Advanced Energy Rapid F 6kW Remote Plasma Source User Manual

The Rapid F 6kW Remote Plasma Source is a compact and easy-to-mount combination plasma source and integrated mid-frequency (~400 kHz) 6 kW generator. It provides flexibility and control of a wide range of reactive plasma chemistries at a number of critical points within the process stream. The Rapid F 6kW plasma source is inductively-coupled, with a closed-path, water-cooled metal manifold in which induced plasma currents act as a single-turn secondary to a ferrite-core transformer.

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Rapid F 6kW Remote Plasma Source User Manual | Manualzz

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Key features

  • Compact and easy-to-mount
  • Inductively-coupled
  • Closed-path, water-cooled metal manifold
  • Integrated mid-frequency (~400 kHz) 6 kW generator
  • Provides flexibility and control of a wide range of reactive plasma chemistries
  • 25-pin user (Analog Control) port
  • 9-pin AE Bus (RS-232) port
  • Internal AC line filter
  • User-interlocked contactor

Frequently asked questions

The primary application for this product is to provide a reactive etch gas (NF3) for remote chamber cleaning in semiconductor and flat panel display applications.

The source itself is controlled through its 25-pin user (Analog Control) port or 9-pin AE Bus (RS-232) port.

The Rapid F 6kW plasma source consists of a switch-mode power supply, a resonant CLL transformer circuit, a secondary strike circuit, and a ferrite transformer core.

The source requires an easily ionized noble gas such as Ar for ignition. The operator or process engineer must integrate the source’s operation with dynamic or sequential adjustment of gas flow, vacuum pressure, and power set point steps.

The inner walls of the source manifold are hard-anodized to support fluorine-bearing chemistries.
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