C display
LM
CCM
s Digital interface
RS-485.F-Net protocol :
SEC-Z512MG/Z522MG
RS-422A.F-Net protocol : SEC-F700series SEC-V100Dseries
DeviceNet™ :
Series
SEC-Z500
SEC-Z10D/DW
SEC-F700
SEC-V100D
SEC-7300
SEC-4400
SEC-4001
SEC-G100A
SEC-E400J
SEC-E40
SEC-8000
SEC-2000
SEC-400
SEC-Z514MG/Z524MG
SEC-Z10D/Z10DWseries
Operating temparture
Standard Flow Range Normal
High
(N2 Equivalent F.S.) temp model temp model
5SCCM to 50SLM
5SCCM to 100SLM
5SCCM to 30SLM
10SCCM to 50SLM
1SCCM to 100SLM
5SCCM to 100SLM
5SCCM to 20SLM
10SCCM to 5SLM
10SCCM to 30SLM
10SCCM to 500SLM
5SCCM to 100SLM
10SCCM to 100SLM
5SCCM to 200SLM
Seal material
Metal
Rubber
Internal
surface
polishing
Analog
Interface
Fitting
Digital (F-Net)
Digital
IGS
VCR Type Swagelok
type
RS-422A RS-485 DeviceNet™
1.125inch 1.5inch
Standard
Standard
Option
Option
Option
Option
Option
Standard
Option
—
Option
—
—
Mass flow meters: For the SEF series, please start by deciding without valve structure and then consider the other options.
GAS
Dimensions
<1>
SEC-Z522
<2>
SEC-V100 series
SEC-Z10D series
2-M4
P.C.D.42±0.1
2-M4
P.C.D.42±0.1
45°
31.9
H
C
A
T
31.9
<3>
SEC-4600
SEC-Z13DW
D
E
W
45°
37.5
<4>
SEC-600
4-M8
4-M4
50
61
60M4, depth 5
B
.4
R25
I
33.5
50
27
*Please contact HORIBA STEC for information on details not shown here.
Model
SEC-Z512
SEC-Z522
SEC-Z11D
SEC-Z12D
SEC-Z13D
SEC-Z11DW
SEC-Z12DW
SEC-Z13DW
SEC-F730
SEC-F740
SEC-F750
SEC-F440
SEC-F450
SEC/SEF-V110DM
SEC/SEF-V120DM
SEC-7320
SEC/SEF-7330
SEC-7340(LD)
SEC/SEF-7350
SEC/SEF-7355
SEF-7140
SEC/SEF-4400(MF)
SEC/SEF-4500(MF)
SEC/SEF-4550
SEC/SEF-4600
SEC-4400SP/SR
SEC-4401(MF)
SEC-4501(MF)
SEC-E440J
SEC-E450J
SEC-E40(MK3)
SEC-E50(MK3)
SEC-E60
SEC-E70
SEC/SEF-6470 *1
SEC/SEF-6480 *1
SEC-8340
SEC/SEF-8440
SEC/SEF-8450
SEC/SEF-8455
SEC/SEF-8460
SEC/SEF-2410
SEC/SEF-2510
SEC/SEF-2551
SEC/SEF-310
SEC/SEF-320
SEC/SEF-400
SEC/SEF-500
SEC/SEF-550
SEC/SEF-600 *1
SEC-400MK2·3
SEC-500MK2·3
*1
*2
*
*
H
T
W
126
143
127
127
151.3
140
140
172
106
126
140
112
112
116.5
116.5
106
106
126
140
145
106
126
132
150
150
126
126
132
112
112
126
126
159
159
147
152.5
130.5
120.5
127
150
150
122
131.5
137
80
80
122
131.5
137
140
115.5
125
28
38.5
28.5
28.5
38.6
38.6
38.6
80
35
35
40
38
38
37.6
37.6
28
28
28
34
49
32
32
32
50
80
32
32
32
38
38
32
32
44
44
40
108
48
32
32
50
80
25.5
32
44
20
20
25.5
32
44
67
25.5
32
63.8
63.8
81.8
81.8
63.8
63.8
63.8
125
64.2
64.2
64.2
76.2
76.2
63.8
63.8
63.8
63.8
63.8
63.5
80.8
47
76
108
108
125
76
76
108
76.2
76.2
76
76
95
95
150
204
76
76
108
108
125
76
108
136
60
60
76
108
136
122
76
108
I
(1/4 VCR)
I
(1/4 Swagelok)
I
(3/8 VCR)
31.5
I
(3/8 Swagelok)
106
106
124
124
150.4
106
106
177
106 *2
106 *2
106 *2
124
124
106 *2
106 *2
106 *2
106 *2
106 *2
106 *2
124
87
124
156
156
124
124
156
124
124
118
127
127
110
127
127
127
127
159
159
132
135
160
177
163
179
164
127
127
127
127
150.8
150.8
124
124
156
156
172
124
156
184
106
106
124
156
184
170
124
156
127
127
159
159
172
110
110
127
160
188
173
127
160
Please contact HORIBA STEC for details on the dimensions of the SEC/SEF-6470/6480.
Surface dimensions: 124 mm models can also be produced.
Please contact HORIBA STEC to request a copy of the dimension drawing.
Equivalent products are sometimes used in place of the joints listed here.
160
177
131
163
191
163
179
131
163
191
177
131
163
190
175
131
163
163
80
30
80
A
B
C
D
E
21.9
See <1>
See <2>
See <2>
21.9
See <2>
See <2>
See <3>
22.1
22.1
19.4
19.1
19.1
See <2>
See <2>
21.9
21.9
21.9
19.2
20.4
27.6
19
20.2
20.1
See <3>
19
19
20.2
19.1
19.1
3.5
3.5
3.5
3.5
—
—
19
19
20.2
20.1
31.5
3.5
17.2
30
20
20
3.5
9
17.2
See <4>
3.5
9
20
6.5
15
20
4.8
29
20
20
25
38.1
38.1
10
10
7.5
9.75
9.75
15
15
25
18.5
18.5
20
20
20
25
40
0
38.1
67.7
67.7
6.5
6.5
6.5
4.5
12
9
6.75
3.7
12.7
15
15
15
25
25
14
18.5
24.6
24.6
38.1
38.1
67.7
38.1
38.1
69
69
50
50
45
—
38.1
38.1
67.7
67.7
80
69
101.6
80
20
20
69
80
101.6
6.75
6.75
3.7
9.75
9.75
6.75
6.75
8
8
—
—
6.75
6.75
3.7
12.7
15
3.5
9.3
33.5
10
10
3.5
3.7
9.3
18.5
18.5
24.6
18.5
18.5
18.5
18.5
28
28
20
—
18.5
18.5
24.6
24.6
50
18.5
25.4
—
—
—
18.5
24.6
25.4
69
90
3.5
3.7
18.5
24.6
12.7
12.7
12.7
12.7
15.6
12.7
12.7
20
12.7
12.7
12.7
12.7
12.7
12.7
12.7
12.7
12.7
12.7
12.7
20
12.7
12.7
14.6 inner ; 12 outer
14.6 inner ; 12 outer
20
12.7
12.7
14.6 inner ; 12 outer
12.7
12.7
12.75
12.75
22
22
35
50
22.7
12.7
14.6 inner ; 12 outer
14.6 inner ; 12 outer
20
12.7
14.6 inner ; 12 outer
14.6 inner ; 12 outer
10
10
12.7
14.6 inner ; 12 outer
14.9
20
12.7
14.6 inner ; 12 outer
Mass Flow Controllers 28
Accessory dimensions
s PAC-S6
46
2.5
190
+0.5
0
sPAC-D1/D2
3 or higher
Max. 22
1.6
+0.5
0
*10 or higher
*3 or higher
92
93 +0.5
0
2.5
46
93 +0.5
0
96
*10 or higher
189+0.5
0
187.6
192
Max. 21
170
48n-2
1.8
2.5
48
45
+0.5
0
2
2.5
1.5
2.2
189+0.5
0
48
44.4
1.6
48n-2 +0.5
0
*Where n is the number of
PAC-S6 units installed.
*Where n is the number of
PAC-D1/D2 units installed.
sPAC-4I/6I
120 ±0.3
118±2
80±2
sPAC-1I
167.5±2
(220±2)
56 ±0.2
60
4-M4
10
6.5
4-M3
17
45 ±0.3
32 ±0.2
90 ±0.3
39
sDU-102E
100
* Dimensions in parentheses
( ) are for the PAC-61.
sDU-102K
2-M3 tap
44.7±0.3
+0.5
77
45
86
80 -0
80
94
22.2
25 -0
+0.6
0
+0.5
2-ø3.5
45
86±0.2
50±1
22
9
22
7
27
83±1
23
24
80
25
7
+0.6
0
Panel thickness: 0.8 mm to 3.0 mm
21
48
5 20
35
19
sSU-502ED
sSU-502EA
Digital dial
sSettings unit
Analog dial
Panel installation
opening
3.3 dia.
9.5
3/8-32 UNEF thread
1.58
2 dia.
14
26.4
sFI-1100
109
48
96
9.5 dia.
*
13.5 dia.
22/2 dia.
19
19
49.5
168 dia.
44
32
24
10.5 dia.
19.2
+0.8
70
134.2
+0.5
45 -0
92 -0
120
20.6±0.79
ø6
19.1
Panel installation
opening
10.5 dia.
ø10.3
2.2
25.4
7.9
29
Pressure
Pressure Controllers
HORIBA STEC’s mass flow controllers are renowned for their precise flow
rate control of fluids, and have the number one share in the worldwide
market. HORIBA STEC has applied the technology it developed in creating
its mass flow controllers to a new field, pressure control. HORIBA STEC’s
lineup of pressure control systems includes the UR-7300 series of ultra clean
automatic pressure regulators; the GR-100 series, which is the world’s
smallest class of wafer back side cooling systems and was developed in
collaboration with mass flow controller engineers; the EC series of exhaust
pressure controllers for internal chamber pressure control; and the PV series
of fast response systems that feature piezo actuator valves with metal O-rings.
HORIBA STEC also offers systems that offer flow rate and pressure control for
liquids using multi-dimensional technology.
Pressure Controllers 30
UR-7300 series
Automatic pressure regulator
The UR-7300 series automatic pressure regulators are electronic
regulators with high-precision pressure sensors and high resolution,
fast response piezo actuator valves. They control the pressure in
accordance with the electric signal (0 to 5 VDC) they receive from
the exterior. The all metal construction of the gas contact area (M type)
makes these units ideal for ultra clean pressure control of ultra pure
gas supply systems and active gas lines.
sUltra clean: All metal construction (M type)
sFast response: Response speed: Within 0.5 sec.
sFlexible design: These regulators can be attached in any position or
attitude, and the fact that they use an electric signal for control
makes them suitable for a wide variety of gas supply systems.
