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MKS ASTRON G7

Manuals and User Guides for MKS ASTRON G7. We found 1 manuals for free downloads Manual

Below you will find brief information for Remote Plasma Source ASTRON G7. ASTRON G7 is a remote plasma source designed for cleaning chambers used in the thin-film photovoltaic (TFPV) manufacturing process. It utilizes a remote plasma source to generate reactive radical species, eliminating the need for in-situ plasma cleaning. This technology offers a safer and more efficient cleaning method, reducing damage to chamber components and improving overall yield.

Key Features

  • Eliminates ion bombardment
  • High dissociation efficiency
  • Safe and efficient cleaning
  • Improved chamber cleaning rates
  • Reduced downtime and labor costs

Pages: 5 MKS ASTRON G7 Manual

Brand: MKS Category: Industrial & lab equipment Size: 411 KB

Languages: English

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Frequently Answers and Questions

What are the advantages of using a remote plasma source for chamber cleaning?
Remote plasma sources offer several advantages over traditional in-situ cleaning methods. They eliminate ion bombardment, minimizing damage to chamber components. They also achieve high dissociation efficiency and provide safer and more effective cleaning, resulting in improved chamber cleaning rates and reduced downtime and labor costs.
What are the benefits of using ASTRON G7?
ASTRON G7 offers a safer and more efficient chamber cleaning solution by eliminating the need for in-situ plasma cleaning. It provides high dissociation efficiency and minimizes downtime and labor costs, leading to a more efficient manufacturing process.
What types of chambers can be cleaned with the ASTRON G7?
ASTRON G7 is suitable for cleaning chambers used in thin-film photovoltaic (TFPV) manufacturing, specifically for silicon nitride, silicon oxide, and amorphous silicon deposition chambers.

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