GR-100 series
Wafer back side cooling system
The GR-100 series consists of pressure controllers for the He gas that
is used to cool the back side of wafers. These units include a pressure
sensor, mass flow meter, and control valve within a size that makes
them the world’s smallest class.
sReliable control: Feature a newly developed solenoid valve with
superior fine pressure control.
sInclude a mass flow controller sensor: By measuring the flow rate of
the He gas while controlling the pressure, the GR-100 series units
can detect the amount of He gas leakage in the chamber.
sCompact design: Feature a 39 mm x 39 mm body that enables
the creation of compact wafer back side cooling systems.
PV-1000/2000 series
Piezo actuator valves
The PV-1000/2000 series consists of piezo actuator valves with metal
diaphragms and metal O-rings. Combine them with a pressure sensor or
flow rate sensor and ratio control unit (PCU series) to create a pressure
control or flow rate control system.
sUltra clean: All metal construction.
sSuitable for control of a wide range of flow rates: Support flow rate
control for very small and very large flows.
sHigh-temperature models: PV-1000S/2000S types.
EC-5000 series
The EC-5000 series consists of exhaust pressure controllers that
can maintain a consistent pressure (at a pressure set by the user)
in the chamber. The high-resolution stepping motor and unique
butterfly valve assure a fast, high-resolution response.
sSuitable for high vacuum: Stainless steel body.
sCorrosion resistance: Models with PTFE coated bodies are
available.
sCreate an exhaust pressure control system: HORIBA STEC’s
lineup includes a very small differential pressure sensor
(EMTGC1B-A) and controller (PCU-3000).
Exhaust pressure controller
Pressure
UR-7300 series
UR-7340 (-B)
Model
Seal material*1
R: Viton®
M: Metal
Valve state when there is no electric current
(Normal valve state)
UR-7350 (-B)
R: Viton®
M: Metal
O: Open
C: Closed
Gauge pressure type: 20 to 950 kPa (G)
10 to 500 kPa (G)
Absolute pressure type: 10 to 300 kPa (A)
Gauge pressure type: 20 to 950 kPa (G)
10 to 500 kPa (G) *2
Absolute pressure type: 10 to 300 kPa (A)
R: Viton®
M: Metal
R: Viton®
M: Metal
O: Open
C: Closed
Gas
Types of fluids
Pressure control range
Pressure adjustment valve flow rate
N2 equivalent F.S. flow rate value
Gauge pressure type: 20 to 950 kPa (G)
20 to 950 kPa (G)
Absolute pressure type: 10 to 300 kPa (A)
Pressure conditions: One-dimensional pressure 50 kPa (G); two-dimensional pressure atmospheric pressure [1013 hPa (A)]
Under the pressure conditions listed above, 1 LM <0.0032>/5LM <0.016> * Within <> = Cv values
Gauge pressure type: 10 to 500 kPa (G)
Absolute pressure type: 10 to 300 kPa (A)
Pressure conditions: One-dimensional pressure 50 kPa (G); two-dimensional pressure atmospheric pressure [1013 hPa (A)]
Under the pressure conditions listed above, 10 LM <0.0032> * Within <> = Cv values
1% F.S.
Accuracy
Gauge pressure type: 1 MPa (G)*3
Absolute pressure type: 400 kPa (A)
Gauge pressure type: 1 MPa (G)
Absolute pressure type: 400 kPa (A)
Max. one-dimensional pressure
Gauge pressure type: 550 kPa (G)
Absolute pressure type: 400 kPa (A)
Gauge pressure type: 1 MPa (G)
Absolute pressure type: 400 kPa (A)
Gauge pressure type: 50 kPa (d); absolute pressure type: 100 kPa (d)
Minimum differential pressure
Gauge pressure type: With 950 kPa (G), 1.5 MPa (G); with 500 kPa (G), 1 MPa (G)
Absolute pressure type: With 300 kPa (A), 450 kPa (G)
Differential pressure
Metal type: 5 x 10
Leak Integrity
-12
3
Gauge pressure type: With 500 kPa (G), 1 MPa (G)
Absolute pressure type: With 300 kPa (A), 450 kPa (G)
-8
3
Pa·m /s (He) or under; rubber type: 1 x 10 Pa·m /s (He) or under
5 to 50°C (accuracy guaranteed between 15 to 35°C)
Operating temperature
SUS316L
Materials at gas contact area
SUS316L, Viton
®
SUS316L, Viton®
SUS316L
SUS316L, Viton®
SUS316L
SUS316L, Viton®
SUS316L
1/4 VCR type
Standard Fitting
0 to 5 VDC (input impedance 1 MΩ or higher)
Pressure setting signal
0 to 5 VDC (minimum load resistance 2 kΩ)
Pressure output signal
+15 VDC ± 0.5%, 50 mA; -15 VDC ± 0.5%, 50 mA (maximum instantaneous power 120 mA)
Drive power source
*1 (-B): Provides one-dimensional pressure adjustment (back pressure type). *2 For the (-B) type, only 10 to 500 kPa is supported. *3 For the (-B) type, up to 550 kPa (G).
* Pressure values written within square brackets [] are for reference only. NOTE: MO: Metal seal, normally open; RO: Rubber seal, normally open; B: Supports one-dimensional pressure adjustment (back pressure type).
* Internal surface polishing is available for metal seal type models. (A): Absolute pressure; (G): Gauge pressure; (d): Differential pressure * LM is a symbol indicating gas flow rate (L/min at 25°C, 101.3 kPa).
* Viton® is registered trademark of E. I. DuPont de Nemours.
s UR7300 model selection
Model
Valve state when there is
no electric current Pressure adjustment
direction
(Normal valve state)
Seal material
Internal surface
polishing
Pressure specifications
Pressure adjustment
flow rate
Joints
Details
UR-7340
UR-7350
Pressure adjustment flow rate: 1 LM/5 LM
Pressure adjustment flow rate: 10 LM
Metal (SUS-316L)
M
Viton®
R
O
Normally open
C
Normally closed
Two-dimensional pressure adjustment pressure type: Standard
One-dimensional pressure and
maximum flow rate (for 5 LM F.S. N2)
One-dimensional pressure adjustment pressure type
–B
UC
50 LM
Maximum flow rate (LM)
31
Available as an option only for metal seal models.
3 PA
10 to 300 kPa (A)
5 PG
10 to 500 kPa (G)
40 LM
9.5 PG
30 LM
Set pressure
E
20 LM
A
D
B
C
10 LM
B
A
C
D
E
0
200
400
600
800
100 kPa (G)
200 kPa (G)
300 kPa (G)
400 kPa (G)
500 kPa (G)
20 to 950 kPa (G)
1 LM
Cv value: 0.0032
5 LM
Cv value: 0.016
Cv value: 0.032
10 LM
1/4 VCR type
1000
Standard specifications
Swagelok type, etc.
Others
One-dimensional pressure
* Viton® is registered trademark of E. I. DuPont de Nemours.
PV-1000/2000 series
Model
PV-
1000
2000
Materials at gas contact area
Valve type*1
Control flow rate (full scale)
Open at power-off: O Close at power-off: C
Standard flow rate range
1/5/100/200/500 CCM
1/2/5 LM
(N2 equivalent F.S.; input pressure:
atmospheric pressure; outlet pressure: vacuum)
10/20 LM
Flow rate control range
2 to 100%
Response speed
Within 5 seconds (T98)
Operating differential pressure
300 kPa (d)
Maximum operating pressure
300 kPa (G) or under
Pressure resistance
1 MPa (G)
1 x 1011 Pa·m3/s (He)
Leak Integrity
Operating temperature
5 to 50°C (accuracy guaranteed between 15 to 45°C)
Flow rate setting signal
0 to 5 VDC (input impedance 1 MΩ or higher)
Flow rate output signal
0 to 5 VDC (minimum load resistance 2 kΩ or higher)
Drive power source
+15 VDC ± 5%, 50 mA; -15 VDC ± 5%, 50 mA, 1.5 VA
Standard Fitting
1/4 VCR type
*1 Only the PV-2203 (flow rate range: 20 LM) offers a valve that is closed when there is no electric current (normally closed).
* Regarding the PV-1000S/200S: Ambient temperature range for operation: 80°C (max.); baking temperature: 150°C;
valve closed when there is no electric current (normally closed). The ambient temperature range for operation, flow rate
range, control range, and other standard specifications may vary if the unit is used in conditions other than those indicated
above. Please contact HORIBA STEC for more information.
* CCM and LM are symbols indicating gas flow rate (mL/min, L/min at 25∞C, 101.3 kPa).
EC-5000 series
Model
EC-
Compatible size
Materials at gas contact area
Conductance
(in vacuum area)
Outflow at 100 mm H2O
(fully closed)
®
s Model selection chart by flow rate
SUS316L
5104
5105
NW40
NW50
SUS316L, Viton
®
5202
25 mm PTFE fitting
1 inch PTFE fitting
PTFE, PEEK, Viton®
0.4 to 80L/s
0.6 to 200L/s
——
20L/min
25L/min
3L/min
* Viton is registered trademark of E. I. DuPont de Nemours.
N2 conversion
Ar conversion
H2 conversion
1 CCM
5 CCM
100 CCM
200 CCM
500 CCM
1 LM
2 LM
5 LM
10 LM
20 LM
0.5 CCM
3 CCM
60 CCM
90 CCM
300 CCM
600 CCM
1 LM
2 LM
4 LM
10 LM
2 CCM
10 CCM
200 CCM
500 CCM
1.5 LM
3 LM
5 LM
15 LM
30 LM
60 LM
Model
PV-1010MC
PV-1050MC
PV-1101MC
PV-1201MC
PV-1501MC
PV-1102MC
PV-1202MC
PV-1502MC
PV-2103MC
PV-2203MC
Pressure Controllers 32
UR-7300 series
s Fast, accurate pressure adjustment when the source pressure changes
The primary source pressure changes abruptly. With traditional
pressure adjustment equipment, this might have an effect on
the secondary pressure in the mass flow controller, due to issues
with responsiveness and pressure adjustment characteristics.
Furthermore, in extremely small flow rate ranges, a phenomenon
described as hunting may occur due to problems with the pressure
adjustment resolution. The high-precision, highly responsive UR
offers accurate, stable pressure control.
With the UR
When gas is split by a large unit such as an MOCVD or LCD spatter
CVD, and controlled by a mass flow controller, sudden changes in
the flow rate can have an impact on other lines. The UR, however,
quickly and accurately adjusts the pressure even in these
circumstances, enabling stable control and ensuring that the various
mass flow controllers do not affect each other.
UR
MFC
Chamber
With traditional methods
Secondary
pressure
Primary
pressure
s Multiple lines prevent pressure interference
Primary
pressure
Secondary
pressure
MFC
Chamber
Mass flow controller output
Mass flow controller output
s Remote pressure settings (which dramatically reduce dead volume)
Since the pressure control is carried out using electric signals, the UR7300 series features a gas piping design that would be difficult to use
in traditional pressure adjustment equipment. The simple piping design
reduces dead volume to almost zero, preventing gas buildup and
making it much easier to replace the gas. It is no longer necessary to
have a pressure gauge or pressure adjustment knob on the operation
panel, either.
With the UR
With traditional methods
UR
Chamber
Chamber
G
Operation panel
GR-100 series
PV-1000/2000 series
s Fast, accurate pressure adjustment when
s Pressure control from an external unit
the source pressure changes
In order to cool the wafers during processing, He gas is applied to
the back side of wafers. The GR-100 offers fine pressure control
while also monitoring the amount of He gas being introduced and
the amount of leakage to the chamber.
Dead volume
Piezo actuator valves: The PV series units perform pressure
control in accordance with a control signal from an external unit.
The pressure signal from the pressure sensor and the control
signal from the external unit are input to the PCU-1000/2100.
The control unit’s internal PID circuits calculate the optimal
control conditions and output an aperture level signal to the piezo
actuator valve. The PCU-2100 control unit also features
a pressure control signal setting function.
Wafer
External control unit
Sequencer, etc.
Static electricity
check Susceptibility
Pressure setting signal
Pressure measurement signal
0 to 5 VCD or 4 to 20 mA
GR
He inlet
Exhaust
PCU 1000
or
PCU 2100
GR
Vacuum pump
AC 100 V
Signal cable
(SC-DH2 type)
Pressure sensor
PV
Chamber
Pressure
adjustment unit
P
Pressure
EC-5000 series
s Spin coater/developer processing
s Diffusion/heat oxidation processing
· For vertical furnaces,
especially phosphor diffusion.
Ideal for pyrogen oxidation.
· Teflon® type for high
temperatures.
Suitable for corrosive gases.
· Corrosion-resistant pressure
sensors also available.
Mass flow
controller
SEC
Factory duct
PCU-3000
AC 100V
SC-EMT
Ball
valve
Pressure
sensor
SC-EC2
Diffusion
furnace
When the exhaust flow rate is adjusted to optimal levels:
· The resist is distributed in an even film.
· Secondary deposition of the mist is prevented.
· The diffusion of dangerous vapor is prevented.
Furthermore, there is less change in sensitivity caused by the accumulation
of resist and other contamination, compared with flow rate sensor control,
and the influence of turbulence and other noise is eliminated, which
enables superior, stable, responsive control.
Dry air
PCU-3000
Wafer
SC-EC2
AC 100V
Pressure
sensor
Trap
Control valve
Set pressure from 200 Pa (50 Pa)
Trap
s Impact of source pressure changes
s Control responsiveness
This graph indicates the valve control state when the source
pressure changes. Note the superior stability.
Note the fast response through the time when the valve is fully open.
200
100
20
100
50
10 sec.
Controlled pressure
Valve position
0
Control
Open
Open
10
0
50
Controlled pressure
10 sec.
Valve position
0
Valve position (%)
100
Pressure (Pa)
House exhaust
Valve position (%)
House exhaust
Pressure (Pa)
33
0
Pressure control peripherals
s Corrosion resistant pressure sensor
s Pressure control unit
EMTGC1B-A
PCU-2100
· The EMTGC1B-A is the first corrosion-resistant pressure
sensor made of corrosion-resistant plastic (PEEK).
· Can be built in for easy panel design.
· Features an internal pressure change unit with ±15 V
electric current.
· Both upper and lower limit alarms can be set.
· Can be connected to an external computer for
programmed operation.
· Long-distance control is possible, using 4 to 20 mA
electric current mode input/output.
· Digital display for verification of measurement and
control data.
· Dial for setting the target control value.
Pressure gas range
(Full scale values)
Precision
Port
Materials at gas contact area
Power source
Output
200/500/1000/2000 Pa (load pressure)
±3% within full scale
NPT 1/4
Corrosion-resistant plastic
DC 24 V
4 to 20 mA
s Intelligent control unit
PCU-3000
· The PCU-3000 features a CPU that calculates
the optimal aperture condition for the valve, and
the unit automatically controls the valve to keep it
at that aperture.
· Improved response with a new type of control
sequence.
· Compatibility with a variety of sensors and valves,
in a single unit.
· External control available in EXT mode.
Pressure sensor used
Power source for sensor
Pressure measurement range
Control modes
Additional functions
External control
Power source
DC 0 to 0.1/0.5/1/5/10 V, DC 4 to 20 mA
±15 V, max. 250 mA internally;
+24 V (max. 50 mA for two-line type electric current electric transmission type)
0 to 100% F.S.
AUTO (control using internal settings); EXT (control using external signal);
RMT (control using communications function: option)
HOLD (maintains valve aperture); CLOSE (closes valve); OPEN (opens valve)
Pressure alarm, valve polarity switching, pressure sensor input value correction,
valve aperture output, external control
RS-232C/RS-422A (control)
AC 90 to 284 V, 50/60 Hz, max. 80 VA
Pressure Controllers 34
Dimensions (mm)
s GR-100
28±1
18.5
38.1
2-M4, depth 5
11
UR-7340
124±1
130±1
52±1
94±1
A
B
C
D
UR-7350
132±1
138±1
61±1
103±1
39
81.2 ±0.2
39
4-M4, depth 5
32
DC
12.7
A
B
130
136
s UR-7340/7350
32
s PCU-2100
2-Ø5
90±1
B
s PV-1000/2000
1
175 ±1
4
189
178±1
199
189
A
12.5
3
40±1
86±1
15 20 30
10
50
7
70
5 3 100
PV-2000
32.0±1
125.5±2
16.75
47.5
INC
188.5
51
(52 ±0.3 )
5
PV-1000
25.0±1
118.5±2
14.0
42.0
A
B
C
D
2-M4, depth 5
s EC-5104/5105
15 20 30
10
50
7
70
5 3 100
15 20 30
10
50
7
70
5 3 100
C 14
D
23±1
2
1.6
2-M4
26
52
52 ±0.3
213 or less
s EC-5202
62
88
125
111
R3
90
6
7
10
72
ØC
D
2-M4, depth 8
190
s EMTGC1B-A
(33.1)
88
100
116
128
20
4-M4 or Ø5
90
116 ±0.3
200
186
64
18
ole
)
+0.8
0
1
2
CHECK
88 ±0.3
Panel cut dimensions (1/2)
(Conforming panel widths: 1 to 3.5)
3
31
0 (H
4
4-2oma DC
94
91
92 +0.8
0
Ø3
Panel cut dimensions
4
1.7
(60)
45
20 max.
185
209 ±2
(180)
100
(48)
192
(199)
60
55
60
10 30
96
(8.3)
EC5105
52.2
75
90
70
84
104
228
5
s PCU-3000
EC-5104
39
55
78
50
72
92
216
91
60
ØA
ØB
ØC
D
E
F
G
1.6
EF
ØA
ØB
30
G
Solutions for compound semiconductor processes
HORIBA STEC offers the components required to create
reliable vaporization systems for the fluids used in compound
semiconductor processes, such as TMAI, TMIn, TMGa, and
DEZn, During the vaporization of fluids, it is important to
regulate the bubbling gas flow rate and internal pressure in
the fluid cylinders, and to control the vaporization temperature
precisely. HORIBA STEC produces a full lineup of mass flow
controllers (SEC series), capacitance manometers (VG series),
piezo actuator valves (PV series), and feedback controllers
(PCU). The company also offers the IR-150 series of compact
monitors, which directly measure and control the density of
the gases being generated, using non-dispersive infrared
analyzer method (NDIR). What’s more, HORIBA STEC offers
exclusive software that provides unified control for all these
devices, to help customers build the fluid vaporization system
that best suits their needs.
Control system
PCU
UR
SEC
VG
IR-150
PV
Chamber
35
LIQUID
Liquid Source Vaporization Control Systems
As semiconductor devices get faster and levels of
integration increase, more detail is required in device
construction, and new materials are being introduced
into the 300 mm wafer production process to increase
production efficiency. As a result of this trend, there is
now a larger variety of liquid sources used in
the semiconductor manufacturing process, and flow
rates have increased as well.
HORIBA STEC offers a full lineup of liquid source
vaporization control systems, including liquid source
vaporization devices (injection method, baking method)
to match any process and recharge systems that quickly
and safely supply the liquid to the vaporization device
from the liquid cylinder.
Liquid Source Vaporization Control Systems 36
LF/ LV series
Digital Liquid Mass Flow Meter/Controller
Featuring the world's first sensor with a unique cooling method
sOffer micro-liter to ultra low flow rate control.
sEnable precision flow control of low boiling
point and high viscosity liquids.
sUltra clean.
MI/MV series
Mixed injection
Vaporize liquids efficiently using the gas-liquid mixture vaporization method
sThe gas-liquid mixture vaporization method enables stable
vaporization of high boiling point liquids.
sHighly efficient and stable vaporization.
sCan be used for low temperature, large flow production.
sCompact vaporization system easily fits into ideal designs.
VC series
Compact vaporization system that can be used in different
configurations, thanks to its use of non-carrier vaporization
sCompact: 1/5 the size of previous models
sCan be installed in a variety of positions.
sBest-selling TEOS vaporization system models.
sNo need for a special bubbling tank or vaporization tank.
Direct injection
37
LIQUID
LSC-A100
Compact baking system
Best-selling baking system model
The LSC series is a lineup of liquid material gasification systems for
materials such as TEOS, a popular series with a history of proven
performance. The LSC-A100 is the newest model in the series, and is
capable of generating high flow rates. As with previous models, the new
LSC-A100 provides stable gasification of liquid materials without using
a carrier gas. Furthermore, the compact LSC-A100 also provides high
flow rate gasification.
sHigh Flow Rate Gasification: The LSC-A100 provides stable
gasification of materials such as TEOS 600SCCM and H2O 2SLM.
sAll device maintenance can be performed from the same location at
the front of the unit.
sAn optional PocketPC type PDA can be used to monitor the operating
conditions of the LSC and to record and analyze operation logs.
LU-A100
Auto-recharge system
Safe, efficient, automatic supply of liquid sources
to vaporization systems
The LU-A100 liquid material recharging system provides automatic, safe, waste-free
material supply to liquid material baking systems (LSC series) and injection systems (VC and
TL systems). The LU-A100 complies with all S2.S8.CE marking safety standards. In order to
prevent operation errors during the dangerous procedure of tank replacement, the LU-A100
includes a function for automatically implementing a remaining liquid purge sequence
(provided as a standard LU-A100 function). Maintenance efficiency and product throughput
have also been improved with the LU-A100.
sImproved Operability: Operating sequences have been automated to prevent
operation errors. Operations can also be easily controlled with a touch panel on
the front of the unit.
sImproved Safety: A variety of monitoring devices provides total automatic control.
The LU-A100 is also equipped with an automatic emergency shutdown function that
is activated if a system probrem occurs.
sReduce Piping Wasted Space: The LU-A100 uses an integrated gas system.
sCan provide automatic liquid material supply to multiple baking systems and injection
systems.
TL series
Basic systems that enables stable vaporization
in atmospheric pressure and support large flow vaporization.
sFeature a specially designed vaporizer. The introduction of
a carrier gas enables stable vaporization in atmospheric
pressure and large flow vapor generation.
sSystems consist of a carrier gas mass flow controller, liquid
mass flow controller for liquid source control, and vaporizer.
sVaporization systems available to suit generation pressures
and flow rates for a variety of liquid sources.
Liquid source vaporization systems
Liquid Source Vaporization Control Systems 38
LF/LV series
Model
LF-F20M-A
LF-F30M-A
LF-F40M-A
LF-F50M-A
LF-F60M-A
0.02/0.05/0.1
0.2/0.5
1/2/5
10/20
50/100
Flow Range (g/min)
Measurement Range
0.02/0.05/0.1
0.2/05
10/20
1/2/5
50/100
5 to 100% F.S.
Application Liquid*1
All liquids except those corrosive to stainless steel (ex, HCl and HF)
Viscosity*2
max. 0.1 Pa·s (100cp)
max. 0.01 Pa·s (10cp)
± 1% F.S.
Accuracy*3
± 0.5% F.S.
Linearity
± 0.5% F.S.
Repeatability
Response speed
LV-F20(PO/MO) LV-F30(PO/MO) LV-F40(PO/MO) LV-F50(PO/MO) LV-F60(PO/MO)
*4
Operating Temperature
Less than 3sec (T98)
Less than 3sec (T98)
Less than 2sec (T98)
*5
Less than 2sec (T98)
5 to 50°C (Accuracy Guaranteed 15 to 45°C)
± 0.1%F.S./°C max± 1%
Temperature coefficiency
Operating Pressure*6
Max. 5MPa (as flow meter) / 50 to 300kPa (with piezo control valve)
0.05 to 0.3 MPa
Pressure Resistance
10MPa (as flow meter)
1MPa
Pressure Drop*7
max. 500Pa
Flow Rate Signal
Analog: 0 to 5 VDC Digital: RS485
+15 V ± 5%, 200 mA
Power Supply
-12
PO Type: Less than 1 to 10-8Pa·m3/s (He)
5 x 10 Pa·m /s (He)
Leak Integrity
SUS316L, Ni
Wetted Material
Standard Fitting
-15 V ± 5%, 200 mA
3
MO Type: Less than 5 to 10-12Pa·m3/s (He)
PO Type: SUS316L, Ni, PTFE, PFA
1/16" , 1/8" compression fitting, 1/8" VCR type
MO Type: SUS316L,Ni
1/16" , 1/8" compression fitting, 1/8" VCR type
1/8" compression fitting 1/8" VCR type 1/4" compression fitting 1/4" VCR type
1/8" compression fitting 1/8" VCR type 1/4" compression fitting 1/4" VCR type
*1 With the LF/LV Series, flow rate calibration is performed using one specified type of liquid. (Please indicate the type of liquid to be used when ordering the device.)
- Liquids containing solid materials cannot be measured.
- Please consult us in advance if you plan to use these devices with liquid mixture for which the mixture ratio may vary.
- With the LV Series, if the liquid to be measured contains particle etc., please install a 0.2 µm (Abs) filter on the primary side.
*2 The LV Type can be used with a maximum viscosity of 0.01Pa_s depending on the flow rate range. Please consult us in advance if you plan to use this device with high-viscosity liquids.
*3 Specification of accuracy, linearity and repeatability is guaranteed against calibrated liquid based on SEMI E56-1296. *4 It is the specification which is adjusted by Auto-PID function with our piezo control valve.
*5 In order to ensure precise measurement, please maintain incoming liquid temperature to be within 10 deg.C lower or 3 deg.C higher than the ambient temperature.
*6 Specification of Operating Pressure is the pressure range when liquid viscosity is 0.001Pa_s. *7 Specification of pressure drop is when liquid (with viscosity of 0.001Pa_s) is introduced at 100% F.S. of measurement point.
VC series
VC-1310
VC-1410
1.0 CCM or less (liquid phase conversion)
Max. 5.0 CCM conversion (liquid phase conversion)
Model
Flow rate generated*1 (During TEOS generation)
All liquids except those corrosive to stainless steel (ex, HCl and HF)
Liquids supported
Max. 150°C
Temperature rise
Pressure generated*1
Reduced pressure
External leak: 1.0 x 10-8 Pa·m3/s (He) or less; Internal leak: 1 x 10-6 Pa·m3/s (He) or less
Leak Integrity
Materials in gas contact area
SUS316L (PTFE)
Internal heater volume
AC 100 V, 70 W (35 W x 2)
Temperature sensor used
Thermocouple K type (CA)
1.0 MPa (G)
Pressure Resistance
Liquid inlet: 1/16" special joint, 1/8" VCR type male, 1/8" Swagelok type; Gas outlet: 1/4" VCR type male, 1/4" VCR type female
Standard Fitting
*1 Varies depending on the type of liquid. *CCM is a symbol indicating gas flow rate (mL/min at 25° C, 101.3 kPa).
MI/MV series
MI-1000
Model
Liquid Material
Heater
MV-1000
All liquids except those corrosive to stainless steel( ex. HCl, HF)
Example generated flow rate: TEOS(to 7g/min),IPA(to 3cc/min)
Max. 5.0 CCM conversion (liquid phase conversion)
120V(100W) / 208V(100W ) /240V(100W) available
Control Valve: 120V(100W) / 208V(100W) / 240V(100W) available Vaporizer: 120V(100W) / 208V(100W) / 240V(100W) available
SUS316L,PFA
Wetted parts
Control Valve: Max 140°C Vaporizer: Max 200°C
Setting Temperature
Max 140°C
Temperature Sensor
Thermocouple K type
Thermocouple K type (Control valve, Vaporizer)
Temperature Switch
High limit 2450RC 160°C (ELMWOOD) NC type
Control Valve: High limit 2450RC 160°C (ELMWOOD) NC type Vaporizer: High limit 2450RC 250°C (ELMWOOD) NC type
Less than 1 to 10-8 Pa·m3/s (He)
External leak
Control Valve: Less than 1 to 10-6 Pa·m3/s (He) Air Valve Option: Less than 1 to 10-9 Pa·m3/s (He)
Control Valve: Less than 1 to 10-6 Pa·m3/s (He) Vaporizer: Less than 1 to 10-9 Pa·m3/s (He)
Liquid Inlet 1/8inch VCR type Male Gas Inlet 1/4inch VCR type Female Gas Outlet 1/4inch VCR type Male
Liquid Inlet 1/8inch VCR type Male Gas Inlet 1/4inch VCR type Female Gas Outlet 1/2inch VCR type Male
Operating Temperature
15°C to 50°C
15°C to 50°C
Pressure Resistance
1.0MPa (G)
1.0MPa (G)
Pneumatic valve
Pneumatic valve
620 ± 10g (Standard Type) , 700 ± 10g (Air Valve Option Type)
1110 ± 10g (Standard Type) , 1190 ± 10g (Air Valve Option Type)
Leak Integrity
Standard Fitting
Option
Weight (exclude cable)
LSC series
LSC-A100 series
Model
Flow rate generated
H2O 2SLM, TEOS 600 SCCM (Max.)
Operating pressure
Max. 1.33kPa
Source tank volume
2.7L
Heat regulation method
PID control by the heat regulator
Liquid surface detection method
Floating switch
Internal mass flow controller
SEC-8400 series
Bellows type
Air pressure valve
Materials in liquid connection
and gas contact area
SUS316L, PFA
20 to 35° C
Operating Temperature
External input
Air pressure valve open/close, mass flow controller flow rate setting signal (0 to 5 V DC/0 to 100% F.S.), emergency stop signal, auto zero signal (option)
External output
Temperature alarm, liquid level H.H. alarm, liquid level signal (H, M, L), READY signal, mass flow controller flow rate output signal ((0 to 5 V DC/0 to 100% F.S.), thermoregulated bath internal fan stop alarm, valve voltage monitor (option)
AC 100 V, single phase 50/60 Hz, 1.5 kVA
Power source
Auto-recharge system: Can be connected to LU series.
Other
*The flow rate control range varies with the type of liquid.
* SCCM and SLM are symbols indicating gas flow rate (mL/min, L/min at 0° C, 101.3 kPa).
LU series
LU-A100 series
Model
TEOS, TMOB, TMOP, TEOP, BTBAS
Liquids supported
Pressure movement from He gas
Supply method
Gas supply pressure
For pressure movement: 0.3 to 0.6 MPa (G); For purge: 0.3 to 0.6 MPa (G), OP N2 0.6 to 0.7 MPa (G)
Maximum 5-gallon container can be attached (outside of production range)
Tank
Automatic supply/stop using external signal from supply system
Operation
Operation area display details
Pressure error display; When an alarm is triggered: Display hold function (manual reset); Liquid level display
Gas connection
Power source
Refer to basic flow
AC 100 to 240 V, 50/60 Hz, 300 VA
Electricity connection
AC 100 to 240 V breaker connection, signal receptacle
External dimensions
800 x 550 x 1770 mm (W x D x H)
* Please make decisions regarding the specifications above after meeting with STEC.
LIQUID
Measurement principles
s Cooling measurement method
s Structure/Operating principle
The flow rate sensor in the LF/LV series of fine mass flow controllers for
liquids consists of an electronic cooling element (Peltier element) that is in
contact with a capillary tube, as well as several temperature detection
elements. When the liquid is flowing, the sensor detects the temperature
rise (∆T) corresponding to the flow rate and displays it as a flow rate.
Unlike methods where heat is added, this cooling method enables flow
rate measurement of liquids with low boiling points. It also prevents
problems with interference due to the influence of secondary discharge
(vaporization) and makes accurate flow rate measurements possible.
The LV series of mass flow controllers are similar to the LF series of mass
flow controllers, but also have a piezo actuator valve and an internal
comparison control circuit. They compare the flow rate setting signal and
the flow rate output signal and automatically control the valve aperture so
that the two signals will match. Since they use a feedback control system,
there are no flow rate variations as a result of external factors, and stable,
accurate control is possible. The use of a piezo actuator valve, which is
both stable and does not generate heat, as the control valve makes
these units ideal for flow control of liquids with low boiling points.
Stainless steel capillary tube
Drive power source
Flow rate output signal
Flow rate setting signal
Ts
Liquid
Electronic cooling element
(Peltier element)
When liquid is flowing
Temperature (°C)
39
Correction
circuit
Comparison
control circuit
Amplification
circuit
Valve drive
circuit
Piezo actuator
Flow rate control valve
Sensor circuit
Metal diaphragm
Flow rate sensor
∆T
Temperature distribution When liquid is not flowing
in sensor area
Inlet
Outlet
Peltier element
Principle of vaporization
s Injection method
s Optimal vaporization methods for different liquids
The following list covers the major steps involved in vaporizing a liquid
source and supplying it to the process chamber.
1. The liquid source's flow rate is measured, and the amount of liquid is
feedback controlled by the valve.
2. The liquid is instantaneously and completely vaporized.
3. The gas is released without being allowed to condense back into its
liquid form.
Vaporization systems that use the injection method sequentially carry out
steps 1, 2, and 3 listed above. The VC series units measure the liquid flow
of the liquid source using a mass flow meter, and do not use a carrier gas.
The MI/MV series units use a mass flow meter for measurement, and
feature a mass flow controller that introduces a carrier gas into the unit to
vaporize the liquid source.
In semiconductor devices, which continue to require greater integration
and detail, a variety of liquid sources are used to accentuate
the characteristics of the films created. HORIBA STEC offers vaporization
systems that are optimized to make the most of the characteristics of
the various liquid sources used in today's cutting-edge processes.
High-k
TDEAH
MV
MV
TEMAH
TDMAS
MV
Pressure
MV
TAETO
Liquid
0.05
Solid
0.1
0.5
1 g/min
3
5 g/min
Low-k
Triple
point
Gas
VC
DMDMOS
Temperature
The graph above shows the different possible states of matter. There are two ways to get
from a liquid to a gaseous state. The first method involves increasing the temperature
while holding the pressure steady, as indicated by the arrow with the broken line (
).
This method is commonly used in everyday settings—to boil water and convert it to
steam, for example. Heating a liquid takes time, however, which makes rapid vaporization
difficult. On the other hand, one can also heat the liquid in advance and then abruptly
reduce the pressure, as illustrated by the arrow with the solid line (
). The pressure in
the vaporization section of the injector can be reduced instantaneously, and this makes it
possible to vaporize a liquid source instantaneously.
s Gas and liquid mixture method
This is the vaporization method used in the MI/MV series.
Since the pressure on the carrier gas is higher at the front
of the nozzle inside the injector, it can be heated
efficiently. The liquid source and the heated carrier gas
are mixed together in the gas/liquid mixing area
in the front of the nozzle, and the pressure is
reduced as they pass through the nozzle,
Gas in
which vaporizes the mixture. Vaporization
efficiency is higher than with traditional
vaporization methods. When this method is
used, larger flows can be generated, and the
Mixed gas
generation temperature can be reduced.
and liquid out
VC
HMDSO
4MS
VC
TMCTS
VC
1
The other
VC
DMDMOS
BTBAS
VC
HMDSO
TEOS
4MS
TEPO
MV
MV
TMCIS
TEB
TiCl4
H2O
VC
VC
IPA
Liquid in
MV
MV
VC
MV
0.1
1
5
20 g/min
Liquid Source Vaporization Control Systems 40
Basic flow
s LSC series
s TL series
Carrier gas inlet
1/4" VCR type male
Air pressure valve
Purge
1/4" VCR type male
SEC
Mass flow controller
Source
1/4" VCR type male
SEC
Outlet
3/5" VCR type male
VAPO
Mass flow controller
Outlet
3/8" VCR type male
Vaporizer
Purge liquid inlet
1/8" VCR type male
Drain
1/4" VCR type female
Valve
Liquid source inlet
1/8" VCR type male
Air pressure
valve
LV
Liquid
mass flow controller
Drain
1/8" VCR type male
Tank
s LU series
Sample 2
G
Sample out
1/4" Swagelok type
Sample 1
1/4" Swagelok type
P.S P.S
Vacuum
1/4" VCR type male
Exhaust
1/4" VCR type male
Check valve
Manual
valve
P
N2
1/4" VCR type male
F
Valve Filter
Regulator
P
P
He
1/4" VCR type male
Source 1
1/4" VCR type male
Source 2
1/4" VCR type male
F
Filter
Pressure sensor
P
Source 3
1/4" VCR type male
P
P.S
P
Air pressure Pressure
switch
valve
P
Source 4
1/4" VCR type male
Source 5
1/4" VCR type male
Source in
He out
Source 6
1/4" VCR type male
Drain 2
1/4" VCR type male
Tank
Load cell
Drain 1
1/4" VCR type male
Sample system configuration
Automatic supply
LU-A100
LSC
VC system
MI system
MV system
TL system
The LU-A100 auto-recharge system safely and efficiently supplies the liquid source to each type of vaporization system.
41
VACUUM
Vacuum measurement
Circuit densities and functionality continue to
increase, as the industry pursues ever-greater
capabilities in semiconductor devices. Improving
productivity is the single most important industry
goal for the processes used to create
semiconductor devices today. The factor
receiving the most attention as a way to increase
productivity is ensuring that the results of
repeated processes are consistent. To achieve
this requires certain key products that can
provide higher precision and real-time
measurement of the status of the chamber and
wafers. HORIBA STEC offers a lineup of residual
gas analyzers (RGAs) used to measure the gas
that is left in the chamber after processing, and
capacitance manometers used to measure
pressure. HORIBA Group companies also offer
related products, including many featuring
the optical analysis technology developed by
HORIBA Group company Jobin Yvon.
Vacuum measurement 42
Micropole™ System
Residual Gas Analyzer
The world’s smallest complete mass spectrometer system
sWorld's smallest and lightest.
sFeatures nine pairs of quadropoles.
sCan operate at low vacuum (high pressure): 1.46 Pa (11 mTorr)
sHigh-speed measurement. Scanning speed: 0.6 sec/mass.
Resolution: 0.5 AMU. Detection limit: 1.33 x 10-8 Pa.
sUses disposable sensor heads.
sNo need for degassing.
Recent semiconductor processes have reached the nano level, and
a topic of much concern is whether or not the prescribed
chemical/physical response conditions can be reproduced
consistently. In particular, attention has been focused on
the measurement and analysis of residual gas in the reaction vessels
of the various vacuum devices used in dry processes. HORIBA STEC
offers a residual gas analyzer (RGA) with the world’s smallest
quadropole mass spectrometer.
sCan be connected to a NW 60.Ø34 Conflat flange.
sA variety of graph modes available for residual gas analysis.
VG series
Compact static capacitance manometer
sCorrosion-resistant construction with an Inconel diaphragm.
sNW 16 clamp joint footprint size.
sTemperature control for superior stability (VG-121).
sCompact, world’s lightest weight (270 g).
sEquipped with 2 independent set point outputs.
Capacitance Manometers
VACUUM
Residual Gas Analyzer: RGA
s Measurement principle
s MicroPole™ Analyzer
The Residual Gas Analyzer consists of an ion source, a mass
spectrometer, and a measurement section. The residual gas is
ionized when it collides with the thermoelectrons discharged from
the high-temperature filament, and the ions that are thereby created
accelerate and converge onto the mass spectrometer. At the mass
spectrometer, direct and alternating current voltages are applied to
the four cylindrical electrodes (quadropoles), which allows the ions to
be separated by mass. The separated ions are detected as electric
current by the Faraday cup. The ion current is proportional to
the mass (partial pressure) of the residual gas.
The feature that makes the Micropole™ System unique is
the MicroPole™ Analyzer (MPA), a grouping of nine quadropoles that
takes full advantage of ultraprecision optical etching processing
technology and glass/metal joint technology. The development of
the MPA has enabled the creation
of the world's smallest residual
gas analyzer, while offering
the same or better sensitivity as
conventional, larger mass
spectrometers. The analyzer is
a plug-in unit. It features a sensor
unit that has already been
calibrated for partial pressures,
and offers absolute total and
partial pressure measurement.
The filament ionizes the gas
molecules.
Filament
When the voltage applied to the analysis electrode
changes, ions with different mass/electric charge
ratios corresponding to the voltage being applied
pass through the quadropole.
Focus lens
Ionization area
Filament (ion source)
H2
H2O
N2
Filament
Quadropole
Faraday cup
MicroPole™
Faraday cup (detector)
The ions gathered by the Faraday cup are
detected as an electric current.
s Sample layout
(when multiple Micropoles use an RS485 for communication)
To work with multiple Micropoles, use RS485 cables for communications
between all the CNL/CNIs, starting with the first one.
CA-03 series
RS485 communications cable
(0.6/3/6/12 m)
CNI/CNL series
computer interface module
CA-04-01
terminal plug
CA-02 series
RS232C communications cable
(1.8/3/4.5/6 m)
CA-06 series
system cable
(1.8/3/4.5 m)
PS-10
AC adapter
Vacuum chamber
MPA/SMPA series
sensor
SC series
spectraconverter
(AC 100 to 240 V)
s Wet clean recovery
s Sputter process monitoring
1.0E+00
1.0E+00
Filament ON at 0.6Pa after 10min. DP started.
(Turn on with TMP)
Dotted Line : Reference
Solid Line : After Cleaning
1.0E–01
1.0E–01
1.0E–02
Partial Pressure (Pa)
1.0E–02
Partial Pressure (Pa)
43
0:10:00 by Log Scale
1.0E–03
1.0E–03
1.0E–04
1.0E–05
1.0E–06
1.0E–04
1.0E–07
1.0E–05
0:00:01
1.0E–08
0:00:09
0:01:26
0:14:24
0
2:24:00
2000
4000
Time (h:m:s)
Total Press.(Reference)
Total Press.(after cleaning)
H2O (Reference)
H2O (after cleaning)
N2 (Reference)
N2 (after cleaning)
6000
8000
10000
12000
Time (s)
O2 (Reference)
O2 (after cleaning)
H2
H2O
N2
O2
Ar
Total
Vacuum measurement 44
Capacitance Manometers; VG Series
s Capacitance manometers
s Signal chart
The VG series of capacitance manometers are extremely precise and reliable,
thanks to their use of an Inconel diaphragm. The VG-111 features temperature
compensation circuits that minimize the impact of changes in the surrounding
temperature, and the resulting thermal expansion and contraction, on
measurement. The VG-121 actually adjusts the temperature of the partial
pressure measurement section to prevent deposition of subsidiary substances
and condensation of reactive gases. This gives it the reliability required for use
with film deposition equipment utilized in the fields of semiconductor and liquid
crystal display manufacturing.
Signal name
Pressure signal 0 to 10 V
Set point A NC contact point (option)
Set point A NO contact point (option)
Power source COM
Power source –15V ±5%
Power source +15V ±5%
Set point A COM (option)
Set point B NC contact point (option)
Set point B NO contact point (option)
Set point B COM (option)
Signal COM
Pin No.
2
3
4
5
6
7
8
9
10
11
12
s Measurement principles
s External dimensions
The VG series of capacitance manometers are partitioned by a thin metal
diaphragm that is stretched across the interior. PR is a standard chamber in which
high vacuum is maintained; PX is connected to the vacuum measurement section.
The pressure on the PX side
displaces the diaphragm, and
PR
PX
the capacitance varies with
the distance between the fixed
d
electrode and the diaphragm (d).
Pressure
The changes in the capacitance
between the fixed electrode and
diaphragm are converted into
pressure signals (electrical signals).
Fixed
electrode
Standard chamber
58.5 mm
78 mm
To port
Vacuum
measurement
section
Metal diaphragm
Zero point adjustment volume
Set point setting trimmer
s Uses
· Pressure monitor for semiconductor/LCD manufacturing processes.
· Pressure monitor for vacuum heat treatment furnaces and vacuum dryers.
· Pressure monitor for vacuum packing equipment.
· Pressure monitor for injection and degassing equipment.
· Pressure monitor for equipment used to lay down thin films.
· Ideal for use as a pressure monitor with various other kinds of vacuum equipment.
Status display LED
Green: Temperature control normal
Red: Temperature control malfunction
ZERO
STATUS
SP1
SP2
For set point output status display
RGA
Name
Model
Plasma card model (SMPA-)*1
Sensor model (MPA6-)*1
1-2/45
11-2/45
7-2/65
5-2/65
5-2/100
1-4/300
1-2/45
11-2/45
7-2/65
5-2/65
5-2/100
Mass range (AMU)
2 to 45
2 to 45
2 to 65
2 to 65
2 to 100
4 to 300
2 to 45
2 to 45
2 to 65
2 to 65
2 to 100
4 to 300
Resolution (FWHM)
0.5 AMU
1.5 AMU
0.9 AMU
0.8 AMU
1 AMU
1.5 AMU
0.5 AMU
1.5 AMU
0.9 AMU
0.8 AMU
1 AMU
1.5 AMU
Maximum operating
pressure
0.133 Pa (N2)
1 mTorr (N2)
1.466 Pa (N2)
11 mTorr (N2)
0.933 Pa (N2)
7 mTorr (N2)
0.666 Pa (N2)
5 mTorr (N2)
0.666 Pa (N2)
5 mTorr (N2)
0.133 Pa (N2)
1 mTorr (N2)
0.133 Pa (N2)
1 mTorr (N2)
1.466 Pa (N2)
11 mTorr (N2)
0.933 Pa (N2)
7 mTorr (N2)
0.666 Pa (N2)
5 mTorr (N2)
0.666 Pa (N2)
5 mTorr (N2)
0.133 Pa (N2)
1 mTorr (N2)
1.33 x 10-8 Pa (N2)
Minimum detected partial pressure
Minimum detected
He leak rate
2 x 10-9 Pa·m3/s
2 x 10-8 atm·cm3/s
2 x 10-8 Pa·m3/s
2 x 10-7 atm·cm3/s
2 x 10-9 Pa·m3/s
2 x 10-8 atm·cm3/s
2 x 10-9 Pa·m3/s
2 x 10-8 atm·cm3/s
2 x 10-8 Pa·m3/s
2 x 10-7 atm·cm3/s
2 x 10-9 Pa·m3/s
2 x 10-8 atm·cm3/s
Y2O3/Ir (standard) or Pure W
Filament material
150°C (maximum baking temperature [sensor portion]: 350°C)
Maximum operating temperature
Type C: Ø34 Conflat flange; Type K: KF-16 flange
Attachment flange type
Spectraconverter
model*2
1-4/300
SC6-14
SC6-18
SC6-11
SC6-07
SC6-14
SC6-18
Interface
RS232C/RS485 (selectable Baud rates: 9,600/19,200/38,400)
Software
Win MPA (Microsoft Windows XP 2000, Me, NT 4.0, 95/98, 3.1, 3.11)
SC6-11
*1 The Micropole analyzers are available in SMPA and MPA models. The SMPA is protected by mesh so that it can be used under extreme conditions such as those of plasma processing.
*2 Electron energy of 70 eV or 43 eV can be selected from the PC.
*AMU: Atomic Mass Unit.
VG series
Model
VG-111
5
Measurement range
1.3332 x 10 Pa
1000Torr
Zero temperature coefficient
0.02%Rdg/°C
20ms
Compression limit
300kPa
± 15VDC ± 5% 60mA
Output
CE
1.3332 x 104Pa
100Torr
1.3332 x 10 Pa
10Torr
0.005% F.S. or lower
Response time
Mass
1.3332 x 10 Pa
1Torr
3
0.005% F.S. /°C
0.04%Rdg/°C
Resolution
Power source voltage
(Temperature control model, 50/100°C)
2
± 0.45%Rdg (min. 0.1% F.S.)
Precision
Span temperature coefficient
VG-121
(Temperature correcting model, room temperature)
± 15VDC ± 5%
0 to 10VDC
264 g
274 g
89/336/EEC
1.3332 x 105Pa
1000Torr
SC6-07
45
ANALYSIS
High-precision FTIR gas analysis technology
High-precision gas analysis is now in demand, since the exhaust gas
discharged after various process gases are used in semiconductor
device and FPD manufacturing processes must be detoxified to
certain standards by exhaust gas processing equipment. Greenhouse
gases and PFCs, whose reduction is now desired in order to prevent
global warmning, must be monitored as well. HORIBA, one of
the HORIBA group companies, has used its more than 50 years of
experience with gas analysis technology to create a lineup of
compact FTIR gas analyzers. HORIBA STEC and HORIBA have also
collaborated to create the IR-150 monitor, which can monitor
the density of gases generated by liquids in the MOCVD process.
High-precision FTIR gas analysis technology 46
FG-100 series
FTIR Gas Analyzer
Efficient gas measurement for processes in a compact package
sSingle cell and dual cell types available.
sFive cell lengths available, to allow measurement of different
gas densities.
sUses an electrically cooled MCT detector that does not require
liquid nitrogen.
sExclusive sampling units provided.
sHigh-precision measurement in the sub-ppm order.
sFeatures software that is ideal for real-time analysis.
The FG-100 series are FTIR gas analyzers that can be used to
analyze greenhouse gases and PFCs, whose reduction is now
desired to prevent global warming, as well as semiconductor and
FPD process gases, and other types of gases.
To enable efficient gas analysis on-site, these units have been
made much more compact, and are also available in both single and
dual cell types. These analyzers are easy to move and install at
desired measurement locations, and are suitable for a variety of
analysis uses. These total systems feature sampling units that are
ideal for semiconductor and FPD gas analysis, as well as a sizeable
gas spectral library, and software that makes operating the units easy.
IR-150 series
Inline Gas Monitors
Inline gas density monitors that use the non-dispersive infrared (NDIR) method
sHigh-level, real-time measurement in an inline format.
sIdeal for measuring the density of gases generated by the liquid
and solid sources used in MOCVD.
sTMAI, TMGa, TMIn, DMZn.
sCompact, mount-free design.
The IR-150 series measure the density of gases generated by liquid
and solid sources during the MOCVD process. They can be used to
monitor and measure the density after bubbling to ensure a stable
supply of materials. These inexpensive inline gas monitors use
the NDIR method.
ANALYSIS
FTIR Gas Analyzers: FG-100 Series
s FTIR gas analyzers
The world's smallest size. Easy to move and install on-site, for
a wider variety of analysis uses. sTwo types are available: single cell
and dual cell. The dual cell type can continuously monitor completely
different measurement points, such as the IN and OUT points of
detoxification units, and switch between them with the touch of
a button. There is no need to replace the cells, making gas analysis
even more efficient. sFive cell lengths are available, to allow
measurement of different gas densities. sFeature a gas spectral
library with over 260 types of gases, including PFC gases. Enable
efficient gas analysis. HORIBA STEC also offers calibration curves for
a wide variety of applications. sThanks to their use of a long optical
path length cell that offers high-sensitivity measurement in the sub-
ppm order, low-density gas measurement is possible (CF4: 0.003
ppm etc.). sUse an electrically cooled MCT detector that does not
require liquid nitrogen. Eliminating the need for complicated liquid
nitrogen supplies in the clean room helps enable continuous, smooth
measurement. sExclusive sampling units available to make sample
gas introduction easy. Also feature casters that make it easier to move
the units, and can be installed in very small spaces. sOptimal software
for real-time analysis: Software designed for real-time analysis features
a measurement results trend display and automatic saving of
measurement results. Simple to operate yet yields high-precision
measurement results. Up to 20 components can be continuously
measured simultaneously. Operates on a Windows notebook PC.
s
s Sample measurement
Detoxification unit (plasma system)
exhaust gas measurement
N2
Measurement point
Process exhaust gas
Measurement point
Process exhaust gas
Measurement point
Supplied gas
Detoxification
unit
Dry pump
Scrubber
Exhaust
Concentration (ppm)
Process
chamber
PFCs
Various process gases
Measurement point
Detoxification exhaust gas
5000
4500
4000
Chamber: Plasma on
Abatement: Plasma off
3500
3000
2500
2000
1500
Chamber: Plasma on
Abatement: Plasma off
CF4
CHF3
1000
500
0
15:44
15:45
15:46
15:47
15:48
Time (hh:mm)
CVD chamber cleaning exhaust gas analysis
14000
Dry etching exhaust gas measurement (C2F6)
12000
SiF4
2500
HF
8000
Concentration (ppm)
Conc. (ppm)
10000
NF3
6000
4000
2000
0
0:00
0:15
0:30
0:45
1:00
1:15
1000
500
Immediately after
material is replaced
0.005
0
0.005
After stabilization
0
1500
1000
500
Absorbance/Partial pressure
Material
loaded
600
3
Immediately
after material is replaced
0.3
2
0.2
1
0.1
0
0
30
60
HF
02:00
04:00
06:00
08:00
10:00
12:00
sample lower detection limits
4
0.4
90
0
Bubbling time (hours)
Frequency (cm-1)
SiF4
s Measured components and
(10-5)
Before material
is replaced
CO
Time (mm:ss)
Before material is replaced
0
2000
0
00:00
Deposition rate/Partial pressure
0.005
CF4
COF2
Gas density monitoring before and after
the replacement of a Pb (C11H19 O2) 2 bottle
570
0.5
RF off
C 2F6
1500
Time (h:mm)
Gas spectrum before and after the replacement
of a Pb (C11H19 O2) 2 bottle
RF on
2000
Sampling is performed in the CVD chamber's exhaust line (after decompression). The gas density monitor
is used to determine when chamber cleaning should end. Optimizing the cleaning conditions increases
throughput and reduces the amount of gas used.
Absorbance
47
*From the 2002 Spring 49th Proceedings of the Applied Physics Association's
Lecture Series (Tokyo Institute of Technology, HORIBA).
Component
Lower detection limit
CF4
C2F6
C3F8
C4F8
CHF3
NF3
SF6
HF
SiF4
NH3
NO2
CO
0.003 ppm
0.005 ppm
0.005 ppm
0.01 ppm
0.009 ppm
0.02 ppm
0.003 ppm
0.25 ppm
0.006 ppm
0.05 ppm
0.04 ppm
0.3 ppm
Measurement conditions:
Cell optical path length 10 m, liquid nitrogen cooled MCT
* Optimizing the measurement conditions enables an increase in sensitivity.
s Uses
· For optimization of CVD (chamber cleaning, etc.) and dry etching
processes.
· For development of new PFC processing (collection, analysis)
equipment.
· For checking detoxification equipment performance.
· For monitoring quality during gas generation processes.
· For the development of substitute PFC gases.
· For atmospheric gas monitoring in clean rooms.
· For density monitoring of gases produced by liquids and solid
sources used in MOCVD.
· For the evaluation of CVD material properties.
High-precision FTIR gas analysis technology 48
FTIR Gas Analyzers: FG-100 Series
s Gas spectral library with more than 260 profiles
s Software optimized for real-time analysis
You can carry out efficient analysis by checking results against
more than 260 profiles, including PFCs, in our spectral library.
HORIBA is also able to provide a full range of application support,
such as generation of calibration curves for specific applications
(CVD, D/E, abatement) and additional post-delivery upgrades.
The software, optimized for real-time analysis, features trend display of
current values, auto-saving of results, and other functions. Simple
operation procedures provide highly accurate measurement results.
Simultaneous and continuous measurements for up to 20 constituents
are now possible. The software can be run on a laptop computer using
the Windows® operating system.
CF4
C2F6
C4F10
CO2
NO2
SO2F2
CF3l
C2H2F4
C4F6
COF2
NH3
SOF2
CH2F2
C2H3F3
C4F8
HBr
NF3
B(OCH3)3
BCl3
CH3F
C2H4F2
C5F8
HCl
SF6
CHBr3
C2HF5
C5H3F9O
HF
Si(OC2H5)4
CHF3
C3F6
C8F18
NO
SiF4
C2F4
C3F8
CO
N2O
SiH4
In the United States and other countries, Windows® is a registered trademark of Microsoft Corporation.
Software operation procedure
Enter number of scans
s Flow Schematics
Sampling unit
Basic operating screen (spectrum display)
Sampling
gas
inlet 1
Sample gas/
zero gas outlet
Measurement data
auto-save function
Measurement
conditions
set-up screen
Measurement
start button
Measurement results real-time display
Gas cell
Sampling
gas
inlet 2
Sample gas/
zero gas outlet
N2 gas
inlet
Concentration display
Sample gas/
zero gas outlet
Pressure
sensor
Concentration log
Purge gas
Analyzer
N2 purge specifications are also
available for the interferometer.
Trend graph
Stored data can be processed by MS-Excel and other applications.
s Data
Amount of light changes
as density increases.
Step control data
Stable density output relative to
the gas density is also possible.
Drift resulting from changes
in the amount of light,
cell window cleanliness,
processing time variations, etc.
s Sample connection layout
60
75
Sample flow
70
Control flow
180
40
30
IR output
20
Density
10
55
SC-IR
signal cable
Density signal
Density alarm
(contact point output)
AC 100 V
IR-150
IR-150CU
special controller
50
150
125
160
100
140
75
120
100
50
80
60
45
0
0
Pressure
control
50
65
60
220
200
80
Output (F.S.%)
Sample: The wavelength band generated as the gas is flowing, as a result of
changes in the amount of light due to the gas's absorption.
Reference: The wavelength band indicating that there are no changes in the amount
of light even when the gas is flowing, since there is no absorption by the gas.
85
Pressure (kPa)
Infrared absorption spectrum of
measured gas when gas is not
flowing.
Feedback data
Even if the density of the source
material changes due to some factor
or other, the inline gas monitor's
feedback system makes it possible
to maintain stable density at all times.
Output (F.S.%)
Reference
detector
Flow rate (CCM)
Sample
detector
Light at detector
The infrared analysis method
works because the molecules of
different types of gas absorb light
of different wavelengths. Gas is
passed through an infrared
absorption cell, and an infrared
detector measures how much
infrared has been absorbed. That
value is then converted into a gas
density value.
Dark
s Measurement principle
Light
Inline Gas Monitor: IR-150 Series
2
4
6
8
10
12
14
16
IR-150's
output
25
40
0
2
Time (min.)
4
6
8
0
10
Time (min.)
IR-150's pressure effect
When the sample flow changes, the IR output is used
to apply feedback to the control flow. The density is
the ideal density curve as calculated from the divided
ratio by two MFCs.
s Solutions for compound semiconductor processes
HORIBA STEC offers all the components required for stable vaporization systems for
the liquid sources used in compound semiconductor processing, including TMAI,
TMIn, TMGa, DEZn, and others. Vaporization of liquid sources involves control of
bubbling gas flow, as well as precise control of pressure in the liquid source
cylinders and the gas density generated. HORIBA STEC offers mass flow controllers
(SEC series), capacitance manometers (VG series), piezo valves (PV series), and
feedback controllers (PCU). HORIBA STEC also offers a complete lineup of compact
monitors in the IR-150 series that directly measure and control the density of the gas
generated using the non-dispersive infrared (NDIR) method. Software that provides
unified control of all of these devices is also available, enabling HORIBA STEC to
provide complete liquid source vaporization systems to suit any customer's needs.
Control system
PCU
UR
SEC
VG
IR-150
PV
Chamber
ANALYSIS
FG-100 series
FG-110
Model
FG-120
FTIR method
Measurement principle
Liquid nitrogen cooled MCT
Detector
Electrically cooled MCT
Standard: 5000 to 700 cm-1; Option: 5000 to 600 cm-1
Measured frequency range
5000 to 900cm-1
Single cell: 0.01 m (7 mL), 0.1 m (70 mL), 0.8 m (300 mL), 2.4 m (300 mL), 10 m (1800 mL)
Dual cell: 0.01 m + 2.4 m, 0.01 m + 0.8 m, 0.1 m + 2.4 m
Cell optical path length
(cell capacity)
Standard: BaF2; Option: ZnSe
Cell window material
Standard; Viton®; Option: Kalrez
O-ring material
Standard: 1/4" Swagelok; Option: 1/4" VCR
Piping attachment
0.5, 1, 2, 4, 8, 16 (cm-1)
Frequency resolution
Operating temperature range
25 ± 5°C
Operating humidity range
70% RH or lower
AC 100 ± 10 V, 50/60 Hz (different standards available for overseas)
Power source
240 VA (2.4m cell)
Power consumption
250 VA (2.4m cell)
For analysis meter purge: About 5 L/min at all times; For calibration: 5 L/min when required: Nitrogen gas requirements: 99.99% or higher, moisture below –30°C saturation levels, no dust or mist
Nitrogen gas
500 to 600mL range (duration 8 to 10 hours)
Liquid nitrogen
Single cell type: 40 kg (2.4 m cell); Dual cell type: 50 kg
Mass
CE markings, FC Part 15 (Class A)
Standards
* These products are manufactured by HORIBA Ltd.
* Viton® is registered trademark of E. I. DuPont de Nemours.
IR-150 series
IR-150S
Model
IR-150L
TMAI, TMGa, THIn, 12%
DMZn 18%
Gases and densities*1
TMAI, TMGa, THIn, 1.2%
DMZn 1.8%
C3H8
Calibration gas
Non-dispersive infrared (NDIR) method
Measurement method
5 mm
Measurement cell length
50 mm
± 2% F.S.
Repeatability
40 sec (T90), typically 20 sec
Response speed
0.05 to 0.15 MPa (G)
Pressure resistance
100 to 5000, can be set as desired
Display
Output signal
0 to 5 V
Temperature
Max. 60°C or lower
Max. 70°C or lower
Temperature resistance
SUS-316L, sapphire glass, silver
Gas connection
5 x 10-12 Pa·m3/s (He) or lower
Leak rate
AC 100 V
Power source
153.5 x 37.5 x 107 mm (H x W x D)
External dimensions
163 x 36.5 x 158 mm (H x W x D)
About 1.0 kg
Mass
About 1.7 kg
1/4" VCR Type Male or equivalent
Standard Fitting
*1 Maximum output at each cell length. * Gas settings other than those described above are possible. Please contact HORIBA STEC for more information.
External dimensions
sFG series
sIR-150S
sIR-150L
• Single cell type
400
400
18.75
65.5
350
• Sampling unit
(For single cell type)
(For dual cell type)
500
650
700
2-M5
158±0.5
Bottom screw
attachment positions
16
Cell unit
10.65
Analysis unit
16.2
Bottom screw
attachment positions
115.5
37.5
107±0.5
8.45
48.6
23.4
600
167±2
35.5
• Dual cell type
163±1
* Dimensions may vary with specifications
(cell optical path length).
10.25
Analysis unit Cell unit
153.5±1
157.5±2
350
450
633
49
31.45
52.6
4-M4
17.85
36.5
High-precision FTIR gas analysis technology 50
External dimensions
sLF/LV series
H
H
E
E
A
W
I
B
W
I
B
T
A
T
C
D
D
C
I
I
I
Model
H
T
W
1/4" VCR
1/4" Swagelok
1/8" VCR
LF-210 *
LF-310 *
LF-410 *
LF-510 *
LF-610 *
LV-210
LV-310
LV-410
LV-510
LV-610
112
112
112
112
112
112
112
112
112
112
30
30
30
30
30
30
30
30
30
30
55
55
55
55
55
86
86
86
86
86
106
106
106
106
106
137
137
137
137
137
105
105
105
105
105
136
136
136
136
136
94
94
94
94
94
125
125
125
125
125
I
I
A
B
C
D
E
87
87
87
87
87
118
118
118
118
118
89
89
89
89
89
120
120
120
120
120
5
5
5
5
5
5
5
5
5
5
65
65
65
65
65
96
96
96
96
96
5
5
5
5
5
5
5
5
5
5
20
20
20
20
20
20
20
20
20
20
17
17
17
17
17
17
17
17
17
17
1/16" Swagelok 1/16" Original
Please request other external dimension drawings from HORIBA STEC.
* Equivalent joints are sometimes used instead of the ones listed.
90.5
42.3±0.5
18.6
51.6
75
37.3±0.5
18.6
50
93.2
22.5
22.5
127
25.8±0.5
22.5
40
25.8±0.5
127
40
37.3±0.5
sVC series
125
sMV-1000
125
sMI-1000
18.6
24.6
50
92.9
24.3
30
2-M4
20
40
18.6
99.2±0.5
51.6±0.5
2-Ø5
5
56
45±1
55
45±0.5
30
2-Ø5
5
50±0.5
60
60
5
sLSC-A100
sLU-A100
80
159±2
144
65 420
80
4-Ø15
50
288±4
900
300±4
(45)
65±2
320±5
50±2
275±10
140
800±6
340±3
10
5
100.5±1
110.5
60 60
550±5
203=P40.6 x 5
350
48.4
200
160=P40 x 4
5
80
5
2-Ø5
110
90
1000
1770±15
1700
Maintenance
space
Exhaust duct
external dimensions
Ø130
70
270
337±5
320
45
45˚
4-Ø12
PCD105
45˚
51
SOLUTION
HORIBA STEC, Co., Ltd.
HORIBA STEC is at the core of the Horiba Group’s semiconductor
division. HORIBA STEC is the top manufacturer worldwide for a variety
of equipment that is indispensable for semiconductor manufacturing,
including mass flow controllers, fluid material vaporization control
equipment, and pressure control equipment. HORIBA STEC also offers
a lineup of vacuum measurement equipment.
Offering comprehensive solutions and technology for dry processing,
including chamber surroundings
Increasing yield rates is the key to improving productivity in the semiconductor device development and manufacturing
processes. Increasing yields requires establishing better process gas and fluid material vaporization systems, which are
critical for thin film formation, as well as the capacity to check both what is happening inside the chamber and the status
of the thin films being formed in each processing stage, and the ability to create the best possible conditions for
processing at all times. The way to achieve this is through compact, real-time measurement and monitoring of
manufacturing lines.
HORIBA STEC is adding residual gas analyzers and capacitance manometers from Ferran Scientific of the United
States to its lineup of unique equipment and technology. These residual gas analyzers can analyze each component of
the gas in the chamber and enable real time control of gas levels. HORIBA STEC is also using optical technology
provided by Jobin Yvon Inc.’s, a top manufacturer of spectroscopic analysis equipment, to supplement existing infrared
gas analysis technology, including FTIR (Fourier transform infrared) and NDIR (non-dispersive infrared), from
HORIBA. With the aid of these technologies and other technologies unique to the various Horiba Group companies,
HORIBA STEC is able to offer total solutions for monitoring the inside of the chamber, and increasing yield rates.
HORIBA STEC, the engine that drives the Horiba Group’s semiconductor division, was recently reborn. Through
the combination of precision flow control technology, vacuum measurement technology, and total analysis technology,
HORIBA STEC will continue to offer original solutions that meet customer needs.
HORIBA Group total solutions 52
HORIBA JOBIN YVON Inc.
HORIBA JOBIN YVON, headquartered in France, is a top maker of
spectroscopic analysis equipment. It excels in the production of
equipment for the analysis of everything from ultraviolet to visible light.
The combination of HORIBA JOBIN YVON’s technology and HORIBA’s
established infrared technology has resulted in the ability to produce
analysis equipment for every wave length range.
HORIBA, Ltd.
The HORIBA brand is known worldwide for its original analysis
technology, which is used in everything from automobile engines
to medical, environmental, and semiconductor testing and
analysis. In the semiconductor manufacturing field, HORIBA
contributes to the reliable production of high-performance
semiconductors through its process monitors, which are used in
every part of a semiconductor manufacturing line.
53
NETWORK
A worldwide service network at
your service whenever
and wherever you need it
In addition to two production facilities and seven sales and
service branches in Japan, HORIBA STEC has production
facilities in the United States (in Sunnyvale, California and
Austin, Texas) that offer everything from production and sales
to technical advice and maintenance.
HORIBA Instruments covers the entire European region,
while HORIBA STEC is well-represented in East Asia, with
a branch in Taiwan and a wholly owned local subsidiary in
Korea called HORIBA STEC KOREA. HORIBA Instruments
has a presence in Singapore with HORIBA Instruments
(Singapore), and the group companies have collaborated to
establish a factory in Shanghai, China.
The HORIBA Group’s sales and service network extends
throughout Japan and the rest of the world. HORIBA STEC has
free access to the entire network, a support structure that
enables the company to offer assistance whenever and
wherever it is needed, every day of the year. HORIBA STEC is
always here for you!
Head Office and Factory
Aso Factory, Kyushu Branch
Principal branches in Japan
HEAD OFFICE
11-5, Hokodate-cho, Kamitoba, Minami-ku, Kyoto, 601-8116 Japan
TEL: (81)75-693-2300 FAX: (81)75-693-2350
ASO FACTORY
Torikokogyodanchi, 385-11, Kohmaibata, Ohaza-torikoaza, Nishihara-mura,
Aso-gun, Kumamoto, 861-2401 TEL: (81)96-279-2921 FAX: (81)96-279-3364
SENDAI SALES OFFICE
2-12-3, Yoshioka-higashi, Yamato-cho, Kurokawa-gun, Miyagi, 981-3627
TEL: (81)22-345-5241 FAX: (81)22-347-1022
TSUKUBA SALES OFFICE
Tsukuba kouken building1F, 2-1-13, Umezono, Tsukuba-city, Ibaragi, 305-0045
TEL: (81)29-856-0921 FAX: (81)29-856-5999
TOKYO SALES OFFICE
Arute Bldg HigashiKanda. 4F, 1-7-8, Higashi-Kanda, Chiyoda-ku, Tokyo, 101-0031
TEL: (81)3-3864-1077 FAX: (81)3-3864-1277
NIRASAKI SALES OFFICE
72-1, Wakao, Ohkusa-machi, Nirasaki-city, Yamanashi, 407-0037
TEL: (81)551-23-5339 FAX: (81)551-23-5907
NAGOYA SALES OFFICE
TSN building 4F, 5-9-3, Toyota, Minami-ku, Nagoya-city, 457-0841
TEL: (81)52-694-1221 FAX: (81)52-694-1229
HIROSHIMA SALES OFFICE
6-10-28, Minami-zaohcho, fukuyama-city, Hiroshima, 721-0973
TEL: (81)84-941-6990 FAX: (81)96-279-3364
KYUSHU SALES OFFICE
Torikokogyodanchi, 385-11, Kohmaibata, Ohaza-torikoaza, Nishihara-mura,
Aso-gun, Kumamoto, 861-2401 TEL: (81)96-279-2922 FAX: (81)96-279-3364
Tokyo Branch
U.S.A.
HORIBA/STEC lnc. Sunnyvale Office
LAND
PORT
E
RENO
YVAL
SUNN
ai
Send
hima
Hiros
ASO
u
Kyush
aki
NirasTokyo ba
Tsuku
Kyoto
ya
Nago
U.S.A.
HORIBA/STEC lnc. Austin Office
AS
DALLIN
AUST
World service network 54
Principal branches overseas
TAIWAN
U.K.
HORIBA STEC TAIWAN Branch
3rd Fl., No.18, Lane 676, Jhonghua Rd., Jhubei City, Hsinchu County 302, Taiwan R.O.C.
PHONE: (886)3-656-1160 FAX: (886)3-656-8231
HORIBA INSTRUMENTS Ltd.
Kyoto Close, Summerhouse Rd., Moulton Park, Northampton NN3
6FL England
PHONE: (44)1604-542-600 FAX: (44)1604-542-696
KOREA
HORIBA STEC KOREA, Ltd.
110, Suntech-City, 513-15, Sangdaewon-Dong, Jungwon-Ku,
Bungdang-Ku, Sungnam-City, Kyungki-Do, 462-725 Korea
PHONE: (82)31-777-2277 FAX: (82)31-777-2288
U.S.A.
HORIBA/STEC lnc.
Sunnyvale Office
1080, E.Duane Ave. Suite A, Sunnyvale, CA 94086
PHONE: (1)408-730-4772 FAX: (1)408-730-8975
Austin Office
9701 Dessau Rd., Suite605, Austin, TX 78754
PHONE: (1)512-836-9560 FAX: (1)512-836-8054
Portland Office
10240 SW Nimbus Ave.Suite L-5,Portland, OR 97223
PHONE: (1)503-624-9767 FAX: (1)503-968-3236
Reno Office (R&D Center)
605 Spice Island Drive, #5, Sparks, NV 89431
PHONE: (1)775-358-2332 FAX: (1)775-358-0434
Dallas Office
670 International Parkway, Ste. 170 Richardson, TX 75081
PHONE: (1)972-470-9200 FAX: (1)972-470-0645
New Hampshire Office
315 Derry Road, Suite 13 Hudson, NH 03051, U.S.A.
PHONE: (1)603-886-4167 FAX: (1)603-886-4267
Tempe Office
2520 S. Industrial Park Drive. Tempe, AR. 85282, U.S.A.
PHONE: (1)602-731-3094 FAX: (1)602-731-3092
U.K.
HORIBA INSTRUMENTS Ltd.
FRANCE
HORIBA INSTRUMENTS Ltd.
U.K.
TAIWAN
HORIBA STEC TAIWAN Branch
FRANCE
HORIBA INSTRUMENTS Ltd.
BURO club Gieres, 2 Avenue de Vignate 38610 Gieres, France
PHONE: (33)4-76-63-4915 FAX: (33)4-76-54-0399
NETHERLANDS
HORIBA INSTRUMENTS Ltd.
Bijsterhuizen 11-58, 6546 AS Nijmegen, The Netherlands
PHONE: (31)24-366-0985 FAX: (31)24-366-0987
GERMANY
HORIBA EUROPE GmbH
Zur Wetterwarte 10 Haus 109 01109 Dresden Germany
PHONE: (49)351-889-6807 FAX: (49)351-889-6808
SINGAPORE
HORIBA INSTRUMENTS (SINGAPORE) Pte. Ltd.
10 Ubi Crescent, Lobby B #05-11/12 Ubi techpark Singapore 408564
PHONE: (65)6-745-8300
FAX: (65)6-745-8155
CHINA
HORIBA INSTRUMENTS (SHANGHAI) Co., Ltd.
HORIBA STEC Shanghai Service Center
Rm.301, No.84, Lane887, Zu-chong-zhi Rd.,
Zhangjiang Hi-tech Park, Shanghai, China
PHONE: (86)21-5131-7150 FAX: (86)21-5131-7051
KOREA
HORIBA STEC KOREA, Ltd.
SINGAPORE
HORIBA INSTRUMENTS (SINGAPORE) Pte. Ltd.
NDS
ERLA
NETH ERMANY
G
CE
FRAN
A
KORE
CHINA
N
A
TAIW
E
APOR
SHING
CHINA
HORIBA INSTRUMENTS (SHANGHAI) Co, Ltd.
GAS
LIQUID
VACUUM
ANALYSIS
Products Guidance
Combined catalog
sFlow
Control Technology
Control Technology
sLiquid Source Vaporization Technology
sVacuum Measurement Technology
sHigh-Precision FTIR Gas Analyzers Technology
sPressure
Products Guidance
Combined catalog
Vacuum Measurement
Technology
High-Precision FTIR Gas
Analyzers Technology
Flow Control Technology
Liquid Source Vaporization
Technology
Pressure Control Technology
http://www.horiba-stec.jp
11-5 Hokodate-Cho, Kamitoba, Minami-Ku,
Kyoto JAPAN 601-8116
TEL.(81)75-693-2314 FAX.(81)75-693-2311
Printed on 100% recycled paper.
Catalog No. PG-AE83A
Printed in Japan
GAS
LIQUID
VACUUM
ANALYSIS
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